公开(公告)号：US07482586B2

公开(公告)日：2009-01-27

申请号：US11482094

申请日：2006-07-07

申请人： Tohru Ishitani ,  Uki Kabasawa ,  Tsuyoshi Ohnishi

发明人： Tohru Ishitani ,  Uki Kabasawa ,  Tsuyoshi Ohnishi

IPC分类号： G01N31/00 ,  G01N33/00 ,  G01N23/00 ,  G21K7/00 ,  G21K5/10 ,  H01J37/08

CPC分类号： G01N23/225 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/1536 ,  H01J2237/31745

摘要： In an SEM observation in a depth direction of a cross section processed by repeated FIB cross-sectioning and SEM observation to correct a deviation in an observation field of view and a deviation in focus, are corrected, the deviations occurring when a processed cross section moves in the depth direction thereof; information on a height and a tilt of a surface of cross section processing area is calculated before the processing, the above information is used, the deviation in a field of view and the deviation in focus in SEM observation, which correspond to an amount of movement of the cross section at a time of the processing, are predicted, and the SEM is controlled based on the predicted values.

摘要翻译： 在通过重复的FIB横截面处理的横截面的深度方向的SEM观察和用于校正观察视场偏离和聚焦偏差的SEM观察中，校正了当处理的横截面移动时发生的偏差 在其深度方向; 在处理之前计算关于横截面处理区域的表面的高度和倾斜的信息，使用上述信息，SEM视场中的偏差和对应于移动量的SEM观察中的偏差 的预测值，并且根据预测值来控制SEM。

公开(公告)号：US20080116391A1

公开(公告)日：2008-05-22

申请号：US11943241

申请日：2007-11-20

申请人： Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

发明人： Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

IPC分类号： G21K1/087 ,  G21K1/093

CPC分类号： H01J37/141 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/142 ,  H01J2237/1534 ,  H01J2237/303

摘要： The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.

摘要翻译： 本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。 为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。 因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。 具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。 对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

公开(公告)号：US20070280559A1

公开(公告)日：2007-12-06

申请号：US11802262

申请日：2007-05-21

申请人： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

发明人： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

IPC分类号： G06K9/32

CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/2823

摘要： Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

公开(公告)号：US07268356B2

公开(公告)日：2007-09-11

申请号：US10898592

申请日：2004-07-26

申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

IPC分类号： G21G5/00

CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。

公开(公告)号：US20050006600A1

公开(公告)日：2005-01-13

申请号：US10898592

申请日：2004-07-26

申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

IPC分类号： B23K15/00 ,  G01N1/28 ,  G01N23/20 ,  G01Q20/02 ,  G01Q30/20 ,  G01Q70/00 ,  A61N5/00 ,  G01K1/08 ,  G21K5/10

CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。

公开(公告)号：US6111723A

公开(公告)日：2000-08-29

申请号：US84321

申请日：1998-05-26

申请人： Hisashi Takano ,  Naoki Koyama ,  Hideo Tanabe ,  Eijin Moriwaki ,  Isamu Yuito ,  Kazuo Shiiki ,  Tsuyoshi Ohnishi ,  Tohru Ishitani ,  Toshio Kobayashi ,  Hideo Todokoro ,  Chiaki Ishikawa

发明人： Hisashi Takano ,  Naoki Koyama ,  Hideo Tanabe ,  Eijin Moriwaki ,  Isamu Yuito ,  Kazuo Shiiki ,  Tsuyoshi Ohnishi ,  Tohru Ishitani ,  Toshio Kobayashi ,  Hideo Todokoro ,  Chiaki Ishikawa

IPC分类号： G11B5/11 ,  G11B5/127 ,  G11B5/187 ,  G11B5/31 ,  G11B5/39

CPC分类号： G11B5/3903 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3103 ,  G11B5/3106 ,  G11B5/3116 ,  G11B5/3143 ,  G11B5/3163 ,  G11B5/3967 ,  G11B5/112

摘要： In a composite magnetic head comprising a magnetoresistive read head including a magnetic thin film having a magnetoresistive effect and soft magnetic members interposing the soft magnetic film between them through a non-magnetic insulation layer, an induction type write head including poles formed in a moving direction of a medium and a conductor crossing the poles, and disposed in the proximity of the magnetoresistive head, and a substrate supporting these heads, the present invention discloses a composite magnetic head characterized in that part of a floating surface inclusive of the magnetic head constituent members has recesses and the read/write operations to and from the medium are effected by the portion interposed by these recesses.

摘要翻译： 在包括具有磁阻效应的磁性薄膜的磁阻读头的复合磁头和通过非磁性绝缘层将它们插入在它们之间的软磁性部件的感应型写头，包括在移动方向上形成的磁极 的介质和导体，并且设置在磁阻头附近以及支撑这些磁头的基板上，本发明公开了一种复合磁头，其特征在于，包括磁头构成部件的浮动面的一部分 具有凹槽，并且来自介质的读/写操作由这些凹槽插入的部分实现。

公开(公告)号：US5399865A

公开(公告)日：1995-03-21

申请号：US76854

申请日：1993-06-15

申请人： Kaoru Umemura ,  Tohru Ishitani

发明人： Kaoru Umemura ,  Tohru Ishitani

IPC分类号： G01N27/62 ,  H01J27/22 ,  H01J27/26 ,  H01J37/08 ,  H01J49/16

CPC分类号： H01J27/22

摘要： A liquid metal ion source (LMIS) has a reservoir for containing an ion material and an emitter disposed in relation to the reservoir such that molten ion material heated in the reservoir wets the surface of the emitter and flows to the emitter apex. Prior to charging the reservoir with the ion material, the reservoir and emitter are cleaned by a high temperature cleaning operation. For cleaning, the LMIS is placed in a vacuum chamber. A current is applied through the electric feed through terminals to heat the reservoir until it becomes red hot. Then, the emitter is heated by electron bombardment by keeping the emitter voltage at ground potential while applying a high negative voltage to the reservoir. After cleaning, the emitter and reservoir are immersed in a liquid ion material contained in the vacuum chamber and maintained in the molten state by a separate melting unit having a heater. Once the reservoir is filled, a smooth continuous flow of molten ion material is provided to the apex of the emitter for providing a continuous and stable ion emission operation. Also, shields are provided to prevent vapor deposition on the base plate from forming a short circuit between the feed through terminals and the emitter.

摘要翻译： 液体金属离子源（LMIS）具有用于容纳相对于储存器设置的离子材料和发射体的储存器，使得在储存器中加热的熔融离子材料润湿发射体的表面并流向发射极顶点。 在用离子材料对储存器充电之前，储存器和发射器通过高温清洁操作来清洁。 为了清洁，将LMIS放置在真空室中。 通过电源通过端子施加电流以加热储存器直到其变红。 然后，通过将发射极电压保持在接地电位，通过电子轰击来加热发射极，同时向储层施加高的负电压。 在清洁之后，将发射器和储存器浸入包含在真空室中的液体离子材料中，并通过具有加热器的单独的熔融单元保持在熔融状态。 一旦储存器被填充，则向发射器的顶点提供平滑的熔融离子材料的连续流动，以提供连续和稳定的离子发射操作。 而且，提供屏蔽以防止基板上的气相沉积在馈通端子和发射极之间形成短路。

公开(公告)号：US5270552A

公开(公告)日：1993-12-14

申请号：US933232

申请日：1992-08-21

申请人： Tsuyoshi Ohnishi ,  Tohru Ishitani

发明人： Tsuyoshi Ohnishi ,  Tohru Ishitani

IPC分类号： G01N1/28 ,  G01N23/22 ,  H01J37/20 ,  H01J37/305 ,  H01J37/31

CPC分类号： H01J37/3056 ,  G01N23/2202 ,  H01J37/20 ,  H01J37/31 ,  H01J2237/2007 ,  H01J2237/20264

摘要： When a desired portion is separated from an integrated circuit chip or a semiconductor wafer, the portion is separated without dividing the chip or the wafer, so that the separated specimen can be moved to a desired position, and the separated specimen can be set to a desired attitude. Therefore, various analyses on the specimen through TEM, SEM, SIMS and so on can be carried out. A minute piece of specimen is cut and separated from the substrate of a specimen by use of a three-dimensional minute processing technique and a micro-manipulation technique. A surface of the specimen is subjected to an FIB processing from at least two kinds of angles, the separated specimen being mechanically connected to an external probe in a step for separating a part of the specimen including a portion to be analyzed. The separated specimen is supported by the probe, being moved. The separated specimen is subjected to analysis through TEM, SEM, SIMS, etc.

摘要翻译： 当将期望的部分与集成电路芯片或半导体晶片分离时，该部分被分离而不分割芯片或晶片，使得分离的样本可以移动到期望的位置，并且分离的样本可以被设置为 期望的态度 因此，可以通过TEM，SEM，SIMS等对样品进行各种分析。 通过使用三维微细处理技术和微操作技术，将一分片样品切割并与样品的基底分离。 将样品的表面从至少两种角度进行FIB处理，将分离出的试样机械地连接到外部探针上，以分离包含待分析部分的试样的一部分的步骤。 分离的样品由探头支撑，移动。 分离的样品通过TEM，SEM，SIMS等进行分析

公开(公告)号：US5113072A

公开(公告)日：1992-05-12

申请号：US597354

申请日：1990-10-10

申请人： Hiroshi Yamaguchi ,  Keiya Saito ,  Fumikazu Itoh ,  Koji Ishida ,  Shinji Sakano ,  Masao Tamura ,  Shoji Shukuri ,  Tohru Ishitani ,  Tsuneo Ichiguchi

发明人： Hiroshi Yamaguchi ,  Keiya Saito ,  Fumikazu Itoh ,  Koji Ishida ,  Shinji Sakano ,  Masao Tamura ,  Shoji Shukuri ,  Tohru Ishitani ,  Tsuneo Ichiguchi

IPC分类号： H01L21/20 ,  G01Q30/16 ,  G01Q60/44 ,  H01J37/08 ,  H01J37/305 ,  H01L21/203 ,  H01L21/205 ,  H01L21/263 ,  H01L21/265 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H01L21/338 ,  H01L21/822 ,  H01L21/8252 ,  H01L29/06 ,  H01L29/15 ,  H01L29/778 ,  H01L29/812

CPC分类号： H01J37/3056 ,  B82Y10/00 ,  H01J37/08 ,  H01L21/2633 ,  H01L21/26546 ,  H01L21/8221 ,  H01L21/8252 ,  H01L29/151 ,  Y10S148/046 ,  Y10S148/051 ,  Y10S148/084 ,  Y10S148/16 ,  Y10S438/962

摘要： Disclosed is an apparatus for forming a device having a fine structure, the apparatus including a high intensity ion source. The apparatus can be used to form fine grooves and/or a fine film, by supplying a reactive gas to the surface to be etched or coated while irradiating a focused ion beam on the surface. A laser or electron beam can be irradiated on substantially the same axis as that of the focused ion beam, whereby defects arising due to ion beam processing can be repaired. The apparatus can further include ion beam current detection and measurement structure to determine when a predetermined thickness of coating or depth of etching is achieved. The apparatus can include multiple chambers sequentially holding the surface treated, and can include a scanning electron microscope for scanning the surface being coated or etched.

公开(公告)号：US4624833A

公开(公告)日：1986-11-25

申请号：US674771

申请日：1984-11-26

申请人： Kaoru Umemura ,  Tohru Ishitani ,  Toshiyuki Aida ,  Hifumi Tamura

发明人： Kaoru Umemura ,  Tohru Ishitani ,  Toshiyuki Aida ,  Hifumi Tamura

IPC分类号： C22C19/03 ,  H01J1/02 ,  H01J27/26 ,  H01J37/08 ,  H01J1/05

CPC分类号： H01J37/08 ,  H01J27/26

摘要： A liquid metal ion source for emitting P ions, wherein a Cu alloy which contains at most 25 at. % of P and if necessary, further contains Ag, C or Si, and/or B is melted and fed to an emitter tip so as to generate an ion beam under a high electric field.

摘要翻译： 一种用于发射P离子的液体金属离子源，其中包含至多25原子的Cu合金。 P的百分数，如果需要，还含有Ag，C或Si，和/或B被熔化并供给到发射极尖端，以便在高电场下产生离子束。