公开(公告)号：US20100108913A1

公开(公告)日：2010-05-06

申请号：US11787180

申请日：2007-04-13

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt ,  Richard L. Sandstrom ,  Ivan Lalovic

IPC分类号： G21G5/00 ,  H01S3/225 ,  H01S3/083

CPC分类号： H01S3/225 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

公开(公告)号：US20100074295A1

公开(公告)日：2010-03-25

申请号：US12592228

申请日：2009-11-20

申请人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edmond Arriola ,  Mike Wyatt ,  Walter Crosby

发明人： William N. Partlo ,  Alexander I. Ershov ,  German Rylov ,  Igor V. Fomenkov ,  Daniel J.W. Brown ,  Christian J. Wittak ,  Rajasekhar M. Rao ,  Robert A. Bergstedt ,  John Fitzgerald ,  Richard L. Sandstrom ,  Vladimir B. Fleurov ,  Robert N. Jacques ,  Ed Danielewicz ,  Robin Swain ,  Edmond Arriola ,  Mike Wyatt ,  Walter Crosby

IPC分类号： H01S3/22

CPC分类号： H01S3/0057 ,  G03F7/70341 ,  G03F7/70583

摘要： An apparatus and method are disclosed which may comprise a pulsed gas discharge laser lithography light source which may comprise a seed laser portion providing a seed laser output light beam of seed pulses; an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses; the amplifier portion may comprise a ring power amplifier comprising amplifier portion injection optics comprising at least one beam expanding prism, a beam reverser and an input/output coupler; the beam expansion optics and the output coupler may be mounted on an optics assembly with the beam expansion optics rigidly mounted with respect to the optics assembly and the input/output coupler mounted for relative movement with respect to the optics assembly for optical alignment purposes.

摘要翻译： 公开了一种可以包括脉冲气体放电激光光刻光源的装置和方法，脉冲气体放电激光光刻光源可以包括提供种子脉冲的种子激光输出光束的种子激光部分; 接收种子激光输出光束并放大每个种子脉冲的光强度的放大器部分，以提供输出脉冲的大功率激光系统输出光束; 放大器部分可以包括环形功率放大器，其包括放大器部分注入光学器件，其包括至少一个光束扩展棱镜，光束反向器和输入/输出耦合器; 光束扩展光学器件和输出耦合器可以安装在光学组件上，其中光束扩展光学器件相对于光学组件刚性地安装，并且输入/输出耦合器被安装成相对于用于光学对准目的的光学组件的相对运动。

公开(公告)号：US07405416B2

公开(公告)日：2008-07-29

申请号：US11067124

申请日：2005-02-25

申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US07291853B2

公开(公告)日：2007-11-06

申请号：US11493945

申请日：2006-07-26

申请人： Igor V. Fomenkov ,  William N. Partlo ,  Gerry M. Blumenstock ,  Nortbert Bowering ,  I. Roger Oliver ,  Xiaojiang Pan ,  Rodney D. Simmons

发明人： Igor V. Fomenkov ,  William N. Partlo ,  Gerry M. Blumenstock ,  Nortbert Bowering ,  I. Roger Oliver ,  Xiaojiang Pan ,  Rodney D. Simmons

IPC分类号： H01J65/04

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70908 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H01S3/005 ,  H01S3/225 ,  H05G2/005 ,  H05H1/06

摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.

摘要翻译： 公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成 圆在一个轴或旋转，另一个椭圆。 源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器 壳成员。

公开(公告)号：US07180083B2

公开(公告)日：2007-02-20

申请号：US11238828

申请日：2005-09-28

申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003

摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.

摘要翻译： 公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。 替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

公开(公告)号：US07154928B2

公开(公告)日：2006-12-26

申请号：US10875662

申请日：2004-06-23

申请人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

发明人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： H01S3/0812 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/1305

摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.

摘要翻译： 在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长 至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲 每个具有至少两个不同选择的中心波长中的一个。

公开(公告)号：US07141806B1

公开(公告)日：2006-11-28

申请号：US11237649

申请日：2005-09-27

申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

IPC分类号： G01J1/00

CPC分类号： G21K1/062 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005

摘要： An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.

摘要翻译： 公开了一种用于收集器的EUV光源收集器侵蚀缓解方法和装置，其包括多层反射镜收集器，其包括由由与在EUV发光等离子体中产生的材料的去除相互作用而被去除的封盖材料组成的收集器外表面。 可以包括在EUV等离子体源材料内包括替换材料。 替代材料可以包括与多层反射镜的封盖材料相同的材料。 替代材料可以包括对EUV光的选定频带中的光基本上透明的材料，例如在等离子体源材料的等离子体中产生的EUV光的光谱。 替代材料可以包括不易被蚀刻材料蚀刻的材料，用于从集电体例如卤素蚀刻剂去除沉积的等离子体源材料。

公开(公告)号：US07061961B2

公开(公告)日：2006-06-13

申请号：US11199691

申请日：2005-08-09

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scot T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scot T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

IPC分类号： H01S3/22

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.

公开(公告)号：US06972421B2

公开(公告)日：2005-12-06

申请号：US10409254

申请日：2003-04-08

申请人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  I. Roger Oliver ,  Richard M. Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis L. Rettig ,  Gerry M. Blumenstock ,  Timothy S. Dyer ,  Rodney D. Simmons ,  Jerzy R. Hoffman ,  R. Mark Johnson

发明人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  I. Roger Oliver ,  Richard M. Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis L. Rettig ,  Gerry M. Blumenstock ,  Timothy S. Dyer ,  Rodney D. Simmons ,  Jerzy R. Hoffman ,  R. Mark Johnson

IPC分类号： G21K5/00 ,  G01J1/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01S3/00 ,  H05G2/00 ,  H05H1/06 ,  H05H1/24 ,  H01J35/20

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70916 ,  H01S3/005 ,  H05G2/005 ,  H05G2/008 ,  H05H1/06

摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

摘要翻译： 本发明提供了一种可靠，高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲，其具有足够的能量和电势，足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中，中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。

公开(公告)号：US06757316B2

公开(公告)日：2004-06-29

申请号：US09854097

申请日：2001-05-11

申请人： Peter C. Newman ,  Thomas P. Duffey ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Vladimir B. Fleurov ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Xiaojiang J. Pan ,  Vladimir Kulgeyko ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov

发明人： Peter C. Newman ,  Thomas P. Duffey ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Vladimir B. Fleurov ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Xiaojiang J. Pan ,  Vladimir Kulgeyko ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov

IPC分类号： H01S322

CPC分类号： H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

摘要翻译： 本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。 在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。