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    Systems with high density packing of micromachines
    81.
    发明授权
    Systems with high density packing of micromachines 失效
    具有高机械密度的微机械系统

    公开(公告)号：US06600201B2

    公开(公告)日：2003-07-29

    申请号：US09923000

    申请日：2001-08-03

    Applicant: Peter G. Hartwell ,  Robert G. Walmsley

    Inventor： Peter G. Hartwell ,  Robert G. Walmsley

    IPC: H01L2982

    CPC classification number: B81B7/04 ,  B81B2201/038

    Abstract: Micromachine systems are provided. An embodiment of such a micromachine system includes a substrate that defines a trench. First and second microelectromechanical devices are arranged at least partially within the trench. Each of the microelectromechanical devices incorporates a first portion that is configured to move relative to the substrate. Methods also are provided.

    Abstract translation: 提供微机系统。 这种微机械系统的一个实施例包括限定沟槽的衬底。 第一和第二微机电装置至少部分地布置在沟槽内。 每个微电子机械装置包括被构造成相对于基板移动的第一部分。 还提供了方法。

    Tiltable-body apparatus, and method of fabricating the same
    82.
    发明申请
    Tiltable-body apparatus, and method of fabricating the same 有权
    可倾倒体装置及其制造方法

    公开(公告)号：US20020114053A1

    公开(公告)日：2002-08-22

    申请号：US10073304

    申请日：2002-02-13

    Applicant: Canon Kabushiki Kaisha

    Inventor： Susumu Yasuda ,  Hidemasa Mizutani ,  Takayuki Yagi ,  Yasuhiro Shimada ,  Futoshi Hirose ,  Takahisa Kato

    IPC: G02B026/08

    CPC classification number: G02B26/105 ,  B81B3/0051 ,  B81B3/0067 ,  B81B2201/038 ,  B81B2201/042 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C2201/0133 ,  G02B26/0841 ,  Y10S359/90 ,  Y10S359/904

    Abstract: The tiltable-body apparatus including a frame member, a tiltable body, and a pair of torsion springs having a twisting longitudinal axis. The torsion springs are disposed along the twisting longitudinal axis opposingly with the tiltable body being interposed, support the tiltable body flexibly and rotatably about the twisting longitudinal axis relative to the frame member, and include a plurality of planar portions, compliant directions of which intersect each other when viewed along a direction of the twisting longitudinal axis. A center of gravity of the tiltable body is positioned on the twisting longitudinal axis of the torsion springs.

    Abstract translation: 可倾斜体装置包括框架构件，可倾斜体和具有扭转纵向轴线的一对扭转弹簧。 扭转弹簧沿着与可倾斜主体相对的扭转纵向轴线布置，其相对于框架构件围绕扭转纵向轴线柔性地和可旋转地支撑可倾斜体，并且包括多个平面部分，顺应方向与每个 另外当沿着扭转纵向轴线的方向观察时。 可倾斜体的重心位于扭转弹簧的扭转纵向轴线上。

    MEMS variable optical attenuator
    84.
    发明授权
    MEMS variable optical attenuator 失效
    MEMS可变光衰减器

    公开(公告)号：US06275320B1

    公开(公告)日：2001-08-14

    申请号：US09405789

    申请日：1999-09-27

    Applicant: Vijayakumar R. Dhuler ,  Edward A. Hill ,  Ramaswamy Mahadevan ,  Mark David Walters ,  Robert L. Wood

    Inventor： Vijayakumar R. Dhuler ,  Edward A. Hill ,  Ramaswamy Mahadevan ,  Mark David Walters ,  Robert L. Wood

    IPC: G02B2600

    CPC classification number: G02B26/0841 ,  B81B3/0054 ,  B81B2201/038 ,  B81B2201/047 ,  G02B6/266

    Abstract: A MEMS (Micro Electro Mechanical System) variable optical attenuator is provided that is capable of optical attenuation over a full range of optical power. The MEMS variable optical attenuator comprises a microelectronic substrate, a MEMS actuator and an optical shutter. The MEMS variable optical attenuator may also comprise a clamping element capable of locking the optical shutter at a desired attenuation position. The variable light attenuator is capable of attenuating optical beams that have their optical axis running parallel and perpendicular to the substrate. Additionally, the MEMS actuator of the present invention may comprise an array of MEMS actuators capable of supplying the optical shutter with greater displacement distances and, thus a fuller range of optical attenuation. In one embodiment of the invention, the MEMS actuator comprises a thermal arched beam actuator. Additionally, the variable optical attenuator of the present invention may be embodied in a thermal bimorph cantilever structure. This alternate embodiment includes a microelectronic substrate and a thermal bimorph cantilever structure having at least two materials of different thermal coefficient of expansion. The thermal bimorph is responsive to thermal activation and moves in the direction of the material having the lower thermal coefficient expansion. Upon activation, the thermal bimorph intercepts the path of the optical beam and provides for the desired level of optical attenuation. The invention also provides for a method of optical attenuation and a method for fabricating an optical attenuator in accordance with the described structures.

    Abstract translation: 提供了一种能够在全光范围内进行光衰减的MEMS（微机电系统）可变光衰减器。 MEMS可变光衰减器包括微电子衬底，MEMS致动器和光学快门。 MEMS可变光衰减器还可以包括能够将光学快门锁定在期望的衰减位置的夹紧元件。 可变光衰减器能够衰减其光轴平行且垂直于衬底的光束。 另外，本发明的MEMS致动器可以包括MEMS致动器的阵列，其能够向光学快门提供更大的位移距离，并且因此具有更宽的光学衰减范围。 在本发明的一个实施例中，MEMS致动器包括热拱形梁致动器。 另外，本发明的可变光衰减器可以以热双压电晶片悬臂结构体现。 该替代实施例包括具有不同热膨胀系数的至少两种材料的微电子衬底和热双压电晶片悬臂结构。 热双压电晶体响应于热激活并沿具有较低热系数膨胀的材料的方向移动。 在激活时，热双压电晶片截取光束的路径并提供所需的光衰减水平。 本发明还提供了一种光衰减的方法以及根据所述结构制造光衰减器的方法。

    Wideband power attenuators in RF-MEMS technology
    85.
    发明授权
    Wideband power attenuators in RF-MEMS technology 有权

    公开(公告)号：US09847801B1

    公开(公告)日：2017-12-19

    申请号：US15497662

    申请日：2017-04-26

    Applicant: Fondazione Bruno Kessler

    Inventor： Jacopo Iannacci

    IPC: H04B1/04 ,  B81B3/00

    CPC classification number: H04B1/0475 ,  B81B3/0021 ,  B81B2201/038 ,  B81B2203/0127 ,  H04B1/0458 ,  H04B2001/045

    Abstract: A wideband power attenuator in RF-MEMS multilayer technology, for attenuating an electromagnetic signal, includes an upper layer with two RF ground planes, and between said two RF ground planes a central RF-MEMS movable switch as a floating electrode, an RF input, an RF output of an RF line running across the attenuator, a number of lower layers including in sequence: a ground floor of an electrically insulating substrate; two DC biasing electrodes to electrostatically control said movable switch, and DC biasing lines to feed the DC biasing electrodes; two DC-RF decoupling resistors, each decoupling resistor being connected on one side to respective terminals of said movable switch, and on the other side to respective one of the two RF ground planes; a resistive load adapted to be connected to the RF line to attenuate the electromagnetic signal on the basis of the floating movable switch configuration, between a non-contact RF position and a contact RF position with said RF line.

    PROCESS FOR MANUFACTURING A MICROELECTROMECHANICAL INTERACTION SYSTEM FOR A STORAGE MEDIUM
    87.
    发明申请
    PROCESS FOR MANUFACTURING A MICROELECTROMECHANICAL INTERACTION SYSTEM FOR A STORAGE MEDIUM 审中-公开
    用于制造存储介质的微电子交互系统的方法

    公开(公告)号：US20160332871A1

    公开(公告)日：2016-11-17

    申请号：US15220267

    申请日：2016-07-26

    Applicant: STMICROELECTRONICS S.R.L.

    Inventor： Giuseppe Barillaro ,  Alessandro Diligenti ,  Caterina Riva ,  Roberto Campedelli ,  Stefano Losa

    IPC: B81C1/00

    CPC classification number: B81C1/00539 ,  B81B2201/038 ,  B81B2201/07 ,  B81B2201/12 ,  B81B2203/0118 ,  B81B2203/019 ,  B81C1/00595 ,  B81C2201/0136 ,  B81C2203/0714 ,  H01L27/10

    Abstract: A process for manufacturing an interaction system of a microelectromechanical type for a storage medium, the interaction system provided with a supporting element and an interaction element carried by the supporting element, envisages the steps of: providing a wafer of semiconductor material having a substrate with a first type of conductivity and a top surface; forming a first interaction region having a second type of conductivity, opposite to the first type of conductivity, in a surface portion of the substrate in the proximity of the top surface; and carrying out an electrochemical etch of the substrate starting from the top surface, the etching being selective with respect to the second type of conductivity, so as to remove the surface portion of the substrate and separate the first interaction region from the substrate, thus forming the supporting element.

    Abstract translation: 一种用于制造用于存储介质的微机电类型的相互作用系统的方法，具有支撑元件的相互作用系统和由支撑元件承载的相互作用元件，其设想是提供具有基板的半导体材料晶片，其具有 第一类导电性和顶面; 在所述顶表面附近的所述衬底的表面部分中形成具有与所述第一类型导电性相反的第二导电类型的第一相互作用区域; 并且从顶表面开始进行基板的电化学蚀刻，蚀刻相对于第二类型的导电性是选择性的，以便去除基板的表面部分并将第一相互作用区域与基板分离，从而形成 支撑元件。

    Display apparatus incorporating corrugated beam actuators
    90.
    发明授权
    Display apparatus incorporating corrugated beam actuators 有权
    包含波纹束致动器的显示装置

    公开(公告)号：US09299275B2

    公开(公告)日：2016-03-29

    申请号：US14146362

    申请日：2014-01-02

    Applicant: Pixtronix, Inc.

    Inventor： Tyler Dunn ,  Mark B. Andersson

    IPC: G02B26/02 ,  G09F9/37 ,  B81B3/00 ,  H02N1/00 ,  G02B26/04

    CPC classification number: G09F9/372 ,  B81B3/0021 ,  B81B3/007 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2203/0109 ,  B81B2203/0163 ,  G02B26/04 ,  H02N1/002

    Abstract: This disclosure provides systems, methods and apparatus for shutter-based EMS light modulators controlled by electrode actuators that include complementary sets of corrugations or teeth along the opposing beams of the actuators. The complementary sets of corrugations substantially engage one another when drawn together via an actuation voltage. By applying the actuation voltage across the opposing beams of such an actuator, the beams are drawn together both by the electromotive force resulting from the electric field acting between the portions of the beams that are substantially perpendicular to the direction of actuation of the actuator, and by fringing fields between the sides of the corrugations, which are substantially parallel to the direction of actuation. The additional fringing fields provide for increased electromotive force for a given input voltage.

    Abstract translation: 本公开提供了由电极致动器控制的基于快门的EMS光调制器的系统，方法和装置，其包括沿致动器的相对梁的互补的波纹或齿的组。 互补的波纹组在通过致动电压拉在一起时基本上彼此接合。 通过将致动电压施加在这种致动器的相对的梁上，通过作用在基本上垂直于致动器的致动方向的梁的部分之间的电场产生的电动势将光束牵引在一起，以及 通过在波纹的两侧之间划线，其基本上平行于致动方向。 额外的边缘场提供给定输入电压的增加的电动势。

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