公开(公告)号：US5729074A

公开(公告)日：1998-03-17

申请号：US407155

申请日：1995-03-20

Applicant: Hiromu Shiomi ,  Yoshiki Nishibayashi ,  Shin-ichi Shikata

Inventor： Hiromu Shiomi ,  Yoshiki Nishibayashi ,  Shin-ichi Shikata

IPC: B81B3/00 ,  B81C1/00 ,  G01C19/56 ,  G01H3/08 ,  G01H11/00 ,  G01H11/06 ,  G01L9/00 ,  G01P15/08 ,  G01P15/125 ,  G01Q70/14 ,  G01Q80/00

CPC classification number: G01P15/0802 ,  B81B3/007 ,  B81C1/0015 ,  B81C1/00682 ,  G01H11/00 ,  G01H11/06 ,  G01H3/08 ,  G01P15/125 ,  B81B2201/0235 ,  B81B2201/0264 ,  B81B2201/034 ,  B81B2201/035 ,  B81B2201/054 ,  B81B2203/0118 ,  B81B2203/04 ,  B81C2201/0109 ,  G01P2015/0828

Abstract: A micro mechanical component of the present invention comprises a base, and at least one drive portion supported on the base and relatively driving to the base, in which the drive portion is formed from a diamond layer. Thus, because the drive portion has excellent mechanical strength and modulus of elasticity, the operational performance can be greatly improved as a micro mechanical component processed in a fine shape, from the conventional level. Further, because the drive portion exhibits excellent device characteristics under severe circumstances, the range of applications as a micro mechanical component can be widely expanded from the conventional range.

公开(公告)号：US5364742A

公开(公告)日：1994-11-15

申请号：US948189

申请日：1992-09-21

Applicant: Long-Shen Fan ,  Hans H. Zappe

Inventor： Long-Shen Fan ,  Hans H. Zappe

IPC: C23C28/00 ,  B81B5/00 ,  B81C99/00 ,  G03F7/00 ,  G03F7/11 ,  G03F7/26 ,  H01L21/306 ,  H02N1/00 ,  G03C5/00 ,  B44C1/22

CPC classification number: G03F7/11 ,  B81C99/0085 ,  G03F7/00 ,  H02N1/008 ,  B81B2201/035 ,  B81B2201/037

Abstract: In the fabrication of a free-standing miniaturized structure in a range of about 10 to 20 .mu.m thick, a method based on a sacrificial system includes the steps of selecting a substrate material, depositing on the substrate material a sacrificial layer of material and patterning the sacrificial layer to define a shape. A photoresist layer of material is deposited on the sacrificial layer and patterned by contrast-enhanced photolithography to form a photoresist mold. Upon the mold there is plated a metallic layer of material. The electroplated structure conforms to the resist profile and can have a thickness many times that of conventional polysilicon microstructures. The photoresist mold and the sacrificial layer are thereafter dissolved using etchants to form a free standing metallic structure in a range of about 10 to 20 .mu.m thick, with vertical to lateral aspect ratios of 9:1 to 10:1 or more.

Abstract translation: 在制造大约10至20μm厚的独立小型化结构的过程中，基于牺牲系统的方法包括以下步骤：选择衬底材料，在衬底材料上沉积材料的牺牲层和图案化 牺牲层来定义一个形状。 材料的光致抗蚀剂层沉积在牺牲层上并通过对比度增强的光刻法形成光致抗蚀剂模具。 在模具上镀有金属层材料。 电镀结构符合抗蚀剂轮廓，并且其厚度可以是常规多晶硅微结构的厚度。 然后，使用蚀刻剂溶解光致抗蚀剂模具和牺牲层，以形成约10至20μm厚的独立金属结构，垂直与横向纵横比为9:1至10:1或更高。

公开(公告)号：US5334342A

公开(公告)日：1994-08-02

申请号：US58521

申请日：1993-05-04

Applicant: Alan B. Harker ,  Jeffrey F. DeNatale ,  Patrick J. Hood ,  John F. Flintoff

Inventor： Alan B. Harker ,  Jeffrey F. DeNatale ,  Patrick J. Hood ,  John F. Flintoff

IPC: B81B3/00 ,  B81C99/00 ,  C23C16/02 ,  C23C16/27 ,  G02B1/11 ,  G03F7/00 ,  B29C33/76 ,  C23C16/22

CPC classification number: G02B1/118 ,  B81C1/00111 ,  B81C1/00198 ,  B81C1/0038 ,  C23C16/0227 ,  C23C16/0272 ,  C23C16/274 ,  C23C16/277 ,  G03F7/00 ,  B81B2201/035 ,  B81B2201/047 ,  B81C2201/0191 ,  B81C2201/056 ,  Y10T428/30

Abstract: A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate. A fine-grained nucleation geometry, established at the nucleation sites, is maintained as the diamond film is deposited over the entire substrate after the silicon nitride resist is removed. The process can be extended to form surface relief features, such as "moth eye" surfaces, and microstructures of fine-grained polycrystalline diamond, such as rotatable microgears and surface relief patterns, that have the desirable characteristics of hardness, wear resistance, thermal conductivity, chemical inertness, anti-reflectance, and a low coefficient of friction.

Abstract translation: 将高温抗蚀剂工艺与用于生产需要高温沉积环境的材料（例如金刚石膜）的微光刻图案组合。 对于金刚石膜，可以使用高温氮化硅抗蚀剂用于硅衬底的微光刻图案以提供金刚石成核位点的均匀分布并且改善金刚石膜对衬底的粘附。 在去除氮化硅抗蚀剂之后，在整个衬底上沉积金刚石膜，保持在成核位置建立的细晶粒成核几何形状。 该过程可以扩展以形成具有理想的硬度，耐磨性，导热性的特征的表面浮雕特征，例如“蛾眼”表面和细晶粒多晶金刚石的微观结构，例如可旋转的微观尺寸和表面浮雕图案 ，化学惰性，抗反射性和低摩擦系数。

公开(公告)号：US09912257B2

公开(公告)日：2018-03-06

申请号：US14512176

申请日：2014-10-10

Applicant: Harold L. Stalford

Inventor： Harold L. Stalford

IPC: H02N10/00 ,  B81B7/02

CPC classification number: H02N10/00 ,  B81B3/0051 ,  B81B7/02 ,  B81B2201/035 ,  B81B2201/037 ,  F03G7/065 ,  F16C33/20 ,  F16C33/201 ,  F16C33/208 ,  F16C2223/60 ,  F16C2223/70 ,  H02N1/008 ,  H02N11/006

Abstract: A micro machine may be in or less than the micrometer domain. The micro machine may include a micro actuator and a micro shaft coupled to the micro actuator. The micro shaft is operable to be driven by the micro actuator. A tool is coupled to the micro shaft and is operable to perform work in response to at least motion of the micro shaft.

公开(公告)号：US20170220004A1

公开(公告)日：2017-08-03

申请号：US15417854

申请日：2017-01-27

Applicant: ROLEX SA

Inventor： Richard Bossart ,  Florian Calame

IPC: G04B31/06 ,  G04B1/14

CPC classification number: G04B31/06 ,  B81B2201/035 ,  B81C99/0085 ,  B81C2201/034 ,  G04B1/145 ,  G04B13/02 ,  G04B15/14 ,  G04B17/063 ,  G04B17/066 ,  G04B18/08 ,  G04B19/042 ,  G04B19/044

Abstract: Process for manufacturing a hybrid timepiece component, wherein the following steps are comprised: comprising structuring at least one wafer (14) of a first micromachinable material so as to form at least one through-opening (15) within the wafer (14), said structured wafer (14) being intended to form a first part (4) of the hybrid timepiece; component and depositing a metal by electroforming, so that the metal extends through the through-opening (15) and over the two upper and lower faces of the wafer (14) as a single piece resulting from one and the same electroforming step, the electroformed metal being intended to form a second part (8) of the hybrid timepiece component.

公开(公告)号：US09365941B2

公开(公告)日：2016-06-14

申请号：US13212636

申请日：2011-08-18

Applicant: Clément Saucy

Inventor： Clément Saucy

IPC: C25D1/00 ,  B81C99/00 ,  C25D1/20 ,  G03F7/00

CPC classification number: C25D1/003 ,  B81B2201/035 ,  B81C99/0085 ,  B81C2201/032 ,  C25D1/20 ,  G03F7/00

Abstract: The invention relates to a process for fabricating a monolayer or multilayer metal structure in LIGA technology, in which a photoresist layer is deposited on a flat metal substrate, a photoresist mold is created by irradiation or electron or ion bombardment, a metal or alloy is electroplated in this mold, the electroformed metal structure is detached from the substrate and the photoresist is separated from this metal structure, wherein the metal substrate is used as an agent involved in the forming of at least one surface of the metal structure other than that formed by the plane surface of the substrate.

公开(公告)号：US09342053B2

公开(公告)日：2016-05-17

申请号：US14103243

申请日：2013-12-11

Applicant: PATEK PHILIPPE SA GENEVE

Inventor： Frédéric Maier ,  Stéphane Von Gunten ,  Sylvain Jeanneret

IPC: G04B5/16 ,  G04B13/02 ,  G04B17/06 ,  G04D3/00 ,  B81C99/00 ,  G04F7/08

CPC classification number: G04D3/00 ,  B81B2201/035 ,  B81C99/0085 ,  B81C99/0095 ,  G04B5/165 ,  G04B13/02 ,  G04B13/022 ,  G04B13/026 ,  G04B17/063 ,  G04D3/0069 ,  G04F7/08 ,  Y10T29/49579 ,  Y10T29/49581

Abstract: A method of manufacturing a timepiece component, such as a balance, an oscillating mass or a wheel, comprises a micro-manufacturing technique, such as the DRIE technique. The method may comprise forming at least one member in or at the periphery of the structure, of a material different from that of the structure. This member is typically metal and is formed by electro-forming using a cavity of the structure as a mold.

Abstract translation: 制造诸如天平，振动块或车轮的钟表件的方法包括诸如DRIE技术的微制造技术。 该方法可以包括在结构中或其周围的至少一个构件上形成不同于该结构材料的材料。 该构件通常是金属，并且通过使用结构的空腔作为模具进行电成型而形成。

公开(公告)号：US09139925B2

公开(公告)日：2015-09-22

申请号：US13644215

申请日：2012-10-03

Applicant: Nivarox-FAR S.A.

Inventor： Pierre Cusin ,  Clare Golfier ,  Jean-Philippe Thiebaud

IPC: C25D1/10 ,  C25D1/00 ,  C25D17/00 ,  B81C99/00

CPC classification number: C25D1/10 ,  B81B2201/035 ,  B81C99/009 ,  C25D17/00

Abstract: The invention concerns the field of micromechanical parts, in particular, for timepiece movements. The invention relates to a method of fabricating a mold that includes the following steps: (a) providing a substrate that has a top layer and a bottom layer made of electrically conductive, micromachinable material, and secured to each other by an electrically insulating, intermediate layer; (b) etching at least one pattern in the top layer as far as the intermediate layer to form at least one cavity in the mold; (c) coating the top part of the substrate with an electrically insulating coating; and (d) directionally etching the coating and the intermediate layer to limit the presence thereof exclusively at each vertical wall formed in the top layer.

Abstract translation: 本发明涉及微机械部件领域，特别涉及用于钟表运动的领域。 本发明涉及一种制造模具的方法，包括以下步骤：（a）提供具有由导电的可微加工材料制成的顶层和底层的基底，并通过电绝缘的中间体彼此固定 层; （b）蚀刻顶层中的至少一个图案直到中间层，以在模具中形成至少一个空腔; （c）用电绝缘涂层涂覆基材的顶部; 和（d）定向地蚀刻涂层和中间层，以限制其在顶层中形成的每个垂直壁上的存在。

公开(公告)号：US08636050B2

公开(公告)日：2014-01-28

申请号：US13365041

申请日：2012-02-02

Applicant: Pierre Cusin ,  David Richard ,  Philippe Dubois

Inventor： Pierre Cusin ,  David Richard ,  Philippe Dubois

IPC: B22C7/00 ,  B22D19/00 ,  B22D23/00

CPC classification number: B81C99/0085 ,  B81B2201/035

Abstract: The invention relates to a method of fabricating a micromechanical part made of a single piece material. According to the invention, the method includes the following steps: a) forming a substrate which includes the negative cavity for said micromechanical part to be fabricated; b) forming a sacrificial layer on one portion of the substrate; c) depositing particles on the substrate intended to form a germ ination layer; d) removing the sacrificial layer so as to selectively leave one portion of the substrate free of any particles; e) depositing a layer of material by chemical vapour phase deposition so that the material is exclusively deposited where the particles remain; f) removing the substrate to release the micromechanical part formed in said negative cavity.

Abstract translation: 本发明涉及一种制造由单片材料制成的微机械部件的方法。 根据本发明，该方法包括以下步骤：a）形成包括用于所要制造的微机械部件的负空腔的基片; b）在衬底的一部分上形成牺牲层; c）在用于形成胚芽层的基底上沉积颗粒; d）去除牺牲层，以便选择性地使衬底的一部分没有任何颗粒; e）通过化学气相沉积沉积一层材料，使得材料被专门沉积在颗粒保留的地方; f）去除衬底以释放形成在所述负腔中的微机械部件。

公开(公告)号：US20130234165A1

公开(公告)日：2013-09-12

申请号：US13885761

申请日：2011-10-20

Applicant: Stewes Bourban ,  David Richard ,  Beat Gilomen ,  Detlef Steinmüller ,  Herwig Drexel ,  Doris Steinmüller ,  Slimane Gnodbane

Inventor： Stewes Bourban ,  David Richard ,  Beat Gilomen ,  Detlef Steinmüller ,  Herwig Drexel ,  Doris Steinmüller ,  Slimane Gnodbane

IPC: H01L21/02

CPC classification number: H01L21/02527 ,  B81B3/0075 ,  B81B2201/035 ,  B81C2201/0119 ,  C23C16/27 ,  C23C16/278 ,  C23C16/279 ,  G04B15/14

Abstract: Method for coating micromechanical components of a micromechanical system, in particular a watch movement, comprising: providing a substrate (4) component to be coated; providing said component with a first diamond coating (2) doped with boron; providing said component with a second diamond coating (3); wherein: said second diamond coating (3) is provided by CVD in a reaction chamber; during CVD deposition, during the last portion of the growth process, a controlled increase of the carbon content within the reaction chamber is provided, thereby providing an increase of the sp2/sp3 carbon (6) bonds up to an sp2 content substantially between 1% and 45%. Corresponding micromechanical components are also provided.

Abstract translation: 用于涂覆微机械系统的微机械部件的方法，特别是手表机芯，包括：提供待涂覆的基底（4）部件; 向所述部件提供掺杂有硼的第一金刚石涂层（2）; 向所述部件提供第二金刚石涂层（3）; 其中：所述第二金刚石涂层（3）通过CVD在反应室中提供; 在CVD沉积期间，在生长过程的最后部分期间，提供了控制在反应室内的碳含量的增加，从而提供sp2 / sp3碳（6）键的增加，直到sp2含量基本上在1％ 和45％。 还提供了相应的微机械部件。