公开(公告)号：US20170236740A1

公开(公告)日：2017-08-17

申请号：US15410634

申请日：2017-01-19

申请人： Intevac, Inc.

发明人： Terry Bluck ,  Babak Adibi ,  Vinay Prabhakar ,  William Eugene Runstadler, JR.

IPC分类号： H01L21/683 ,  H01L21/66

CPC分类号： H01L21/6833 ,  H01L21/67288 ,  H01L21/6831 ,  H01L21/68735 ,  H01L21/6875 ,  H01L22/12

摘要： A chuck for wafer processing that counters the deleterious effects of thermal expansion of the wafer. Also, a combination of chuck and shadow mask arrangement that maintains relative alignment between openings in the mask and the wafer in spite of thermal expansion of the wafer. A method for fabricating a solar cell by ion implant, while maintaining relative alignment of the implanted features during thermal expansion of the wafer.

公开(公告)号：US20170025300A1

公开(公告)日：2017-01-26

申请号：US15284450

申请日：2016-10-03

申请人： Intevac, Inc.

发明人： Terry Bluck ,  Vinay Shah ,  Alexandru Riposan

IPC分类号： H01L21/677 ,  H01L21/687 ,  H01L21/67

CPC分类号： H01L21/67709 ,  H01L21/67173 ,  H01L21/67736 ,  H01L21/67739 ,  H01L21/67754 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68742 ,  H01L21/68785

摘要： A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.

摘要翻译： 用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将载体返回到系统的进入区域。 可以在系统的一侧进行基板的装载和卸载，或者可以在入口侧进行装载并在出口侧卸载。

公开(公告)号：US20170018391A1

公开(公告)日：2017-01-19

申请号：US14801807

申请日：2015-07-16

申请人： Intevac, Inc.

发明人： Kenneth Costello ,  Kevin Roderick

IPC分类号： H01J1/34

CPC分类号： H01J1/34 ,  H01J9/18 ,  H01J31/26

摘要： An image intensifier and a method of fabrication are disclosed. The image intensifier contains a photocathode assembly (120) including a vacuum window to generate photoelectrons in response to light, a vacuum package (110) and an anode assembly (130) to receive the photoelectrons. The anode assembly is mounted to the vacuum package via a compliant, springy, support structure (160). The anode additionally includes one or more insulating spacers (140) on the surface facing the photocathode so as to precisely index the position of the anode assembly with respect to the photocathode surface. The photocathode and vacuum window assembly is pressed into the vacuum package to generate a sealed leak tight vacuum envelope. During the photocathode assembly to vacuum package assembly pressing operation, the inner surface of the photocathode assembly contacts the insulating spacer/spacers of the anode assembly, thereby compressing the compliant support structure. This structure and assembly method result in a precisely indexed photocathode to anode assembly sealed image intensifier.

摘要翻译： 公开了一种图像增强器和制造方法。 图像增强器包含光电阴极组件（120），其包括响应于光产生光电子的真空窗口，真空封装（110）和用于接收光电子的阳极组件（130）。 阳极组件通过柔性弹性支撑结构（160）安装到真空包装上。 阳极还包括在面向光电阴极的表面上的一个或多个绝缘间隔物（140），以便相对于光电阴极表面精确地调整阳极组件的位置。 将光电阴极和真空窗组件压入真空包装中以产生密封的密封真空密封。 在光电阴极组件到真空封装组件按压操作期间，光电阴极组件的内表面接触阳极组件的绝缘间隔件/间隔件，由此压缩柔性支撑结构。 这种结构和组装方法导致了阳极组件密封图像增强器的精确索引光电阴极。

公开(公告)号：US20170009337A1

公开(公告)日：2017-01-12

申请号：US15203747

申请日：2016-07-06

申请人： Intevac, Inc.

发明人： Terry Bluck ,  Babak Adibi

IPC分类号： C23C14/48

CPC分类号： C23C14/48 ,  C03C17/245 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3644 ,  C03C17/366 ,  C23C14/0652 ,  C23C14/083 ,  C23C14/568

摘要： The use of non-mass analyzed ion implanter is advantageous in such application as it generates ion implanting at different depth depending on the ions energy and mass. This allows for gaining advantage from lubricity offered as a result of the very light deposition on the surface, and at the same time the hardness provided by the intercalated ions implanted below it, providing benefits for cover glass, low E enhancement, and other similar materials. In further aspects, ion implantation is used to create other desirable film properties such anti-microbial and corrosion resistance.

摘要翻译： 使用非质量分析的离子注入机在这种应用中是有利的，因为它根据离子能量和质量在不同深度产生离子注入。 这允许由于表面上非常轻的沉积而获得的润滑性获得优势，并且同时由插入的离子提供的硬度在其下方植入，为盖玻片，低E增强和其它类似材料提供了益处 。 在另外的方面，使用离子注入来产生其它所需的膜性质如抗微生物和耐腐蚀性。

公开(公告)号：US09502276B2

公开(公告)日：2016-11-22

申请号：US13871871

申请日：2013-04-26

申请人： Intevac, Inc.

发明人： Terry Bluck ,  Vinay Shah ,  Alex Riposan

IPC分类号： H01L21/677 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01L21/67709 ,  H01L21/67173 ,  H01L21/67736 ,  H01L21/67739 ,  H01L21/67754 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68742 ,  H01L21/68785

摘要： A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.

摘要翻译： 用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将载体返回到系统的进入区域。 可以在系统的一侧进行基板的装载和卸载，或者可以在入口侧进行装载并在出口侧卸载。

公开(公告)号：US20160322523A1

公开(公告)日：2016-11-03

申请号：US15208409

申请日：2016-07-12

申请人： INTEVAC, INC.

发明人： Henry Hieslmair ,  Babak Adibi

IPC分类号： H01L31/0352 ,  H01L31/068 ,  H01L31/18 ,  H01L31/0224

CPC分类号： H01L31/03529 ,  H01L31/022433 ,  H01L31/068 ,  H01L31/0682 ,  H01L31/1804 ,  H01L31/1864 ,  Y02E10/547 ,  Y02P70/521

摘要： A photovoltaic cell having a graded doped region such as a graded emitter and methods of making photovoltaic cells having graded doped regions such as a graded emitter are disclosed. Doping is adjusted across a surface to minimize resistive (I2R) power losses. The graded emitters provide a gradual change in sheet resistance over the entire distance between the lines. The graded emitter profile may have a lower sheet resistance near the metal lines and a higher sheet resistance farther from the metal line edges. The sheet resistance is graded such that the sheet resistance is lower where I2R power losses are highest due to current crowding. One advantage of graded emitters over selective emitters is improved efficiency. An additional advantage of graded emitters over selective emitters is improved ease of aligning metallization to the low sheet resistance regions.

摘要翻译： 公开了一种具有渐变掺杂区域（诸如渐变发射极）的光伏电池和制造具有渐变掺杂区域（诸如渐变发射极）的光伏电池的方法。 在表面上调整掺杂以最小化电阻（I2R）功率损耗。 分级发射器在线之间的整个距离上提供薄层电阻的逐渐变化。 渐变的发射极轮廓可以在金属线附近具有较低的薄层电阻，并且具有比金属线边缘更远的更高的薄层电阻。 薄片电阻被分级，使得由于电流拥挤，I2R功率损耗最高的薄层电阻较低。 分级发射器超过选择性发射器的一个优点是提高了效率。 渐变发射体超过选择性发射体的另外的优点是改善了将金属化对准低电阻区域的容易性。

公开(公告)号：US20160268110A1

公开(公告)日：2016-09-15

申请号：US15138154

申请日：2016-04-25

申请人： INTEVAC, INC.

发明人： David Ward Brown ,  Vinay Shah ,  Terry Pederson ,  Terry Bluck

IPC分类号： H01J37/34 ,  C23C14/56 ,  H01J37/32 ,  C23C14/35

CPC分类号： H01J37/3455 ,  C23C14/35 ,  C23C14/56 ,  H01J37/32779 ,  H01J37/32899 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3452

摘要： A sputtering system having a processing chamber with an inlet port and an outlet port, and a sputtering target positioned on a wall of the processing chamber. A movable magnet arrangement is positioned behind the sputtering target and reciprocally slides behinds the target. A conveyor continuously transports substrates at a constant speed past the sputtering target, such that at any given time, several substrates face the target between the leading edge and the trailing edge. The movable magnet arrangement slides at a speed that is at least several times faster than the constant speed of the conveyor. A rotating zone is defined behind the leading edge and trailing edge of the target, wherein the magnet arrangement decelerates when it enters the rotating zone and accelerates as it reverses direction of sliding within the rotating zone.

公开(公告)号：US20160023941A1

公开(公告)日：2016-01-28

申请号：US14805418

申请日：2015-07-21

申请人： Intevac, Inc.

发明人： David Ward Brown ,  Charles Liu ,  Jun Xie

IPC分类号： C03C17/34 ,  C23C14/00 ,  B08B17/06 ,  C23C14/34

CPC分类号： B08B17/065 ,  C03C17/42 ,  C03C23/006 ,  C03C2217/734 ,  C03C2217/76 ,  C03C2217/78 ,  C03C2218/31 ,  C23C14/0036 ,  C23C14/024 ,  C23C14/34

摘要： A protective coating on a front surface of a glass, by forming a diamond-like coating over the front surface of the glass; performing passive sputtering to form a protective layer directly on the diamond-like coating; performing reactive sputtering to form an adhesion layer directly on the protective layer; forming an anti-finger print layer directly over the adhesion layer.

摘要翻译： 通过在玻璃的前表面上形成类似金刚石的涂层，在玻璃前表面上形成保护涂层; 进行钝化溅射，直接在金刚石状涂层上形成保护层; 进行反应溅射，直接在保护层上形成粘附层; 在粘合层上直接形成防指纹层。

公开(公告)号：US20150235824A1

公开(公告)日：2015-08-20

申请号：US14290917

申请日：2014-05-29

申请人： Intevac, Inc.

发明人： David Ward Brown ,  Terry Bluck

IPC分类号： H01J37/34

CPC分类号： H01J37/3455 ,  C23C14/35 ,  C23C14/56 ,  G11B5/851 ,  H01F41/183 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/3417 ,  H01J37/3426 ,  H01J37/3435 ,  H01J37/3452 ,  H01J37/347

摘要： A system for depositing material from a target onto substrates, comprising a processing chamber; a sputtering target having length L and having highly magnetic sputtering material provided on front surface thereof a magnet assembly operable to reciprocally scan across the length L in close proximity to rear surface of the target and the magnet assembly comprises: a back plate made of magnetic material; a first group of magnets arranged in a single line central to the back plate and having a first pole positioned to face the rear surface of the target; and, a second group of magnets provided around periphery of the back plate so as to surround the first group of magnets, the second group of magnets having a second pole, opposite the first pole, positioned to face the rear surface of the target.

摘要翻译： 一种用于将材料从靶材沉积到基材上的系统，包括处理室; 具有长度为L并且具有高磁性溅射材料的溅射靶，其前表面设置有磁体组件，该磁体组件可操作以在紧邻靶的后表面和磁体组件之间的长度L上往复扫描，包括：由磁性材料制成的背板 ; 第一组磁体，其布置在与所述背板中心的单线中，并且具有定位成面对所述目标的后表面的第一极; 以及围绕所述第一组磁体设置在所述背板的周围的第二组磁体，所述第二组磁体具有与所述第一极相对的第二极，所述第二极定位成面对所述靶的后表面。

公开(公告)号：US20150170947A1

公开(公告)日：2015-06-18

申请号：US14627667

申请日：2015-02-20

申请人： Intevac, Inc.

发明人： Terry Bluck ,  Vinay Shah ,  Ian Latchford ,  Alexandru Riposan

IPC分类号： H01L21/677 ,  H01L21/687 ,  H01L21/67

CPC分类号： H01L21/68785 ,  H01L21/67173 ,  H01L21/67736 ,  H01L21/67754

摘要： A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. The carriers are configured for supporting substrates of different sizes. The carriers are also configured for flipping the substrates such that both surfaces of the substrates may be processed.

摘要翻译： 用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将载体返回到系统的进入区域。 载体构造成用于支撑不同尺寸的基底。 载体也构造成用于翻转基板，使得可以处理基板的两个表面。