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209 条记录 (耗时 0.031 秒)

    High repetition rate laser produced plasma EUV light source
    81.
    发明授权
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US07087914B2

    公开(公告)日：2006-08-08

    申请号：US10803526

    申请日：2004-03-17

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  John Martin Algots ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  John Martin Algots ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： H01J35/20

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    Plasma focus high energy photon source
    84.
    发明授权
    Plasma focus high energy photon source 有权
    等离子体聚焦高能光子源

    公开(公告)号：US6064072A

    公开(公告)日：2000-05-16

    申请号：US268243

    申请日：1999-03-15

    申请人： William N. Partlo ,  Igor V. Fomenkov ,  Daniel L. Birx

    发明人： William N. Partlo ,  Igor V. Fomenkov ,  Daniel L. Birx

    IPC分类号： G03F7/20 ,  H05G2/00 ,  H01J35/20

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

    摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltage high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation-collector is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration.

    摘要翻译： 高能光子源。 一对等离子体夹紧电极位于真空室中。 一种工作气体，其包括贵金属缓冲气体和选择用于提供所需光谱线的活性气体。 脉冲电源提供足够高电压的电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹紧，从而在活性气体的谱线处提供辐射。 外部反射辐射收集器 - 导向器收集在等离子体夹中产生的辐射，并将辐射引导到期望的方向。 在一个优选的实施方案中，活性气体是锂，缓冲气体是氦气，辐射收集器涂覆有用于电极的材料。 材料的一个不错的选择是钨。 在第二优选实施例中，缓冲气体是氩气，并且通过沿着同轴电极构造的中心电极的轴的孔中的固体锂的汽化来产生锂气体。

    Pulse power generating circuit with energy recovery
    85.
    发明授权
    Pulse power generating circuit with energy recovery 失效
    具有能量回收的脉冲发电电路

    公开(公告)号：US5729562A

    公开(公告)日：1998-03-17

    申请号：US739873

    申请日：1996-10-31

    申请人： Daniel L. Birx ,  Palash P. Das ,  Igor V. Fomenkov ,  William N. Partlo ,  Tom A. Watson

    发明人： Daniel L. Birx ,  Palash P. Das ,  Igor V. Fomenkov ,  William N. Partlo ,  Tom A. Watson

    IPC分类号： H01S3/00 ,  H01S3/097 ,  H01S3/225 ,  H02M9/04 ,  H03K3/57 ,  H03K17/00 ,  H03K17/80 ,  H05H1/06

    CPC分类号： H05H1/06 ,  H01S3/097 ,  H03K17/80 ,  H03K3/57 ,  H01S3/225 ,  H03K2217/0036

    摘要： A high voltage pulse power generating circuit capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a compressor circuit. An energy recovery circuit coupled to the compressor circuit reverses the polarity of energy dissipated by the pulse power generating circuit and transfers the waste energy back to the power source. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes an SCR switch for periodically discharging the charge storing element. This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.

    摘要翻译： 公开了一种能够提供能量回收的高压脉冲发生电路。 能量效率脉冲发生电路源包括周期性地排放到压缩机电路中的高电压电荷存储元件。 耦合到压缩机电路的能量恢复电路反转由脉冲发电电路消耗的能量的极性，并将废能转移回电源。 在优选实施例中，本发明的脉冲发生电路利用SCR开关来周期性地对电荷存储元件进行放电。 本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

    System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output
    86.
    发明授权
    System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output 有权
    用于对准和同步目标材料以实现最佳极紫外光输出的系统，方法和装置

    公开(公告)号：US08653491B2

    公开(公告)日：2014-02-18

    申请号：US12725178

    申请日：2010-03-16

    申请人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

    发明人： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

    IPC分类号： H01G2/00 ,  H05G2/00 ,  G03F7/20

    CPC分类号： H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

    摘要： An extreme ultraviolet light system and method includes a drive laser, a chamber including an extreme ultraviolet light collector and a target material dispenser including an adjustable target material outlet capable of outputting multiple portions of target material along a target material path. Also included: a drive laser steering device, a detection system including at least one detector and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of the first portion of target material from the first light reflected from the first portion of target material and logic for adjusting the target material dispenser outlet to output a subsequent portion of target material to a waist of the focused drive laser. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

    摘要翻译： 一种极紫外光系统和方法包括驱动激光器，包括极紫外光收集器的腔室和包括可调靶材料出口的目标材料分配器，其能够沿目标材料路径输出目标材料的多个部分。 还包括：驱动激光转向装置，包括至少一个检测器和耦合到目标材料分配器的控制器，检测器系统和驱动激光转向装置的检测系统。 控制器包括用于从目标材料的第一部分反射的第一光和逻辑上检测目标材料的第一部分的位置的逻辑，用于调节目标材料分配器出口，以将目标材料的后续部分输出到聚焦的腰部 驱动激光 还公开了一种用于优化极紫外光输出的系统和方法。

    Systems and methods for target material delivery protection in a laser produced plasma EUV light source
    88.
    发明授权
    Systems and methods for target material delivery protection in a laser produced plasma EUV light source 有权
    用于激光产生等离子体EUV光源的靶材料输送保护的系统和方法

    公开(公告)号：US08263953B2

    公开(公告)日：2012-09-11

    申请号：US13075500

    申请日：2011-03-30

    申请人： Igor V. Fomenkov ,  William N. Partlo

    发明人： Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： H01J35/00 ,  G21G5/00 ,  G01J3/10

    CPC分类号： H05G2/008 ,  H05G2/005 ,  H05G2/006

    摘要： A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.

    摘要翻译： 本文公开了一种装置，其可以包括室，源提供目标材料液滴流，其沿着目标材料释放点和照射区域之间的路径将靶材料输送到腔室中的照射区域，腔室中的气流 ，所述气体的至少一部分沿着朝向所述液滴流的方向流动，产生在所述照射区域处照射液滴的激光束以产生等离子体产生EUV辐射的系统，以及沿着所述流的一部分定位的护罩，所述护罩 具有屏蔽来自所述流动的液滴的第一护罩部分和相对的开口部分。