公开(公告)号：US08530853B2

公开(公告)日：2013-09-10

申请号：US13369008

申请日：2012-02-08

Applicant: Adam V. Steele ,  Brenton J. Knuffman ,  Jabez J. McClelland

Inventor： Adam V. Steele ,  Brenton J. Knuffman ,  Jabez J. McClelland

IPC: H01J27/24

CPC classification number: H01J27/022 ,  G21K1/00 ,  H01J27/24 ,  H01J37/065 ,  H01J37/08 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/0815 ,  H05H3/02

Abstract: A system for producing a charged particle beam from a photoionized cold atom beam. A vapor of neutral atoms is generated. From these atoms, an atom beam having axial and transverse velocity distributions controlled by the application of laser light is produced. The produced atom beam is spatially compressed along each transverse axis, thus reducing the cross-sectional area of the produced beam and reducing a velocity spread of the produced beam along directions transverse to the beam's direction of propagation. Laser light is directed onto at least a portion of the neutral atoms in the atom beam, thereby producing ions and electrons. An electric field is generated at the location of the produced ions and electrons, thereby producing a beam of ions traveling in a first direction and electrons traveling in substantially the opposite direction. A vacuum chamber contains the atom beam, the ion beam and the electron beam.

Abstract translation: 用于从光电离冷原子束产生带电粒子束的系统。 产生中性原子的蒸汽。 由这些原子产生具有通过应用激光控制的轴向和横向速度分布的原子束。 所产生的原子束沿着每个横向轴线被空间压缩，从而减小所产生的光束的横截面面积，并且减小所产生的光束沿横向于光束传播方向的方向的速度扩展。 激光被引导到原子束中的至少一部分中性原子，从而产生离子和电子。 在产生的离子和电子的位置处产生电场，从而产生沿第一方向行进的离子束和基本上相反方向行进的电子。 真空室包含原子束，离子束和电子束。

公开(公告)号：US08501624B2

公开(公告)日：2013-08-06

申请号：US12328096

申请日：2008-12-04

Applicant: Bon-Woong Koo ,  Victor Benveniste ,  Christopher A. Rowland ,  Craig R. Chaney ,  Frank Sinclair ,  Neil J. Bassom

Inventor： Bon-Woong Koo ,  Victor Benveniste ,  Christopher A. Rowland ,  Craig R. Chaney ,  Frank Sinclair ,  Neil J. Bassom

IPC: H01L21/302 ,  H01L21/461

CPC classification number: H01J27/022 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32412 ,  H01J37/32422 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0815 ,  H01J2237/24514

Abstract: An ion source that utilizes exited and/or atomic gas injection is disclosed. In an ion beam application, the source gas can be used directly, as it is traditionally supplied. Alternatively or additionally, the source gas can be altered by passing it through a remote plasma source prior to being introduced to the ion source chamber. This can be used to create excited neutrals, heavy ions, metastable molecules or multiply charged ions. In another embodiment, multiple gasses are used, where one or more of the gasses are passed through a remote plasma generator. In certain embodiments, the gasses are combined in a single plasma generator before being supplied to the ion source chamber. In plasma immersion applications, plasma is injected into the process chamber through one or more additional gas injection locations. These injection locations allow the influx of additional plasma, produced by remote plasma sources external to the process chamber.

Abstract translation: 公开了一种利用离子源和/或原子气体注入的离子源。 在离子束施加中，源气体可以直接使用，如通常提供的。 或者或另外，源气体可以在被引入离子源室之前通过将其通过远程等离子体源来改变。 这可以用于产生兴奋的中性粒子，重离子，亚稳分子或多电荷离子。 在另一个实施例中，使用多个气体，其中一个或多个气体通过远程等离子体发生器。 在某些实施方案中，气体在被提供给离子源室之前组合在单个等离子体发生器中。 在等离子体浸渍应用中，通过一个或多个另外的气体注入位置将等离子体注入到处理室中。 这些注入位置允许通过处理室外部的远程等离子体源产生的附加等离子体的流入。

公开(公告)号：US08445870B2

公开(公告)日：2013-05-21

申请号：US13338456

申请日：2011-12-28

Applicant: Shouyin Zhang ,  Tom Miller ,  Sean Kellog ,  Anthony Graupera

Inventor： Shouyin Zhang ,  Tom Miller ,  Sean Kellog ,  Anthony Graupera

IPC: H01J37/30 ,  H01J37/302

CPC classification number: H01J37/3005 ,  H01J37/3023 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/06366 ,  H01J2237/0815 ,  H01J2237/31749

Abstract: A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled.

Abstract translation: 一种在采用电感耦合等离子体离子源的聚焦离子束（FIB）系统中进行铣削和成像的方法，其中使用两组FIB系统操作参数：第一组，表示用于在铣削中操作FIB系统的优化参数 模式，以及表示用于在成像模式下操作的优化参数的第二组。 这些操作参数可以包括ICP源中的气体压力，ICP源的RF功率，离子提取电压，以及在一些实施例中，FIB系统离子列内的各种参数，包括透镜电压和光束限定孔直径 。 优化的铣削工艺提供了从基材表面快速去除材料的体积（低空间分辨率）的最大研磨速度。 优化的成像过程提供最小化的材料去除和更高的空间分辨率，用于改进正在研磨的衬底区域的成像。

公开(公告)号：US20120319000A1

公开(公告)日：2012-12-20

申请号：US13437518

申请日：2012-04-02

Applicant: John Keller ,  Noel Smith ,  Roderick Boswell ,  Lawrence Scipioni ,  Christine Charles ,  Orson Sutherland

Inventor： John Keller ,  Noel Smith ,  Roderick Boswell ,  Lawrence Scipioni ,  Christine Charles ,  Orson Sutherland

IPC: G21K5/04

CPC classification number: H01J37/32183 ,  H01J27/16 ,  H01J37/08 ,  H01J37/241 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32669 ,  H01J2237/0815

Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.

Abstract translation: 本发明提供了一种电感耦合磁增强型离子束源，适用于与探针形成光学器件结合使用以产生离子束而不产生由该源引起的动能振荡。

公开(公告)号：US20120080148A1

公开(公告)日：2012-04-05

申请号：US12894779

申请日：2010-09-30

Applicant: Shouyin Zhang

Inventor： Shouyin Zhang

IPC: C23F1/08

CPC classification number: H01J37/08 ,  H01J37/3211 ,  H01J2237/0815

Abstract: An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield.

Abstract translation: 公开了一种用于聚焦离子束（FIB）系统的电感耦合等离子体离子源，其包括具有进料气体输送系统的绝缘等离子体室，与等离子体室同心定位的紧凑射频（RF）天线线圈， 或与等离子体室的外径接触。 在一些实施例中，等离子体室由法拉第屏蔽围绕，以防止天线上的RF电压与等离子体室内的等离子体之间的电容耦合。 高介电强度绝缘管热收缩到用于形成天线的导电管或导线的外径上，以允许天线线圈内的匝紧密封装。 绝缘管能够防止天线的不同部分之间以及天线和法拉第屏蔽之间的RF电压差异。

公开(公告)号：US20110248179A1

公开(公告)日：2011-10-13

申请号：US13082983

申请日：2011-04-08

Applicant: Joseph M. Matesa, Jr. ,  Paul E. Fischione

Inventor： Joseph M. Matesa, Jr. ,  Paul E. Fischione

IPC: H01J3/20

CPC classification number: H01J37/08 ,  H01J27/04 ,  H01J37/3056 ,  H01J2237/061 ,  H01J2237/0815

Abstract: An ion source is disclosed which utilizes independently powered electrodes that are isolated with a series of insulators. The ion source comprises an anode electrode with a hollow interior, where the anode is disposed between a cathode and an anti-cathode. A magnet or electro-magnet imposes a magnetic field in an axial direction through the bore of the anode. Gas is introduced into the anode area at a controllable pressure. The ion source includes a first voltage differential between the anode and cathode for the production of plasma and a second voltage differential between the anode and the anti-cathode for extraction of ions from the plasma, forming an ion beam, which is preferably of a narrow diameter at low beam energy. In particular, the voltage differential between the anti-cathode and anode is adjusted to control the initial beam divergence of extracted ions. An optional focus electrode with an independent power supply further focuses the ion beam. A final electrode defines the output boundary of the ion source to provide un-perturbed drift of the ions into the vacuum chamber.

Abstract translation: 公开了一种离子源，其利用与一系列绝缘体隔离的独立供电的电极。 离子源包括具有中空内部的阳极电极，其中阳极设置在阴极和反阴极之间。 磁体或电磁铁通过阳极的孔沿轴向施加磁场。 气体以可控的压力被引入阳极区域。 离子源包括用于产生等离子体的阳极和阴极之间的第一电压差和用于从等离子体提取离子的阳极和反阴极之间的第二电压差，形成离子束，其优选地为窄 直径在低光束能量。 特别地，调整反阴极和阳极之间的电压差以控制提取的离子的初始光束发散。 具有独立电源的可选聚焦电极进一步聚焦离子束。 最终电极定义了离子源的输出边界，以提供离子到真空室中的无扰动漂移。

公开(公告)号：US20110101213A1

公开(公告)日：2011-05-05

申请号：US12609912

申请日：2009-10-30

Applicant: Shu Satoh

Inventor： Shu Satoh

IPC: H01J37/08 ,  B01D59/44

CPC classification number: H01J37/3171 ,  H01J37/08 ,  H01J2237/0048 ,  H01J2237/0815

Abstract: Methods and a system of an ion implantation system are disclosed that are capable of increasing beam current above a maximum kinetic energy of a first charge state from an ion source without changing the charge state at the ion source. Positive ions having a first positive charge state are selected into an accelerator. The positive ions of the first positive charge state are accelerated in acceleration stages and stripped to convert them to positive ions of a second charge state. A second kinetic energy level higher than the maximum kinetic energy level of the first charge state can be obtained.

Abstract translation: 公开了一种离子注入系统的方法和系统，其能够在不改变离子源处的电荷状态的情况下从离子源增加高于第一电荷状态的最大动能的束电流。 选择具有第一正电荷状态的正离子进入加速器。 第一正电荷状态的正离子在加速阶段加速并剥离，以将其转换成第二电荷状态的正离子。 可以获得高于第一充电状态的最大动能水平的第二动能水平。

公开(公告)号：US20100294648A1

公开(公告)日：2010-11-25

申请号：US12704123

申请日：2010-02-11

Applicant: John Keller ,  Noel Smith ,  Roderick Boswell ,  Lawrence Scipioni ,  Christine Charles ,  Orson Sutherland

Inventor： John Keller ,  Noel Smith ,  Roderick Boswell ,  Lawrence Scipioni ,  Christine Charles ,  Orson Sutherland

IPC: C23C14/46 ,  H01J27/02

CPC classification number: H01J37/32183 ,  H01J27/16 ,  H01J37/08 ,  H01J37/241 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32669 ,  H01J2237/0815

Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.

Abstract translation: 本发明提供了一种电感耦合磁增强型离子束源，适用于与探针形成光学器件结合使用以产生离子束而不产生由该源引起的动能振荡。

公开(公告)号：US20090162572A1

公开(公告)日：2009-06-25

申请号：US12333861

申请日：2008-12-12

Applicant: Vijayen Veerasamy ,  Manfred Weiler ,  Eric Li

Inventor： Vijayen Veerasamy ,  Manfred Weiler ,  Eric Li

IPC: H05H1/24 ,  C23C16/26

CPC classification number: H01J37/32357 ,  C03C17/22 ,  C03C2217/282 ,  C03C2218/151 ,  C23C16/26 ,  C23C16/486 ,  G11B5/72 ,  G11B5/8408 ,  H01J27/18 ,  H01J37/08 ,  H01J37/32091 ,  H01J2237/0815 ,  Y10T428/1164 ,  Y10T428/24355 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31678

Abstract: The invention provides systems and methods for the deposition of an improved diamond-like carbon material, particularly for the production of magnetic recording media. The diamond-like carbon material of the present invention is highly tetrahedral, that is, it features a large number of the sp3 carbon-carbon bonds which are found within a diamond crystal lattice. The material is also amorphous, providing a combination of short-range order with long-range disorder, and can be deposited as films which are ultrasmooth and continuous at thicknesses substantially lower than known amorphous carbon coating materials. The carbon protective coatings of the present invention will often be hydrogenated. In a preferred method for depositing of these materials, capacitive coupling forms a highly uniform, selectively energized stream of ions from a dense, inductively ionized plasma. Such inductive ionization is enhanced by a relatively slow moving (or “quasi-static”) magnetic field, which promotes resonant ionization and ion beam homogenization.

Abstract translation: 本发明提供用于沉积改进的类金刚石碳材料的系统和方法，特别是用于生产磁记录介质。 本发明的类金刚石碳材料是高度四面体的，即具有大量在金刚石晶格内发现的sp 3碳 - 碳键。 该材料也是无定形的，提供短距离顺序与远程障碍的组合，并且可以以基本上低于已知无定形碳涂层材料的厚度超薄且连续的膜沉积。 本发明的碳保护涂层通常将被氢化。 在用于沉积这些材料的优选方法中，电容耦合形成来自致密的感应电离等离子体的高度均匀的选择性激励的离子流。 这种感应电离通过相对较慢的移动（或“准静态”）磁场增强，这促进了共振电离和离子束均匀化。

公开(公告)号：US07544397B2

公开(公告)日：2009-06-09

申请号：US10773796

申请日：2004-02-06

Applicant: Vijayen Veerasamy ,  Manfred Weiler ,  Eric Li

Inventor： Vijayen Veerasamy ,  Manfred Weiler ,  Eric Li

IPC: C23C14/06 ,  C23C14/22 ,  C23C16/26 ,  C23C16/50 ,  H05H1/16 ,  H05H1/24 ,  C23C14/48 ,  C23C14/46 ,  C23C16/27

CPC classification number: H01J37/32357 ,  C03C17/22 ,  C03C2217/282 ,  C03C2218/151 ,  C23C16/26 ,  C23C16/486 ,  G11B5/72 ,  G11B5/8408 ,  H01J27/18 ,  H01J37/08 ,  H01J37/32091 ,  H01J2237/0815 ,  Y10T428/1164 ,  Y10T428/24355 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31678

Abstract: The invention provides systems and methods for the deposition of an improved diamond-like carbon material, particularly for the production of magnetic recording media. The diamond-like carbon material of the present invention is highly tetrahedral, that is, it features a large number of the sp3 carbon-carbon bonds which are found within a diamond crystal lattice. The material is also amorphous, providing a combination of short-range order with long-range disorder, and can be deposited as films which are ultrasmooth and continuous at thicknesses substantially lower than known amorphous carbon coating materials. The carbon protective coatings of the present invention will often be hydrogenated. In a preferred method for depositing of these materials, capacitive coupling forms a highly uniform, selectively energized stream of ions from a dense, inductively ionized plasma. Such inductive ionization is enhanced by a relatively slow moving (or “quasi-static”) magnetic field, which promotes resonant ionization and ion beam homogenization.

Abstract translation: 本发明提供用于沉积改进的类金刚石碳材料的系统和方法，特别是用于生产磁记录介质。 本发明的类金刚石碳材料是高度四面体的，即具有大量在金刚石晶格内发现的sp 3碳 - 碳键。 该材料也是无定形的，提供短距离顺序与远程障碍的组合，并且可以以基本上低于已知无定形碳涂层材料的厚度超薄且连续的膜沉积。 本发明的碳保护涂层通常将被氢化。 在用于沉积这些材料的优选方法中，电容耦合形成来自致密的感应电离等离子体的高度均匀的选择性激励的离子流。 这种感应电离通过相对较慢的移动（或“准静态”）磁场增强，这促进了共振电离和离子束均匀化。