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公开(公告)号：US20080267242A1
公开(公告)日：2008-10-30
申请号：US11981195
申请日：2007-10-30
IPC分类号： H01S3/225
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70583 , H01S3/005 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2251 , H01S3/235 , H01S2301/02
摘要： A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.
摘要翻译： 方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统，以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是：选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时，同时使ASE保持在选定的极限以下，并且脉冲能量 激光系统输出光束的脉冲基本恒定。
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公开(公告)号：US07365349B2
公开(公告)日：2008-04-29
申请号：US11168190
申请日：2005-06-27
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70925 , G21K1/062 , H05G2/005
摘要： An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.
摘要翻译： 一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法，其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物 收集器光学元件上的材料化合物。 该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应，并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物 可能被确定为有效。 延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。
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63.发明授权System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output 有权用于对准和同步目标材料以实现最佳极紫外光输出的系统，方法和装置公开(公告)号：US08653491B2
公开(公告)日：2014-02-18
申请号：US12725178
申请日：2010-03-16
申请人： William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov , Chris C. Chrobak , James H. Crouch
发明人： William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov , Chris C. Chrobak , James H. Crouch
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： An extreme ultraviolet light system and method includes a drive laser, a chamber including an extreme ultraviolet light collector and a target material dispenser including an adjustable target material outlet capable of outputting multiple portions of target material along a target material path. Also included: a drive laser steering device, a detection system including at least one detector and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of the first portion of target material from the first light reflected from the first portion of target material and logic for adjusting the target material dispenser outlet to output a subsequent portion of target material to a waist of the focused drive laser. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.
摘要翻译： 一种极紫外光系统和方法包括驱动激光器，包括极紫外光收集器的腔室和包括可调靶材料出口的目标材料分配器，其能够沿目标材料路径输出目标材料的多个部分。 还包括：驱动激光转向装置，包括至少一个检测器和耦合到目标材料分配器的控制器，检测器系统和驱动激光转向装置的检测系统。 控制器包括用于从目标材料的第一部分反射的第一光和逻辑上检测目标材料的第一部分的位置的逻辑，用于调节目标材料分配器出口，以将目标材料的后续部分输出到聚焦的腰部 驱动激光 还公开了一种用于优化极紫外光输出的系统和方法。
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公开(公告)号：US20100327192A1
公开(公告)日：2010-12-30
申请号：US12638413
申请日：2009-12-15
申请人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
发明人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译： 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。
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公开(公告)号：US20100127186A1
公开(公告)日：2010-05-27
申请号：US12655987
申请日：2010-01-11
申请人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
发明人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
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公开(公告)号：US07180083B2
公开(公告)日：2007-02-20
申请号：US11238828
申请日：2005-09-28
CPC分类号： G03F7/70916 , B82Y10/00 , G01J1/429 , G03F7/70033 , G03F7/70175 , G03F7/70983 , G21K1/062 , G21K2201/067 , H05G2/003
摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.
摘要翻译： 公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。 替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。
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公开(公告)号：US07141806B1
公开(公告)日：2006-11-28
申请号：US11237649
申请日：2005-09-27
IPC分类号： G01J1/00
摘要： An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.
摘要翻译： 公开了一种用于收集器的EUV光源收集器侵蚀缓解方法和装置，其包括多层反射镜收集器，其包括由由与在EUV发光等离子体中产生的材料的去除相互作用而被去除的封盖材料组成的收集器外表面。 可以包括在EUV等离子体源材料内包括替换材料。 替代材料可以包括与多层反射镜的封盖材料相同的材料。 替代材料可以包括对EUV光的选定频带中的光基本上透明的材料，例如在等离子体源材料的等离子体中产生的EUV光的光谱。 替代材料可以包括不易被蚀刻材料蚀刻的材料，用于从集电体例如卤素蚀刻剂去除沉积的等离子体源材料。
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公开(公告)号：US20120002687A1
公开(公告)日：2012-01-05
申请号：US13231882
申请日：2011-09-13
IPC分类号： H01S3/10
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。
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公开(公告)号：US07217940B2
公开(公告)日：2007-05-15
申请号：US10798740
申请日：2004-03-10
申请人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
发明人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
IPC分类号： H01J35/20
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译： 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。
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公开(公告)号：US20110141865A1
公开(公告)日：2011-06-16
申请号：US12637961
申请日：2009-12-15
申请人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
发明人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。 光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。 测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。 光采集系统包括配置为光学地分离这些部分的二向色光学装置。
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