LEAKAGE MEASUREMENT OF THROUGH SILICON VIAS
    2.
    发明申请
    LEAKAGE MEASUREMENT OF THROUGH SILICON VIAS 有权
    通过硅胶渗漏测量

    公开(公告)号:US20130069062A1

    公开(公告)日:2013-03-21

    申请号:US13233085

    申请日:2011-09-15

    IPC分类号: H01L23/58 H01L21/66

    摘要: A leakage measurement structure for through substrate vias which includes a semiconductor substrate; a plurality of through substrate vias in the semiconductor substrate extending substantially through the semiconductor substrate; and a leakage measurement structure located in the semiconductor substrate. The leakage measurement structure includes a plurality of substrate contacts extending into the semiconductor substrate; a plurality of sensing circuits connected to the plurality of through substrate vias and to the plurality of the substrate contacts, the plurality of sensing circuits providing a plurality of outputs indicative of current leakage from the plurality of through substrate vias; a built-in self test (BIST) engine to step through testing of the plurality of through substrate vias; and a memory coupled to the BIST engine to receive the outputs from the plurality of sensing circuits. Also included is a method of testing a semiconductor substrate having a plurality of through substrate vias for current leakage.

    摘要翻译: 一种用于通过衬底通孔的泄漏测量结构,其包括半导体衬底; 半导体衬底中的多个穿过衬底通孔,其基本上延伸穿过半导体衬底; 以及位于半导体衬底中的泄漏测量结构。 泄漏测量结构包括延伸到半导体衬底中的多个衬底触点; 多个感测电路,连接到多个通过衬底通孔和多个衬底触点,所述多个感测电路提供指示来自多个通过衬底通孔的电流泄漏的多个输出; 一个内置的自检(BIST)引擎,逐步测试多个通过基板通孔; 以及耦合到BIST引擎以接收来自多个感测电路的输出的存储器。 还包括一种测试半导体衬底的方法,该半导体衬底具有用于电流泄漏的多个通过衬底通孔。

    Leakage measurement structure having through silicon vias
    6.
    发明授权
    Leakage measurement structure having through silicon vias 有权
    泄漏测量结构通过硅通孔

    公开(公告)号:US08692246B2

    公开(公告)日:2014-04-08

    申请号:US13233085

    申请日:2011-09-15

    摘要: A leakage measurement structure for through substrate vias which includes a semiconductor substrate; a plurality of through substrate vias in the semiconductor substrate extending substantially through the semiconductor substrate; and a leakage measurement structure located in the semiconductor substrate. The leakage measurement structure includes a plurality of substrate contacts extending into the semiconductor substrate; a plurality of sensing circuits connected to the plurality of through substrate vias and to the plurality of the substrate contacts, the plurality of sensing circuits providing a plurality of outputs indicative of current leakage from the plurality of through substrate vias; a built-in self test (BIST) engine to step through testing of the plurality of through substrate vias; and a memory coupled to the BIST engine to receive the outputs from the plurality of sensing circuits. Also included is a method of testing a semiconductor substrate.

    摘要翻译: 一种用于通过衬底通孔的泄漏测量结构,其包括半导体衬底; 半导体衬底中的多个穿过衬底通孔,其基本上延伸穿过半导体衬底; 以及位于半导体衬底中的泄漏测量结构。 泄漏测量结构包括延伸到半导体衬底中的多个衬底触点; 多个感测电路,连接到多个通过衬底通孔和多个衬底触点,所述多个感测电路提供指示来自多个通过衬底通孔的电流泄漏的多个输出; 一个内置的自检(BIST)引擎,逐步测试多个通过基板通孔; 以及耦合到BIST引擎以接收来自多个感测电路的输出的存储器。 还包括测试半导体衬底的方法。