公开(公告)号：US09767988B2

公开(公告)日：2017-09-19

申请号：US13596976

申请日：2012-08-28

申请人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

发明人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

IPC分类号： C23C14/00 ,  H01J37/32

CPC分类号： H01J37/32009 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

公开(公告)号：US09685297B2

公开(公告)日：2017-06-20

申请号：US13597093

申请日：2012-08-28

申请人： Daniel Carter ,  Victor Brouk ,  Daniel J. Hoffman

发明人： Daniel Carter ,  Victor Brouk ,  Daniel J. Hoffman

IPC分类号： C23C14/34 ,  H01J37/08 ,  G01N27/06 ,  H01J37/32

CPC分类号： H01J37/08 ,  G01N27/06 ,  H01J37/32944 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

公开(公告)号：US09362089B2

公开(公告)日：2016-06-07

申请号：US13597050

申请日：2012-08-28

申请人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

发明人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

IPC分类号： C23C14/34 ,  H01J37/32

CPC分类号： H01J37/32009 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

摘要翻译： 公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。 一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制 周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。

公开(公告)号：US09309594B2

公开(公告)日：2016-04-12

申请号：US13193345

申请日：2011-07-28

申请人： Daniel J. Hoffman ,  Victor Brouk ,  Daniel Carter

发明人： Daniel J. Hoffman ,  Victor Brouk ,  Daniel Carter

IPC分类号： C23C16/50 ,  C23C14/34 ,  H01J37/32

CPC分类号： C23C16/50 ,  C23C14/345 ,  H01J37/32009 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.

摘要翻译： 公开了用于调节等离子体室中的离子能量的系统，方法和装置。 一种示例性方法包括将基板放置在等离子体室中，通过远程产生的电离电磁场在等离子体室中形成等离子体，该离子化电磁场从远程投影源延伸到等离子体室中，可控制地将功率切换到基板，以便施加周期性 电压功能到基板，并且在周期性电压函数的多个周期中调制周期性电压函数，其响应于衬底表面处的离子能量的期望分布，以便在一段时间内实现所需的离子能量分布 依据。

公开(公告)号：US08884525B2

公开(公告)日：2014-11-11

申请号：US13425159

申请日：2012-03-20

申请人： Daniel J. Hoffman ,  Daniel Carter ,  Randy Grilley ,  Karen Peterson

发明人： Daniel J. Hoffman ,  Daniel Carter ,  Randy Grilley ,  Karen Peterson

IPC分类号： H05B31/26 ,  B23K10/00 ,  H05H1/46

CPC分类号： H05H1/46 ,  H05H2001/4652

摘要： Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement.

摘要翻译： 本文公开了用于通过远程等离子体源中的盘形等离子体解离非活化气体的系统，方法和装置。 两个感应元件，一个在盘形等离子体的两侧，产生一个磁场，其诱导维持盘形等离子体的电场。 电感元件可以是具有任何数量的环的线圈导体，并且可以布置在平面或垂直线圈中或平面和垂直线圈的组合。 此外，电感元件半径与两个感应元件之间的间隙距离的比可以被配置成实现期望的垂直等离子体约束。

公开(公告)号：US20120319584A1

公开(公告)日：2012-12-20

申请号：US13597050

申请日：2012-08-28

申请人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

发明人： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter

IPC分类号： H05H1/24

CPC分类号： H01J37/32009 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/3299

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

公开(公告)号：US08279577B2

公开(公告)日：2012-10-02

申请号：US12849012

申请日：2010-08-02

申请人： Andrew Nguyen ,  Wing Lau Cheng ,  Hiroji Hanawa ,  Semyon Kats ,  Kartik Ramaswamy ,  Yan Ye ,  Kwok Manus Wong ,  Daniel J. Hoffman ,  Tetsuya Ishikawa ,  Brian C. Lue

发明人： Andrew Nguyen ,  Wing Lau Cheng ,  Hiroji Hanawa ,  Semyon Kats ,  Kartik Ramaswamy ,  Yan Ye ,  Kwok Manus Wong ,  Daniel J. Hoffman ,  Tetsuya Ishikawa ,  Brian C. Lue

IPC分类号： H01T23/00

CPC分类号： C23C14/564 ,  C23C16/4404 ,  H01J37/16 ,  H01J37/32504 ,  H01J37/32862 ,  H01J37/32871 ,  H01J2237/022 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T428/24 ,  Y10T428/31678

摘要： A support for a substrate processing chamber comprises a chuck having a substrate receiving surface, and a base comprising an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth. A lower wall is seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel. A fluid inlet is provided to supply a heat transfer fluid to the fluid channel and a fluid outlet provided to discharge the heat transfer fluid from the fluid channel.

摘要翻译： 用于衬底处理室的支撑件包括具有衬底接收表面的卡盘，以及包括上壁的基座，该上壁包括凹槽，所述凹槽具有（i）第一深度处的附接面，以及（ii）第二深度处的流体通道 。 下壁位于凹槽中并附着到上壁的附接面，以封闭流体通道。 提供流体入口以将传热流体供应到流体通道和设置用于从流体通道排出传热流体的流体出口。

公开(公告)号：US20120187844A1

公开(公告)日：2012-07-26

申请号：US13356546

申请日：2012-01-23

申请人： Daniel J. Hoffman ,  Daniel Carter ,  Victor Brouk ,  Karen Peterson ,  Randy Grilley

发明人： Daniel J. Hoffman ,  Daniel Carter ,  Victor Brouk ,  Karen Peterson ,  Randy Grilley

IPC分类号： H05H1/46

CPC分类号： H01J37/32541 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32568 ,  H01J2237/327 ,  H05H1/46 ,  H05H2001/4675

摘要： This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

摘要翻译： 本公开描述了用于将能量电容耦合到等离子体中以点燃和维持远程等离子体源内的等离子体的系统，方法和装置。 功率由至少部分地围绕或被第二电极围绕的第一电极提供。 第二个电极可以接地或浮动。 可以布置第一和第二介电部件以将电极中的一个或两个与等离子体分开，从而将等离子体与一个或两个电极隔离。

公开(公告)号：US08070925B2

公开(公告)日：2011-12-06

申请号：US12253603

申请日：2008-10-17

申请人： Daniel J. Hoffman ,  Ying Rui ,  Karl M. Brown ,  John Pipitone ,  Lara Hawrylchak

发明人： Daniel J. Hoffman ,  Ying Rui ,  Karl M. Brown ,  John Pipitone ,  Lara Hawrylchak

IPC分类号： C23C14/35

CPC分类号： H01J37/3408 ,  C23C14/35 ,  C23C14/54 ,  H01J37/3444 ,  H01J37/3455

摘要： In a PVD reactor having a sputter target at the ceiling, a conductive housing enclosing the rotating magnet assembly has a central port for the rotating magnet axle. A conductive hollow cylinder of the housing surrounds an external portion of the spindle. RF power is coupled to a radial RF connection rod extending radially from the hollow cylinder. DC power is coupled to another radial DC connection rod extending radially from the hollow cylinder.

摘要翻译： 在具有在天花板上的溅射靶的PVD反应器中，包围旋转磁体组件的导电壳体具有用于旋转磁体轴的中心端口。 壳体的导电中空圆筒围绕主轴的外部。 RF功率耦合到从中空圆柱体径向延伸的径向RF连接杆。 直流电力耦合到从中空圆柱体径向延伸的另一个径向直流连接杆。

公开(公告)号：US07967944B2

公开(公告)日：2011-06-28

申请号：US12129244

申请日：2008-05-29

申请人： Steven C. Shannon ,  Kartik Ramaswamy ,  Daniel J. Hoffman ,  Matthew L. Miller ,  Kenneth S. Collins

发明人： Steven C. Shannon ,  Kartik Ramaswamy ,  Daniel J. Hoffman ,  Matthew L. Miller ,  Kenneth S. Collins

IPC分类号： C23F1/00

CPC分类号： H05H1/46 ,  H01J37/32082 ,  H01J37/32146 ,  H01J37/32174 ,  H01J37/32935

摘要： A workpiece is processed in a plasma reactor chamber using stabilization RF power delivered into the chamber, by determining changes in load impedance from RF parameters sensed at an RF source or bias power generator and resolving the changes in load impedance into first and second components thereof, and changing the power level of the stabilization RF power as a function one of the components of changes in load impedance.

摘要翻译： 通过根据在RF源或偏置功率发生器处感测的RF参数确定负载阻抗的变化并将负载阻抗的变化解析成其第一和第二分量，在等离子体反应器室中使用稳定的RF功率来处理工件， 并且将稳定化RF功率的功率电平作为负载阻抗变化的组成部分之一变化。