Abstract:
In ion micro-analysis, intensity of at least one species of secondary ions is monitored, and a reference etching time required for etching an implanted depth of primary ions is determined from a profile of a secondary ion intensity signal. Analysis time is graduated on the basis of the reference etching time to represent an analysis signal with the scale of the depth. The primary ions are non-volatile and may be active ions which react with a specimen or metal ions. The analyzed depth can be found during the analysis to prevent unwanted analysis and assure rapid data processing.
Abstract:
An electron energy analyzing apparatus is disclosed in which electrons having passed through a sample are subjected to energy analysis, respective energy values of the crest and trough of an energy peak characterizing a predetermined substance in the sample are selected, subtraction is performed beetween output signals of a detector obtained respectively at the energy values, the sign of a difference between the output signals is judged to separate a background signal from an energy loss peak signal, and a distribution image of the substance is displayed on the basis of the energy loss peak signal containing no background signal.
Abstract:
An electrically conductive sample support mounting for the analysis technique of secondary ion mass spectrometry employs a sample plate accommodating the sample. At the sample plate surface facing an ion beam or neutral particle beam, the sample is arranged in an environment-free fashion fully in the interior of the region impinged or scanned by the ion beam or neutral particle beam. Through the creation of a so-called orifice, interfering influences which can arise from a crater rim and from its surroundings are entirely eliminated. The invention is applied in the case of depth profile measurement of ion-implanted doping materials in semiconductor crystal disks and for the purpose of ultrasensitive trace analysis in solids.
Abstract:
An apparatus for analyzing a sample by electromagnetic irradiation includes a vacuum chamber, a support for holding the sample in the vacuum chamber, an arrangement for irradiating the sample with an electromagnetic beam, a mass analyzer disposed in the vacuum chamber, an arrangement for extracting particles from the sample and introducing them into the mass analyzer and a layer of conductive material situated in the vicinity of support in the zone of the sample.
Abstract:
An ion microprobe analyzer including a detector of secondary particles emitted from a specimen by bombarding a specimen with an ion beam, and means for recording or displaying the relationship between currents of the secondary particles and specific ions. According to this ion microprobe analyzer the influence on the measurement of the work function of a surface of the specimen is eliminated and the measurement of a concentration distribution of an element in a direction toward the depth of the specimen can be measured precisely.
Abstract:
A cylindrical mirror analyzer is described having apparatus for quickly and accurately positioning the area of a sample to be investigated at the proper position for analysis. The cylindrical analyzer includes a pair of coaxial and radially spaced apart cylinders and suitable mechanism for supporting a sample to be investigated on their common axis. Means are provided for forming in the space between the cylinders a charged particle deflecting field which will deflect towards the inner cylinder any charged particles within such space which have issued from the sample. Slots in the inner cylinder define a path for the passage of particles from the sample into the space between the cylinders for deflection and then back through the inner cylinder to the cylindrical axis where such particles are collected for analysis of their energy. A screen of fluorescent material is disposed at a location at which it will be activated by particles issuing from the sample because of the bombardment, and a shield is disposed between the fluorescent screen and the sample to project an unactivated or shadow area on the screen. The positional relationship of the shadow on the screen is indicative of the coordinate position of the area on the sample from which the radiation is emitted and, hence, is indicative of the location of the area under investigation.
Abstract:
Apparatus and method for producing a blocking pattern of the crystalline structure of a solid surface using a low-energy ion beam is shown wherein the low-energy ion beam is focused to a predetermined cross section and directed by an extended bored member onto a predetermined area of the solid surface at an angle greater than 5* and less than 90* enabling the ions to be scattered from the solid surface to produce a projected blocking pattern which impinges upon a fluorescent screen positioned substantially parallel to and spaced a predetermined distance from the solid surface for producing as a visual image the projected blocking pattern representing the crystalline structure of the solid surface. The extended bored member also collimates the focused ion beam into a smaller predetermined cross section and produces secondary electrons while collimating the focused beam to thereby produce a cloud of electrons which neutralize any charge at the solid surface produced by incidence of the collimated ion beam.
Abstract:
An ion lens (12) is located between an ion source (10) and the magnetic sector field of an ion microprobe apparatus, the ion lens having its input focal plane in the region in which the ion beam emitted by the ion source has its smallest cross section, the magnetic sector field being a uniform homogeneous 180* magnetic field in which the ions emitted from the ion lens (12) as parallel bundles are first deflected by 90*, then passed through an aperture for selection of ions of predetermined mass, and again deflected by 90*, to be emitted as parallel bundles of ions of preselected mass. The microprobe may be combined with an electron beam generator which emits a parallel beam of electrons to a second uniform 180* magnetic field, which places the electron beam coaxially with the ion beam. The ion beam passes through a portion of this second magnetic field in a region which is of insufficient field strength to deflect the ion beam, to provide for simultaneous, or selective irradiation of the same spot on a test sample by ions or electrons. Lenses for simultaneous focusing of ions and electrons (FIG. 2) includes a pair of pole shoes with a magnetic field therebetween and a nonmagnetic electrode located between the pole shoes and energized with respect to the pole shoes to provide for combined magnetic and electrical action on the ion, and/or electron beam.
Abstract:
In an ionic microanalyzer, the energy filtering of the ions of the beam providing an image of a sample is effected by means of a spherical capacitor, suitably associated with the magnetic deflector used for the momentum-to-charge ratio filtering, through an intermediate lens system.