公开(公告)号：US06324200B1

公开(公告)日：2001-11-27

申请号：US09294336

申请日：1999-04-20

申请人： Satoshi Kamiyama ,  Masahiro Kume ,  Ryoko Miyanaga ,  Isao Kidoguchi ,  Yuzaburo Ban ,  Ayumu Tsujimura ,  Yoshiaki Hasegawa ,  Akihiko Ishibashi

发明人： Satoshi Kamiyama ,  Masahiro Kume ,  Ryoko Miyanaga ,  Isao Kidoguchi ,  Yuzaburo Ban ,  Ayumu Tsujimura ,  Yoshiaki Hasegawa ,  Akihiko Ishibashi

IPC分类号： H01S319

CPC分类号： B82Y20/00 ,  H01S5/3054 ,  H01S5/3063 ,  H01S5/343 ,  H01S5/34333

摘要： A GaN buffer layer and an Si-doped n-type GaN contact layer are formed in this order on a sapphire substrate. An n-type Al0.3Ga0.7N cladding layer, an n-type Al0.25Ga0.75N optical guide layer, a multi-quantum well active layer, in which Al0.2Ga0.8N well layers and Al0.25Ga0.75N barrier layers are alternately stacked, an Mg-doped p-type Al0.25Ga0.75N optical guide layer, a p-type Al0.4Ga0.6N0.98P0.02 cladding layer and a p-type GaN contact layer are stacked in this order on an active region on the upper surface of the n-type contact layer.

摘要翻译： 在蓝宝石衬底上依次形成GaN缓冲层和Si掺杂n型GaN接触层。 n型Al0.3Ga0.7N覆层，n型Al0.25Ga0.75N光导层，多量子阱有源层，其中Al0.2Ga0.8N阱层和Al0.25Ga0.75N势垒层 交替堆叠，将Mg掺杂的p型Al0.25Ga0.75N光导层，p型Al0.4Ga0.6N0.98P0.02包覆层和p型GaN接触层依次层叠在 在n型接触层的上表面上的有源区。

公开(公告)号：US08309946B2

公开(公告)日：2012-11-13

申请号：US12935455

申请日：2009-07-22

申请人： Satoru Mitani ,  Shunsaku Muraoka ,  Yoshihiko Kanzawa ,  Koji Katayama ,  Ryoko Miyanaga ,  Satoru Fujii ,  Takeshi Takagi

发明人： Satoru Mitani ,  Shunsaku Muraoka ,  Yoshihiko Kanzawa ,  Koji Katayama ,  Ryoko Miyanaga ,  Satoru Fujii ,  Takeshi Takagi

IPC分类号： H01L47/00

CPC分类号： H01L27/101 ,  H01L45/08 ,  H01L45/1233 ,  H01L45/1273 ,  H01L45/146 ,  H01L45/1625 ,  H01L45/1641

摘要： A resistance variable element of the present invention comprises a first electrode (103), a second electrode (107), and a resistance variable layer which is interposed between the first electrode (103) and the second electrode (107) to contact the first electrode (103) and the second electrode (107), the resistance variable layer being configured to change in response to electric signals with different polarities which are applied between the first electrode (103) and the second electrode (107), the resistance variable layer comprising an oxygen-deficient transition metal oxide layer, and the second electrode (107) comprising platinum having minute hillocks (108).

摘要翻译： 本发明的电阻可变元件包括第一电极（103），第二电极（107）和介于第一电极（103）和第二电极（107）之间的电阻变化层，以接触第一电极 （103）和第二电极（107），电阻变化层被配置为响应于施加在第一电极（103）和第二电极（107）之间的具有不同极性的电信号而改变，电阻变化层包括 氧缺乏的过渡金属氧化物层，以及包含具有分开的小丘（108）的铂的第二电极（107）。

公开(公告)号：US07436031B2

公开(公告)日：2008-10-14

申请号：US10588960

申请日：2005-08-26

申请人： Makoto Kitabatake ,  Osamu Kusumoto ,  Masao Uchida ,  Kunimasa Takahashi ,  Kenya Yamashita ,  Ryoko Miyanaga ,  Koichi Hashimoto

发明人： Makoto Kitabatake ,  Osamu Kusumoto ,  Masao Uchida ,  Kunimasa Takahashi ,  Kenya Yamashita ,  Ryoko Miyanaga ,  Koichi Hashimoto

IPC分类号： H01L29/76 ,  H01L29/94 ,  H01L31/00

CPC分类号： H02M7/538 ,  H01L21/8213 ,  H01L21/8252 ,  H01L24/73 ,  H01L27/0605 ,  H01L27/0727 ,  H01L2224/0603 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/48137 ,  H01L2224/48247 ,  H01L2224/73265 ,  H01L2924/12032 ,  H01L2924/13055 ,  H01L2924/13062 ,  H01L2924/13063 ,  H01L2924/13091 ,  H01L2924/14 ,  H02M7/003 ,  H03K17/063 ,  H03K17/6871 ,  Y02B70/1483 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2924/00014

摘要： A semiconductor device according to this invention includes: two level shift switches (28A and 28B) each having first and second electrodes, a control electrode, a signal output electrode, and a first semiconductor region forming a transistor device section (28a,28b) which intervenes between the first electrode and the signal output electrode and is brought into or out of conduction according to a signal inputted to the control electrode and a resistor device section (Ra,Rb) which intervenes between the signal output electrode and the second electrode, the first semiconductor region comprising a wide bandgap semiconductor; and a diode (23) having a cathode-side electrode, an anode-side electrode, and a second semiconductor region comprising a wide bandgap semiconductor.

摘要翻译： 根据本发明的半导体器件包括：具有第一和第二电极的两个电平移位开关（28A和28B），控制电极，信号输出电极和形成晶体管器件部分（28a， 28b），其介于所述第一电极和所述信号输出电极之间，并且根据输入到所述控制电极的信号和介于所述信号输出电极和所述信号输出电极之间的电阻器部分（Ra，Rb）而导通或导通; 第二电极，第一半导体区域包括宽带隙半导体; 以及具有阴极侧电极，阳极侧电极和包括宽带隙半导体的第二半导体区域的二极管（23）。

公开(公告)号：US07426227B2

公开(公告)日：2008-09-16

申请号：US11447951

申请日：2006-06-07

申请人： Masahiro Kume ,  Isao Kidoguchi ,  Yuzaburo Ban ,  Ryoko Miyanaga ,  Masakatsu Suzuki

发明人： Masahiro Kume ,  Isao Kidoguchi ,  Yuzaburo Ban ,  Ryoko Miyanaga ,  Masakatsu Suzuki

IPC分类号： H01S5/00

CPC分类号： H01S5/32341 ,  B82Y20/00 ,  G11B7/123 ,  G11B7/127 ,  H01L2224/16225 ,  H01S5/005 ,  H01S5/0213 ,  H01S5/02208 ,  H01S5/02212 ,  H01S5/0224 ,  H01S5/02272 ,  H01S5/02292 ,  H01S5/0286 ,  H01S5/0683 ,  H01S5/1078 ,  H01S5/2022 ,  H01S5/2027 ,  H01S5/22 ,  H01S5/34333 ,  H01S2301/02 ,  H01S2301/173 ,  H01S2301/176 ,  H01S2304/04

摘要： A semiconductor laser device includes: a first cladding layer, which is made of a nitride semiconductor of a first conductivity type and is formed over a substrate; an active layer, which is made of another nitride semiconductor and is formed over the first cladding layer; and a second cladding layer, which is made of still another nitride semiconductor of a second conductivity type and is formed over the active layer. A spontaneous-emission-absorbing layer, which is made of yet another nitride semiconductor of the first conductivity type and has such an energy gap as absorbing spontaneous emission that has been radiated from the active layer, is formed between the substrate and the first cladding layer.

摘要翻译： 半导体激光器件包括：第一覆层，其由第一导电类型的氮化物半导体制成并形成在衬底上; 活性层，其由另一个氮化物半导体制成并形成在第一包层上; 以及第二覆层，其由另一种第二导电类型的氮化物半导体制成并形成在有源层上。 由第一导电类型的又一个氮化物半导体制成并具有从有源层辐射的吸收自发发射的能隙的自发发射吸收层形成在衬底和第一覆层之间 。

公开(公告)号：US07292615B2

公开(公告)日：2007-11-06

申请号：US10943127

申请日：2004-09-17

申请人： Gaku Sugahara ,  Isao Kidoguchi ,  Ryoko Miyanaga ,  Masakatsu Suzuki ,  Masahiro Kume ,  Yusaburo Ban ,  Fukukazu Hirayama

发明人： Gaku Sugahara ,  Isao Kidoguchi ,  Ryoko Miyanaga ,  Masakatsu Suzuki ,  Masahiro Kume ,  Yusaburo Ban ,  Fukukazu Hirayama

IPC分类号： H01S5/00

CPC分类号： B82Y20/00 ,  G11B7/127 ,  H01S5/028 ,  H01S5/2004 ,  H01S5/2231 ,  H01S5/34333

摘要： A semiconductor laser device (10) includes a resonant cavity (12) in which a quantum well active layer (11) made up of barrier layers of gallium nitride and well layers of indium gallium nitride is vertically sandwiched between at least light guide layers of n- and p-type aluminum gallium nitride. An end facet reflective film (13) is formed on a reflective end facet (10b) opposite to a light-emitting end facet (10a) in the resonant cavity (12). The end facet reflective film (13) has a structure including a plurality of unit reflective films (130), each of which is made up of a low-refractive-index film (13a) of silicon dioxide and a high-refractive-index film (13b) of niobium oxide. The low-and high-refractive-index films are deposited in this order on the end facet of the resonant cavity (12).

摘要翻译： 半导体激光器件（10）包括谐振腔（12），其中由氮化镓的阻挡层和氮化铟镓的阱层构成的量子阱活性层（11）垂直夹在至少导光层n之间 和p型氮化镓铝。 端面刻面反射膜（13）形成在与谐振腔（12）中的发光端面（10a）相对的反射端面（10b）上。 端面反射膜（13）具有包括多个单位反射膜（130）的结构，每个单元反射膜由低二氧化硅的低折射率膜（13a）和高折射率 薄膜（13b）的氧化铌。 低折射率和高折射率的薄膜依次沉积在谐振腔（12）的端面上。

公开(公告)号：US20070176230A1

公开(公告)日：2007-08-02

申请号：US11730660

申请日：2007-04-03

申请人： Masao Uchida ,  Makoto Kitabatake ,  Osamu Kusumoto ,  Kenya Yamashita ,  Kunimasa Takahashi ,  Ryoko Miyanaga

发明人： Masao Uchida ,  Makoto Kitabatake ,  Osamu Kusumoto ,  Kenya Yamashita ,  Kunimasa Takahashi ,  Ryoko Miyanaga

IPC分类号： H01L29/76

CPC分类号： H01L29/7802 ,  H01L21/049 ,  H01L29/045 ,  H01L29/0696 ,  H01L29/1608 ,  H01L29/365 ,  H01L29/41766 ,  H01L29/4238 ,  H01L29/518 ,  H01L29/66068 ,  H01L29/7838

摘要： In a semiconductor device of the present invention, the top surface of an n-type silicon carbide layer formed on a silicon carbide substrate is miscut from the (0001) plane in the direction. A gate electrode, a source electrode and other elements are arranged such that in a channel region, the dominating current flows along a miscut direction. In the present invention, a gate insulating film is formed and then heat treatment is performed in an atmosphere containing a group-V element. In this way, the interface state density at the interface between the silicon carbide layer and the gate insulating film is reduced. As a result, the electron mobility becomes higher in a miscut direction A than in the direction perpendicular to the miscut direction A.

公开(公告)号：US07214984B2

公开(公告)日：2007-05-08

申请号：US10553628

申请日：2004-11-24

申请人： Masao Uchida ,  Makoto Kitabatake ,  Osamu Kusumoto ,  Kenya Yamashita ,  Kunimasa Takahashi ,  Ryoko Miyanaga

发明人： Masao Uchida ,  Makoto Kitabatake ,  Osamu Kusumoto ,  Kenya Yamashita ,  Kunimasa Takahashi ,  Ryoko Miyanaga

IPC分类号： H01L29/76

CPC分类号： H01L29/7802 ,  H01L21/049 ,  H01L29/045 ,  H01L29/0696 ,  H01L29/1608 ,  H01L29/365 ,  H01L29/41766 ,  H01L29/4238 ,  H01L29/518 ,  H01L29/66068 ,  H01L29/7838

摘要： In a semiconductor device of the present invention, the top surface of an n-type silicon carbide layer formed on a silicon carbide substrate is miscut from the (0001) plane in the direction. A gate electrode, a source electrode and other elements are arranged such that in a channel region, the dominating current flows along a miscut direction.In the present invention, a gate insulating film is formed and then heat treatment is performed in an atmosphere containing a group-V element. In this way, the interface state density at the interface between the silicon carbide layer and the gate insulating film is reduced. As a result, the electron mobility becomes higher in a miscut direction A than in the direction perpendicular to the miscut direction A.

摘要翻译： 在本发明的半导体器件中，形成在碳化硅衬底上的n型碳化硅层的顶表面从（0001）面向<11-20>方向错开。 栅电极，源电极等元件被布置成使得在通道区域中，主导电流沿着误差方向流动。 在本发明中，形成栅极绝缘膜，然后在含有V族元素的气氛中进行热处理。 以这种方式，碳化硅层和栅极绝缘膜之间的界面处的界面态密度降低。 结果，电子迁移率在错误方向A上比在与错误方向A垂直的方向上更高。

公开(公告)号：US07160748B2

公开(公告)日：2007-01-09

申请号：US11063533

申请日：2005-02-24

申请人： Akihiko Ishibashi ,  Ayumu Tsujimura ,  Yoshiaki Hasegawa ,  Nobuyuki Otsuka ,  Gaku Sugahara ,  Ryoko Miyanaga ,  Toshitaka Shimamoto ,  Kenji Harafuji ,  Yuzaburo Ban ,  Kiyoshi Ohnaka

发明人： Akihiko Ishibashi ,  Ayumu Tsujimura ,  Yoshiaki Hasegawa ,  Nobuyuki Otsuka ,  Gaku Sugahara ,  Ryoko Miyanaga ,  Toshitaka Shimamoto ,  Kenji Harafuji ,  Yuzaburo Ban ,  Kiyoshi Ohnaka

IPC分类号： H01L21/00

CPC分类号： H01L33/007 ,  B82Y20/00 ,  H01L21/0242 ,  H01L21/02458 ,  H01L21/02507 ,  H01L21/0254 ,  H01L21/02579 ,  H01L21/0262 ,  H01L21/0265 ,  H01L33/32 ,  H01S5/22 ,  H01S5/3063 ,  H01S5/3215 ,  H01S5/3216 ,  H01S5/34333 ,  H01S2304/04 ,  H01S2304/12

摘要： The method for fabricating a nitride semiconductor of the present invention includes the steps of: (1) growing a first semiconductor layer made of a first group III nitride over a substrate by supplying a first group III source and a group V source containing nitrogen; and (2) growing a second semiconductor layer made of a second group III nitride on the first semiconductor layer by supplying a second group III source and a group V source containing nitrogen. At least one of the steps (1) and (2) includes the step of supplying a p-type dopant over the substrate, and an area near the interface between the first semiconductor layer and the second semiconductor layer is grown so that the density of the p-type dopant locally increases.

摘要翻译： 本发明的制造氮化物半导体的方法包括以下步骤：（1）通过提供含有氮的第一组III源和V族源，在衬底上生长由第一III族氮化物制成的第一半导体层; 和（2）通过提供第二组III源和含有氮的V族源，在第一半导体层上生长由第二III族氮化物制成的第二半导体层。 步骤（1）和（2）中的至少一个包括在衬底上提供p型掺杂剂的步骤，并且生长第一半导体层和第二半导体层之间的界面附近的区域，使得 p型掺杂剂局部增加。

公开(公告)号：US20060220026A1

公开(公告)日：2006-10-05

申请号：US10553628

申请日：2004-11-24

申请人： Masao Uchida ,  Makoto Kitabatake ,  Osamu Kusumoto ,  Kenya Yamashita ,  Kunimasa Takahashi ,  Ryoko Miyanaga

发明人： Masao Uchida ,  Makoto Kitabatake ,  Osamu Kusumoto ,  Kenya Yamashita ,  Kunimasa Takahashi ,  Ryoko Miyanaga

IPC分类号： H01L31/0312

CPC分类号： H01L29/7802 ,  H01L21/049 ,  H01L29/045 ,  H01L29/0696 ,  H01L29/1608 ,  H01L29/365 ,  H01L29/41766 ,  H01L29/4238 ,  H01L29/518 ,  H01L29/66068 ,  H01L29/7838

摘要： In a semiconductor device of the present invention, the top surface of an n-type silicon carbide layer formed on a silicon carbide substrate is miscut from the (0001) plane in the direction. A gate electrode, a source electrode and other elements are arranged such that in a channel region, the dominating current flows along a miscut direction. In the present invention, a gate insulating film is formed and then heat treatment is performed in an atmosphere containing a group-V element. In this way, the interface state density at the interface between the silicon carbide layer and the gate insulating film is reduced. As a result, the electron mobility becomes higher in a miscut direction A than in the direction perpendicular to the miscut direction A.

摘要翻译： 在本发明的半导体器件中，形成在碳化硅衬底上的n型碳化硅层的顶表面从（0001）面向<11-20>方向错开。 栅电极，源电极等元件被布置成使得在通道区域中，主导电流沿着误差方向流动。 在本发明中，形成栅极绝缘膜，然后在含有V族元素的气氛中进行热处理。 以这种方式，碳化硅层和栅极绝缘膜之间的界面处的界面态密度降低。 结果，电子迁移率在错误方向A上比在与错误方向A垂直的方向上更高。

公开(公告)号：US07092423B2

公开(公告)日：2006-08-15

申请号：US10852132

申请日：2004-05-25

申请人： Masahiro Kume ,  Isao Kidoguchi ,  Yuzaburo Ban ,  Ryoko Miyanaga ,  Masakatsu Suzuki

发明人： Masahiro Kume ,  Isao Kidoguchi ,  Yuzaburo Ban ,  Ryoko Miyanaga ,  Masakatsu Suzuki

IPC分类号： H01S5/00

CPC分类号： H01S5/32341 ,  B82Y20/00 ,  G11B7/123 ,  G11B7/127 ,  H01L2224/16225 ,  H01S5/005 ,  H01S5/0213 ,  H01S5/02208 ,  H01S5/02212 ,  H01S5/0224 ,  H01S5/02272 ,  H01S5/02292 ,  H01S5/0286 ,  H01S5/0683 ,  H01S5/1078 ,  H01S5/2022 ,  H01S5/2027 ,  H01S5/22 ,  H01S5/34333 ,  H01S2301/02 ,  H01S2301/173 ,  H01S2301/176 ,  H01S2304/04

摘要： A semiconductor laser device includes: a first cladding layer, which is made of a nitride semiconductor of a first conductivity type and is formed over a substrate; an active layer, which is made of another nitride semiconductor and is formed over the first cladding layer; and a second cladding layer, which is made of still another nitride semiconductor of a second conductivity type and is formed over the active layer. A spontaneous-emission-absorbing layer, which is made of yet another nitride semiconductor of the first conductivity type and has such an energy gap as absorbing spontaneous emission that has been radiated from the active layer, is formed between the substrate and the first cladding layer.

摘要翻译： 半导体激光器件包括：第一覆层，其由第一导电类型的氮化物半导体制成并形成在衬底上; 活性层，其由另一个氮化物半导体制成并形成在第一包层上; 以及第二覆层，其由另一种第二导电类型的氮化物半导体制成并形成在有源层上。 由第一导电类型的又一个氮化物半导体制成并具有从有源层辐射的吸收自发发射的能隙的自发发射吸收层形成在衬底和第一覆层之间 。