Ion beam sample preparation apparatus and methods
    81.
    发明授权
    Ion beam sample preparation apparatus and methods 有权
    离子束样品制备装置及方法

    公开(公告)号:US08653489B2

    公开(公告)日:2014-02-18

    申请号:US13082361

    申请日:2011-04-07

    Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. Additionally, apparatus kits are disclosed that enable the use of the same shields in the observation of prepared samples.

    Abstract translation: 公开了用于使用实施例的离子束样品制备装置和方法的实施方案。 该装置包括在真空室中的离子束照射装置,其可以将离子定向到样品,阻挡部分朝向样品的离子的屏蔽件,以及具有屏蔽保持装置的屏蔽保持台,该屏蔽保持装置可替换地和可移除地将屏蔽保持在 一个位置。 当屏蔽保持在屏蔽保持阶段时,屏蔽具有与屏蔽保持平台上的辅助基准特征相交的基准特征。 屏蔽件具有能够将样品耐久地粘附到屏蔽件的特征,以用离子束处理样品。 屏蔽和屏蔽保持阶段的补充基准特征使得样品能够准确和可重复地定位在用于样品处理和再处理的设备中。 此外,公开了能够在观察制备的样品时使用相同屏蔽的装置套件。

    CHARGED PARTICLE BEAM APPARATUS
    82.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号:US20140021347A1

    公开(公告)日:2014-01-23

    申请号:US14111174

    申请日:2012-03-02

    Abstract: Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.

    Abstract translation: 提供一种能够在空气气氛或气体环境中观察观察目标样品的带电粒子束装置或带电粒子显微镜,而不会对传统的高真空带电粒子显微镜的构造进行显着变化。 在构成为使用薄膜(10)分离真空环境和空气气氛(或气体环境)的带电粒子束装置中,能够保持薄膜(10)的附件(121),其内部 可以在空气气氛中保持,或者将气体环境插入到高真空带电粒子显微镜的真空室(7)中。 附件(121)被真空密封并固定到真空样品室的真空隔板。 通过用氦气或具有比大气气体如氮气或水蒸气更低的质量的轻质气体代替附件中的气氛来进一步改善图像质量。

    Sample block holder
    84.
    发明授权
    Sample block holder 有权
    样品块支架

    公开(公告)号:US08624199B2

    公开(公告)日:2014-01-07

    申请号:US13284729

    申请日:2011-10-28

    Abstract: A sample holder assembly includes a sample tray, a base plate, a stage mount, and a calibration standard mounted onto the stage mount. Three mating structures on the bottom of the base plate mate with corresponding structures on a stage mount that is attached to the sample stage of the SEM. An optional contacting conductor provides electrical contact between the stage mount and the base plate so that charge generated on the sample by the electron beam can leave the sample through the sample conductive layer to the sample tray, to the base plate, to the stage mount, and through the grounded stage.

    Abstract translation: 样品架组件包括样品托盘,基板,载物台和安装在载物台上的校准标准品。 底板底部的三个配合结构与安装在扫描电镜样品台上的台架上的相应结构配合。 可选的接触导体提供台架和基板之间的电接触,使得通过电子束在样品上产生的电荷可以使样品通过样品导电层到样品托盘,到基板,到载物台, 并通过接地阶段。

    Method and apparatus for specimen fabrication
    85.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号:US08569719B2

    公开(公告)日:2013-10-29

    申请号:US13326783

    申请日:2011-12-15

    Abstract: A focused ion beam apparatus, including: a sample holder provided with a fixing surface for fixing, via a deposition film, a micro-specimen extracted from a specimen using a method for fabrication by a focused ion beam, in which a width of the fixing surface is smaller than 50 microns; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen extracted from the specimen by the focused ion-beam fabrication method, to the sample holder; and a sample chamber in which the sample, the sample holder and the probe are laid out, wherein, in the sample chamber, the micro-specimen extracted from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of the sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam.

    Abstract translation: 一种聚焦离子束装置,包括:样本保持器,其设置有固定表面,用于通过沉积膜固定从样本提取的微量样本,其中使用聚焦离子束制造方法,其中定影宽度 表面小于50微米; 具有可以通过沉积膜将样品接合的探针的样本转移单元,通过聚焦离子束制造方法将从样品提取的微量样品转移到样品保持器; 以及样本室,样本保持器和探针布置在其中,其中,在样本室中,通过聚焦离子束制造方法从样本提取的微量样本被固定到 通过沉积膜的样品保持器和固定到固定表面的微型样品通过照射聚焦离子束来制造。

    Lathe Head for Nano/Micro Machining of Materials
    86.
    发明申请
    Lathe Head for Nano/Micro Machining of Materials 有权
    车床用于纳米/微加工材料

    公开(公告)号:US20130276599A1

    公开(公告)日:2013-10-24

    申请号:US13842899

    申请日:2013-03-15

    Abstract: Apparatus, methods and systems for nano/micro machining. A lathe head has a microscopic pivot aperture for seating a conical tip. The conical tip is carried on a turnable part at one end thereof and is polished down to a microscopic apex. The microscopic pivot aperture is dimensioned for seating the concentric tip in the pivot aperture such that an apex of the conical tip protrudes through and beyond the aperture to a position in close proximity with the aperture. A driver system can comprise a rotator for axially rotating the turnable part, including the conical tip seated in the pivot aperture, and a forward pressure applicator for concurrently applying forward pressure to the conical tip in the direction of the pivot aperture. A light/particle beam system can be utilized to machine the rotating conical tip and the rotating turnable part, including the tip, can be easily removed after machining.

    Abstract translation: 用于纳米/微加工的装置,方法和系统。 车床头具有用于安置锥形尖端的微观枢轴孔。 锥形尖端在其一端承载在可转动部分上,并被抛光到微观顶点。 微小枢轴孔的尺寸被设计成用于将同心尖端放置在枢转孔中,使得锥形尖端的顶点突出并穿过孔到达与孔近距离的位置。 驱动器系统可以包括用于轴向旋转可转动部件的旋转器,包括安装在枢转孔中的锥形末端,以及向前压力施加器,用于同时向枢转孔的方向向锥形尖端施加向前的压力。 可以使用光/粒子束系统来加工旋转的锥形尖端,并且包括尖端的旋转可转动部件可以在加工后容易地移除。

    PLATEN CLAMPING SURFACE MONITORING
    87.
    发明申请
    PLATEN CLAMPING SURFACE MONITORING 有权
    板夹钳表面监测

    公开(公告)号:US20130248738A1

    公开(公告)日:2013-09-26

    申请号:US13832073

    申请日:2013-03-15

    CPC classification number: H01J37/3171 H01J37/20 H01J2237/0225 H01J2237/2007

    Abstract: An ion implanter includes a platen having a clamping surface configured to support a wafer for treatment with ions, the platen also having at least one pair of electrodes under the clamping surface, a clamping power supply configured to provide an AC signal to the at least one pair of electrodes and a sensed signal representative of the AC signal, and a controller. The controller is configured to receive the sensed signal from the clamping power supply when no wafer is clamped to the clamping surface. The controller is further configured to monitor the sensed signal and determine if the sensed signal is representative of deposits on the clamping surface exceeding a predetermined deposit threshold.

    Abstract translation: 离子注入机包括压板,该压板具有被配置为支撑用于用离子处理的晶片的夹紧表面,所述压板在夹持表面下方还具有至少一对电极;钳位电源,被配置为向所述至少一个 一对电极和表示AC信号的感测信号,以及控制器。 控制器被配置为当没有晶片被夹持到夹紧表面时从钳位电源接收感测到的信号。 控制器还被配置为监视感测到的信号,并确定感测到的信号是否代表夹持表面上的沉积超过预定的沉积阈值。

    Device for holding electron microscope grids and other materials
    88.
    发明授权
    Device for holding electron microscope grids and other materials 有权
    用于保存电子显微镜网格和其他材料的装置

    公开(公告)号:US08507876B2

    公开(公告)日:2013-08-13

    申请号:US13043220

    申请日:2011-03-08

    CPC classification number: H01J37/20 H01J2237/2007 H01J2237/201

    Abstract: A device for holding a specimen holder, the device including a body with a slot formed therein. The slot includes an interior for receiving the specimen holder which may be a flat disk with edges and a pair of opposing sides. The disk may be made of a resilient deformable material. The slot may be sized to receive the specimen holder through an open top end and may taper from top bottom, such that the bottom end of the slot is smaller than the specimen holder. The slot further configured to contact the specimen holder along edges of the specimen holder and to allow some sideways deformation of the specimen holder without either side of the specimen holder distant from the edges coming into contact with the interior of the slot.

    Abstract translation: 一种用于保持试样保持器的装置,该装置包括其中形成有槽的主体。 狭槽包括用于容纳样品架的内部,其可以是具有边缘的平板和一对相对的侧面。 盘可以由弹性可变形材料制成。 狭槽的尺寸可以通过敞开的顶端容纳样品架,并且可以从顶部底部逐渐变细,使得狭槽的底端小于样品架。 所述槽进一步构造成沿着所述试样保持器的边缘接触所述试样保持器,并且允许所述试样保持器的一些侧向变形,而所述试样保持器的任何一侧远离所述边缘与所述槽的内部接触。

    Ion implantation apparatus
    89.
    发明授权
    Ion implantation apparatus 失效
    离子注入装置

    公开(公告)号:US08426829B2

    公开(公告)日:2013-04-23

    申请号:US12894229

    申请日:2010-09-30

    Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.

    Abstract translation: 离子注入机具有植入轮,其具有围绕轮的周边分布的多个晶片载体。 每个晶片载体具有散热器,用于在植入过程期间通过晶片和散热器之间的热接触从载体上的晶片去除热量。 晶片载体具有晶片保持栅栏,其形成为具有在晶片载体的相应晶片支撑平面中的轴线的圆柱形辊。 辊的圆柱形表面提供可以横向移动到晶片支撑表面的晶片邻接表面,使得当晶片通过离心力推靠在散热片上时,栅栏不会向晶片边缘施加横向负载。 晶片支撑表面包括弹性体材料层,并且栅栏的可移动邻接表面允许在晶片的整个区域上与散热器的均匀热耦合。

    Method and apparatus for specimen fabrication
    90.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号:US08405053B2

    公开(公告)日:2013-03-26

    申请号:US13026568

    申请日:2011-02-14

    Abstract: A focused ion beam apparatus, including: a specimen transferring unit having a probe to which a micro-specimen extracted from a specimen, can be joined through a joining deposition film, for transferring the micro-specimen to a sample holder; and wherein, the specimen transferring unit holds the probe which is joined through the joining deposition film to the micro-specimen extracted from the specimen, and the sample stage moves so that the sample holder mounted on the holder clasp is provided into an irradiated range of the focused ion beam, and the specimen transferring unit approaches the probe to the sample holder, and the gas nozzle supplies the deposition gas so that the micro-specimen is fixed to the sample holder through a fixing deposition film, and the ion beam irradiating optical system irradiates the focused ion beam to the micro-specimen fixed to the sample holder for various procedures.

    Abstract translation: 一种聚焦离子束装置,其特征在于,包括:具有从样本中提取微量试样的探针的检体转印单元,能够通过接合沉积膜接合,将所述微观样品转印到样品保持体上; 并且其中,所述检体转印单元将通过所述接合沉积膜接合的所述探针保持在从所述检体提取的所述微量试样上,并且所述样品台移动,使得安装在所述保持器扣上的样品保持器被设置在 聚焦离子束和样品转印单元接近探针到样品保持器,并且气体喷嘴提供沉积气体,使得微量样品通过定影沉积膜固定到样品保持器,并且离子束照射光学 系统将聚焦的离子束照射到固定到样品保持器上的微量样品用于各种程序。

Patent Agency Ranking