THIN FILM METAL SILICIDES AND METHODS FOR FORMATION
    49.
    发明申请
    THIN FILM METAL SILICIDES AND METHODS FOR FORMATION 审中-公开
    薄膜金属硅胶及其形成方法

    公开(公告)号:US20160233097A1

    公开(公告)日:2016-08-11

    申请号:US15007867

    申请日:2016-01-27

    Abstract: The disclosed subject matter provides thin films including a metal silicide and methods for forming such films. The disclosed subject matter can provide techniques for tailoring the electronic structure of metal thin films to produce desirable properties. In example embodiments, the metal silicide can comprise a platinum silicide, such as for example, PtSi, Pt2Si, or Pt3Si. For example, the disclosed subject matter provides methods which include identifying a desired phase of a metal silicide, providing a substrate, depositing at least two film layers on the substrate which include a first layer including amorphous silicon and a second layer including metal contacting the first layer, and annealing the two film layers to form a metal silicide. Methods can be at least one of a source-limited method and a kinetically-limited method. The film layers can be deposited on the substrate using techniques known in the art including, for example, sputter depositing.

    Abstract translation: 所公开的主题提供了包括金属硅化物的薄膜和用于形成这种膜的方法。 所公开的主题可以提供用于定制金属薄膜的电子结构以产生期望特性的技术。 在示例性实施例中,金属硅化物可以包括铂硅化物,例如PtSi,Pt 2 Si或Pt 3 Si。 例如,所公开的主题提供了包括识别金属硅化物的期望相位,提供衬底,在衬底上沉积至少两个膜层的方法,该至少两个膜层包括包含非晶硅的第一层和包括与第一层接触的金属的第二层 层,并且退火两个膜层以形成金属硅化物。 方法可以是源限制方法和动力学限制方法中的至少一种。 可以使用本领域已知的技术将膜层沉积在基板上,包括例如溅射沉积。

    Mixed-technology combination of programmable elements
    50.
    发明授权
    Mixed-technology combination of programmable elements 有权
    可编程元件的混合技术组合

    公开(公告)号:US09413337B2

    公开(公告)日:2016-08-09

    申请号:US13873964

    申请日:2013-04-30

    Applicant: Wispry, Inc.

    Abstract: The present subject matter relates to systems and methods for arranging and controlling programmable combinations of tuning elements in which more than one form of switching technology is combined in a single array. Specifically, such an array can include one or more first switchable elements including a first switching technology (e.g., one or more solid-state-controlled devices) and one or more second switchable elements including a second switching technology that is different than the first switching technology (e.g., one or more micro-electro-mechanical capacitors). The one or more first switchable elements and the one or more second switchable elements can be configured, however, to deliver a combined variable reactance.

    Abstract translation: 本主题涉及用于布置和控制调谐元件的可编程组合的系统和方法,其中多个形式的开关技术组合在单个阵列中。 具体地,这样的阵列可以包括一个或多个第一可切换元件,包括第一切换技术(例如,一个或多个固态控制设备)和一个或多个第二可切换元件,其包括与第一开关不同的第二开关技术 技术(例如,一个或多个微电机电容器)。 然而,可以配置一个或多个第一可切换元件和一个或多个第二可切换元件以传递组合的可变电抗。

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