摘要:
The present invention relates to a photosensitive adhesive composition that has thermal press bondability to an adherent after being patterned by exposure and development and enables alkali development, wherein a storage elastic modulus at 110° C. after exposure and further heat curing is not less than 10 MPa.
摘要:
A photosensitive adhesive capable of alkali development, the photosensitive adhesive exhibiting adhesion property for an adherend after it has been patterned by light exposure and development, the photosensitive adhesive being used in a method for producing a semiconductor device 100 comprising a step of patterning the photosensitive adhesive 1 provided on a circuit surface of a semiconductor chip 20 by light exposure and development; and a step of directly bonding another semiconductor chip 21 to the patterned photosensitive adhesive 1.
摘要:
To provide a photosensitive adhesive which is sufficiently excellent in terms of all the properties of attachment, pattern formability, thermocompression bondability and high-temperature adhesion, and which has thermocompression bondability for adherends after patterning by exposure and development, and is capable of alkali development, as well as a film adhesive, an adhesive sheet, an adhesive pattern, a semiconductor wafer with an adhesive layer and a semiconductor device, which employ the same. A photosensitive adhesive comprising (A) an imide group-containing resin with a fluoroalkyl group, (B) a radiation-polymerizable compound, (C) a photoinitiator and (D) a thermosetting component.
摘要:
A photosensitive adhesive capable of alkali development, the photosensitive adhesive exhibiting adhesion property for an adherend after it has been patterned by light exposure and development, the photosensitive adhesive being used in a method for producing a semiconductor device 100 comprising a step of patterning the photosensitive adhesive 1 provided on a circuit surface of a semiconductor chip 20 by light exposure and development; and a step of directly bonding another semiconductor chip 21 to the patterned photosensitive adhesive 1.
摘要:
A photosensitive adhesive composition comprising: (A) a polyimide having a carboxyl group as a side chain, whereof the acid value is 80 to 180 mg/KOH; (B) a photo-polymerizable compound; and (C) a photopolymerization initiator.
摘要:
A photosensitive adhesive composition comprising: (A) a polyimide having a carboxyl group as a side chain, whereof the acid value is 80 to 180 mg/KOH; (B) a photo-polymerizable compound; and (C) a photopolymerization initiator.
摘要:
A photosensitive adhesive composition comprising (A) an alkali-soluble polymer, (B) a thermosetting resin, (C) one or more radiation-polymerizable compounds and (D) a photoinitiator, wherein the 5% weight reduction temperature of the mixture of all of the radiation-polymerizable compounds in the composition is 200° C. or higher.
摘要:
A feature extraction apparatus includes a spectrum calculating unit that calculates, based on an input speech signal, a frequency spectrum having frequency components obtained at regular intervals on a logarithmic frequency scale for each of frames that are defined by regular time intervals, and thereby generates a time series of the frequency spectrum; a cross-correlation coefficients calculating unit that calculates, for each target frame of the frames, a cross-correlation coefficients between frequency spectra calculated for two different frames that are in vicinity of the target frame and a predetermined frame width apart from each other; and a shift amount predicting unit that predicts a shift amount of the frequency spectra on the logarithmic frequency scale with respect to the predetermined frame width by use of the cross-correlation coefficients.
摘要:
Normalization parameters are generated at a normalization-parameter generating unit by calculating the mean values and the standard deviations of an initial prosody pattern and a prosody pattern of a training sentence of a speech corpus. Then, the variance range or variance width of the initial prosody pattern is normalized at the prosody-pattern normalizing unit in accordance with the normalization parameters. As a result, a prosody pattern similar to speech of human beings and improved in naturalness can be generated with a small amount of calculation.
摘要:
A feature extracting unit extracts a feature vector of an input speech. A similarity calculating unit calculates degrees of similarity for each of a plurality of noise environments, based on the feature vector. A compensation-vector calculating unit acquires a first compensation vector from a storing unit, calculates a second compensation vector based on the first compensation vector, and calculates a third compensation vector by weighting and summing the second compensation vector with the degree of similarity as weights. A compensating unit compensates the feature vector based on the third compensation vector.