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公开(公告)号:US20220069175A1
公开(公告)日:2022-03-03
申请号:US17006690
申请日:2020-08-28
Applicant: Applied Materials, Inc.
Inventor: Yingdong Luo , Lisong Xu , Sivapackia Ganapathiappan , Hou T. Ng , Byung Sung Kwak , Mingwei Zhu , Nag B. Patibandla
Abstract: A light-emitting device includes a plurality of light-emitting diodes, a first cured composition over a first subset of the light-emitting diodes, and a second cured composition over a second subset of light-emitting diodes. The first cured composition includes a first photopolymer and a blue photoluminescent material that is an organic, organometallic, or polymeric material, embedded in the first photopolymer. The second cured composition includes a second photopolymer and a nanomaterial embedded in the second photopolymer. The nanomaterial is selected to emit red or green light in response.
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公开(公告)号:US11239213B2
公开(公告)日:2022-02-01
申请号:US16416098
申请日:2019-05-17
Applicant: Applied Materials Inc.
Inventor: Daihua Zhang , Yingdong Luo , Mingwei Zhu , Hou T. Ng , Sivapackia Ganapathiappan , Nag B. Patibandla
IPC: H01L33/50 , H01L25/075 , H01L33/00 , H01L33/32
Abstract: A method of fabricating a multi-color display includes dispensing a photo-curable fluid over a display having an array of LEDs disposed below a cover layer. The cover has an outer surface with a plurality of recesses, and the photo-curable fluid fills the recesses. The photo-curable fluid includes a color conversion agent. A plurality of LEDs in the array are activated to illuminate and cure the photo-curable fluid to form a color conversion layer in the recesses over the activated LEDs. This layer will convert light from these LEDs to light of a first color. An uncured remainder of the photo-curable fluid is removed. Then the process is repeated with a different photo-curable fluid having a different color conversion agent and a different plurality of LEDs. This forms a second color conversion layer in different plurality of recesses to convert light from these LEDs to light of a second color.
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公开(公告)号:US20220017699A1
公开(公告)日:2022-01-20
申请号:US16933848
申请日:2020-07-20
Applicant: Applied Materials, Inc.
Inventor: Yingdong Luo , Sivapackia Ganapathiappan , Daihua Zhang , Hou T. Ng , Nag B. Patibandla
IPC: C08G77/04 , C09D183/08 , C08F220/18 , C08L33/12 , B29C64/153 , B29C64/35 , B29C64/357 , B29C64/314
Abstract: An implementation described herein provides a binder ink mixture for 3D printing of ceramic parts in a binder jet process. The binder ink mixture includes a molecular space filler and a free radical initiator.
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44.
公开(公告)号:US10953515B2
公开(公告)日:2021-03-23
申请号:US15352647
申请日:2016-11-16
Applicant: Applied Materials, Inc.
Inventor: Sivapackia Ganapathiappan , Boyi Fu , Ashwin Chockalingam , Daniel Redfield , Rajeev Bajaj , Mahendra C. Orilall , Hou T. Ng , Jason G. Fung , Mayu Yamamura
IPC: B24B37/24 , B24B37/22 , B24B37/26 , B29C64/112 , B24D3/28 , B24D11/00 , B24D11/04 , B33Y10/00 , B33Y80/00 , B29C35/08 , C09D4/00 , C09G1/16 , B33Y70/00 , B29K33/04
Abstract: Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.
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公开(公告)号:US10596763B2
公开(公告)日:2020-03-24
申请号:US15809965
申请日:2017-11-10
Applicant: Applied Materials, Inc.
Inventor: Hou T. Ng , Nag B. Patibandla , Sivapackia Ganapathiappan
IPC: B29C64/393 , B29C64/227 , B29C64/209 , B29C64/277 , B29C64/245 , B33Y50/02 , B33Y30/00 , B29C64/236
Abstract: An additive manufacturing apparatus includes a platform, a first support, a first actuator to create relative motion along a first axis such that the first support scans across the platform, one or more printheads supported on the first support above the platform and configured to dispense successive layers of feed material to form a polishing pad, a second support, a second actuator to create relative motion along a second axis substantially perpendicular to the first axis such that the second support scans across the platform in a direction perpendicular to the first axis, and a plurality of individually addressable energy sources supported on the second support above the platform, and a controller. The energy sources are arranged in an array that extends at least along the first axis and configured to emit radiation toward the platform.
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公开(公告)号:US20180079153A1
公开(公告)日:2018-03-22
申请号:US15494333
申请日:2017-04-21
Applicant: Applied Materials, Inc.
Inventor: Hou T. Ng , Nag B. Patibandla , Sivapackia Ganapathiappan
CPC classification number: G01B11/0608 , B24B37/20 , B24B37/245 , B24B37/26 , B24D18/009 , B29C64/112 , B29C64/129 , B29C64/277 , B29C64/386 , B29L2031/736 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y80/00 , G01N2015/1075 , G01N2015/1493
Abstract: An additive manufacturing apparatus includes a platform, a plurality of printheads supported above the platform and configured to dispense successive layers of feed material on a top surface of the platform, the layers of feed material to be formed into a polishing pad, an optical sensor to monitor a dispensing operation of a first printhead of the plurality of printheads, and a controller configured to detect an error condition associated with the first printhead based on monitoring the dispensing operation of the first printhead while operating the printheads to successively dispense the layers of feed material, and adjust a dispensing operation of a second printhead of the plurality of printheads in response to detecting the error condition.
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47.
公开(公告)号:US12283647B2
公开(公告)日:2025-04-22
申请号:US18444277
申请日:2024-02-16
Applicant: Applied Materials, Inc.
Inventor: Yingdong Luo , Daihua Zhang , Hou T. Ng , Sivapackia Ganapathiappan , Nag B. Patibandla
Abstract: A photocurable composition includes quantum dots, quantum dot precursor materials, a chelating agent, one or more monomers, and a photoinitiator. The quantum dots are selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The quantum dot precursor materials include metal atoms or metal ions corresponding to metal components present in the quantum dots. The chelating agent is configured to chelate the quantum dot precursor materials. The photoinitiator initiates polymerization of the one or more monomers in response to absorption of radiation in the second wavelength band.
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公开(公告)号:US20250121472A1
公开(公告)日:2025-04-17
申请号:US18486094
申请日:2023-10-12
Applicant: Applied Materials, Inc.
Inventor: Liu Jiang , Prayudi Lianto , Santosh Kumar Rath , Nina Bao , Muhammad Adli Danish , Aniruddh Khanna , Pin Gian Gan , Mohammad Faizal Bin Aermie Ang , Mayu Yamamura , Sivapackia Ganapathiappan , Daniel Redfield , El Mehdi Bazizi , Yen-Chu Yang , Pang Yen Ong , Rajeev Bajaj
Abstract: Printable resin precursor compositions and polishing articles including printable resin precursors are provided that are particularly suited for polishing substrates utilized in hybrid bonding applications. Methods and articles may include a plurality of first polishing elements, where at least one of the plurality of first polymer layers forms the polishing surface; and one or more second polishing elements, where at least a region of each of the one or more second polishing elements is disposed between at least one of the plurality of first polishing elements and a supporting surface of the polishing pad. One or more first polishing elements have a Shore D hardness of greater than 60, one or more second polishing elements have a Shore D hardness of from about 20 to less than 60, and the polishing article has a total Shore D hardness of greater than or about 50.
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49.
公开(公告)号:US12044963B2
公开(公告)日:2024-07-23
申请号:US16941304
申请日:2020-07-28
Applicant: Applied Materials, Inc.
Inventor: Amita Joshi , Ian Matthew McMackin , Rami Hourani , Yingdong Luo , Sivapackia Ganapathiappan , Ludovic Godet
IPC: G03F7/00 , B29C59/00 , B29C71/02 , B29C71/04 , C01G23/04 , C01G25/02 , C01G33/00 , B82Y10/00 , B82Y40/00
CPC classification number: G03F7/0002 , B29C59/005 , B29C71/02 , B29C71/04 , C01G23/043 , C01G25/02 , C01G33/00 , B82Y10/00 , B82Y40/00 , C01P2004/64
Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.
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公开(公告)号:US20240194837A1
公开(公告)日:2024-06-13
申请号:US18586175
申请日:2024-02-23
Applicant: Applied Materials, Inc.
Inventor: Yingdong Luo , Lisong Xu , Sivapackia Ganapathiappan , Hou T. Ng , Byung Sung Kwak , Mingwei Zhu , Nag B. Patibandla
CPC classification number: H01L33/504 , C09K11/025 , C09K11/06 , H01L33/005 , C09K2211/1007 , C09K2211/1011 , C09K2211/1014 , C09K2211/1029 , C09K2211/1033 , C09K2211/1037 , C09K2211/1044 , C09K2211/1059 , C09K2211/1092 , C09K2211/185 , H01L2933/0041
Abstract: A display includes a light emitting diode and a color conversion layer that includes a polymer matrix, a blue photoluminescent material, and a components of a photoinitiator that initiated polymerization to form the polymer matrix. The blue photoluminescent material is selected to absorb ultraviolet light with a maximum wavelength in a range of about 300 nm to about 430 nm and to emit blue light. The blue photoluminescent material also has an emission peak in a range of about 420 nm to about 480 nm. The full width at half maximum of the emission peak is less than 100 nm, and the photoluminescence quantum yield is in a range of 5% to 100%.
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