Apparatus for fabricating coating and method of fabricating the coating
    43.
    发明授权
    Apparatus for fabricating coating and method of fabricating the coating 失效
    用于制造涂层的装置和制造涂层的方法

    公开(公告)号:US06835523B1

    公开(公告)日:2004-12-28

    申请号:US09396381

    申请日:1999-09-15

    IPC分类号: G11B724

    摘要: In an apparatus for fabricating a carbon coating, an object such as a magnetic r cording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.

    摘要翻译: 在用于制造碳涂层的装置中,诸如磁性介质的物体设置在连接到高频电源的电极的一侧。 向对象提供超声波振动。 在连接到高频电源的电极和接地电极之间产生放电,以在物体表面上制造碳涂层。 此外,将电极间隔设定为6mm以下,将电极间的压力设定为15Torr〜100Torr,由此产生高密度等离子体,以在阳极侧形成离子鞘。 因此,通过轰击离子在物体的表面上制造涂层。

    Method for fabricating a semiconductor device
    44.
    发明授权
    Method for fabricating a semiconductor device 失效
    半导体器件的制造方法

    公开(公告)号:US06461968B1

    公开(公告)日:2002-10-08

    申请号:US09362994

    申请日:1999-07-30

    IPC分类号: H01L21461

    摘要: A method for fabricating a semiconductor device including a semiconductor layer structure, a source electrode and, a drain electrode formed on the semiconductor layer structure, and a source interconnection connected to the source electrode is provided. The method includes the steps of: (a) forming the semiconductor layer structure on a substrate; (b) forming a metal layer structure so as to cover the semiconductor layer structure; (c) forming a resist layer having a predetermined pattern on the metal layer structure: (d) performing a first etching process for the metal layer structure using the resist layer as a mask so as to form the source electrode, the drain electrode and the source interconnection; and (e) performing a second etching process for the semiconductor layer structure using the resist layer as a mask so as to form a transistor gap portion between the source electrode and the drain electrode. The respective first and second etching processes in the steps (d) and (e) are performed using the same resist layer as the mask in the same chamber.

    摘要翻译: 提供一种制造半导体器件的方法,该半导体器件包括形成在半导体层结构上的半导体层结构,源电极和漏电极以及与源极连接的源极互连。 该方法包括以下步骤:(a)在衬底上形成半导体层结构; (b)形成金属层结构以覆盖半导体层结构; (c)在金属层结构上形成具有预定图案的抗蚀剂层:(d)使用抗蚀剂层作为掩模对金属层结构进行第一蚀刻处理,以形成源电极,漏电极和 源互连; 以及(e)使用所述抗蚀剂层作为掩模对所述半导体层结构进行第二蚀刻处理,以在所述源电极和所述漏电极之间形成晶体管间隙部分。 步骤(d)和(e)中的相应的第一和第二蚀刻工艺使用与同一腔室中的掩模相同的抗蚀剂层进行。

    Vitrified abrasive solid mass reinforced by impregnation with synthetic
resin, and method of manufacturing the same
    45.
    发明授权
    Vitrified abrasive solid mass reinforced by impregnation with synthetic resin, and method of manufacturing the same 有权
    通过用合成树脂浸渍增强的玻璃化磨料固体块及其制造方法

    公开(公告)号:US6093225A

    公开(公告)日:2000-07-25

    申请号:US419977

    申请日:1999-10-18

    申请人: Kenji Itoh

    发明人: Kenji Itoh

    摘要: An abrasive vitreous bonded solid mass having a vitrified abrasive structure comprising abrasive grains which are held together by an inorganic bonding agent, the abrasive structure is impregnated with a composition which comprises a thermosetting synthetic resin and a surfactant. The abrasive solid mass is manufactured by preparing the composition including the resin and the surfactant, impregnating the vitrified abrasive structure with the composition, and curing the composition.

    摘要翻译: 具有玻璃化磨料结构的磨料玻璃态粘合固体块,其包含由无机粘合剂保持在一起的磨粒,所述研磨结构用包含热固性合成树脂和表面活性剂的组合物浸渍。 通过制备包括树脂和表面活性剂的组合物,用组合物浸渍玻璃化研磨结构并固化组合物来制造磨料固体物质。

    Multi-part exhaust manifold assembly with welded connections
    46.
    发明授权
    Multi-part exhaust manifold assembly with welded connections 失效
    具有焊接连接的多部件排气歧管组件

    公开(公告)号:US5784881A

    公开(公告)日:1998-07-28

    申请号:US782491

    申请日:1997-01-10

    IPC分类号: F01N13/10 F01N13/18 F01N7/00

    摘要: An exhaust manifold assembly including at least two manifold part members, an annular end projection of one manifold part member receiving an annular end projection of the other manifold part member to form a connection portion, further including (a) an annular slidable tubular member made of a metal material having good heat resistance and oxidation resistance and inserted into a gap between the annular end projections of both manifold part members; and (b) a flexible pipe having a corrugated pipe portion and tubular portions integrally extending from both ends of the corrugated pipe portion, the tubular portions of the flexible pipe being continuously welded to outer surfaces of the manifold part members, whereby the connection portion is completely sealed by the flexible pipe.

    摘要翻译: 包括至少两个歧管部件的排气歧管组件,一个歧管部件的环形端部突出部,其接收另一个歧管部件的环形端部突起以形成连接部分,还包括(a)环形可滑动管状部件, 金属材料具有良好的耐热性和抗氧化性,并插入到两个歧管部件的环形端部突起之间的间隙中; 和(b)柔性管,其具有波纹管部和从波纹管部的两端一体延伸的管状部,柔性管的管状部连续地焊接在歧管部件的外表面,由此连接部为 完全由柔性管密封。

    Video camera with a function to correct defective pixels of solid state
image pickup device and method of correcting defective pixels of solid
state image
    47.
    发明授权
    Video camera with a function to correct defective pixels of solid state image pickup device and method of correcting defective pixels of solid state image 失效
    具有校正固态图像拾取装置的有缺陷像素的功能的摄像机以及校正固态图像的有缺陷像素的方法

    公开(公告)号:US5625413A

    公开(公告)日:1997-04-29

    申请号:US470010

    申请日:1995-06-06

    摘要: When defective pixels of a solid state image pickup device of a video camera are corrected by signal processes, a white spot noise is detected by closing an iris and by comparing the signal level and a level of only a dark current. Further, in this case, a gain of an AGC circuit for controlling a gain of a video signal is raised and a precise detection is executed. By executing such a detecting operation at the time of turn-on or turn-off of a power source, the user is not annoying. In the ordinary photographing, a reference level in detection of a white spot noise is set to an optimum value in accordance with a temperature of the solid state image pickup device or its peripheral temperature or the gain of the AGC circuit so that the white spot noise detection is not influenced by the temperature of the solid state image pickup device or the operating state of the AGC circuit.

    摘要翻译: 当通过信号处理校正摄像机的固态图像拾取装置的缺陷像素时,通过闭合光圈并通过比较信号电平和仅暗电流的电平来检测白点噪声。 此外,在这种情况下,提高用于控制视频信号的增益的AGC电路的增益,并且执行精确的检测。 通过在电源的接通或断开时执行这种检测操作,用户不烦人。 在普通拍摄中,根据固体摄像装置的温度或其周围温度或AGC电路的增益,将白点噪声检测的基准电平设定为最佳值,使得白点噪声 检测不受固态图像拾取装置的温度或AGC电路的操作状态的影响。

    Apparatus for microwave processing in a magnetic field
    48.
    发明授权
    Apparatus for microwave processing in a magnetic field 失效
    磁场微波处理装置

    公开(公告)号:US5609774A

    公开(公告)日:1997-03-11

    申请号:US194571

    申请日:1994-02-10

    IPC分类号: H01J37/32 H01L21/302

    摘要: A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.

    摘要翻译: 微波辅助等离子体处理装置具有反应室,在该反应室中设置有用于支撑被处理基板的基板支架。 保持器与反应室的内部形成一致并且被设置为基本上分离反应室中的反应空间,除了其间的窄间隙,排出的气体从所述反应空间通过所述反应空间进入所述辅助空间。 通过这种结构,可以在反应室中形成高密度等离子体,而不会大量损失输入的微波能量。

    Data imprinting device
    49.
    发明授权
    Data imprinting device 失效
    数据压印设备

    公开(公告)号:US5119119A

    公开(公告)日:1992-06-02

    申请号:US652207

    申请日:1991-02-05

    IPC分类号: G03B17/24

    CPC分类号: G03B17/24 G03B2217/243

    摘要: A data imprinting device of the type in which data are imprinted on the film surface during the time when the film is transported. The device includes a data exposure device positioned on the presser plate which presses the film against the film gate of the camera in fixedly secured relation at a location corresponding to the vicinity of the path of movement of the film and a prohibitor responsive to accidental interruption of the film transportation for prohibiting further imprinting of data until the next frame, which came across the data exposure making device at the time of the accidental interruption, is brought into alignment with the data exposure making means as the film transportaion has been re-started.

    摘要翻译: 数据记录装置,其中在胶片运送时数据被印在胶片表面上。 该装置包括定位在压板上的数据曝光装置,其将胶片以相对于胶片运动路径附近的位置固定地固定在相机的胶片门上,并且响应于意外中断 禁止进一步打印数据的电影传输,直到在意外中断时遇到数据曝光制作装置的下一帧,随着电影传送重新启动而与数据曝光制作装置保持一致。

    Method of wet etching by use of plasma etched carbonaceous masks
    50.
    发明授权
    Method of wet etching by use of plasma etched carbonaceous masks 失效
    通过使用等离子体蚀刻碳质掩模进行湿蚀刻的方法

    公开(公告)号:US5022959A

    公开(公告)日:1991-06-11

    申请号:US392582

    申请日:1989-08-11

    摘要: A substrate having a film to be etched is coated with a carbon film. The carbon film is then coated with an organic mask. The mask is then patterned to expose portions of the carbon film. Plasma etching is then utilized to remove portions of the carbon film not covered by the mask, followed by wet etching to form a predetermined pattern in the film on the substrate.

    摘要翻译: 具有要蚀刻的膜的基板涂覆有碳膜。 然后用有机掩模涂覆碳膜。 然后将掩模图案化以暴露部分碳膜。 然后使用等离子体蚀刻来除去未被掩模覆盖的碳膜的部分,然后进行湿蚀刻以在基板上的膜中形成预定图案。