公开(公告)号：US09209015B2

公开(公告)日：2015-12-08

申请号：US12783312

申请日：2010-05-19

申请人： Tetsuo Yamamoto ,  Naoki Matsumoto ,  Koichi Honda

发明人： Tetsuo Yamamoto ,  Naoki Matsumoto ,  Koichi Honda

IPC分类号： C23C16/00 ,  H01L21/306 ,  C23F1/00 ,  H01L21/02 ,  C23C16/34 ,  C23C16/455 ,  C23C16/50 ,  H01J37/32 ,  C23C16/52

CPC分类号： H01L21/02274 ,  C23C16/345 ,  C23C16/45544 ,  C23C16/45578 ,  C23C16/50 ,  C23C16/52 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/3244 ,  H01J2237/3321 ,  H01L21/0214 ,  H01L21/0228

摘要： Provided is a substrate processing apparatus, which comprises a process chamber configured to process a substrate, a first plasma generation chamber in the process chamber, a first reactive gas supply unit configured to supply first reactive gas into the first plasma generation chamber, a pair of first discharge electrodes configured to generate plasma and to excite the first reactive gas, a first gas ejection port installed in a side wall of the first plasma generation chamber to eject an active species toward the substrate, a second plasma generation chamber in the process chamber, a second reactive gas supply unit configured to supply second reactive gas into the second plasma generation chamber, a pair of second discharge electrodes configured to generate plasma and to excite the second reactive gas, and a second gas ejection port installed in a side wall of the second plasma generation chamber to eject an active species.

摘要翻译： 提供了一种基板处理装置，其包括处理基板的处理室，处理室中的第一等离子体生成室，被配置为将第一反应气体供应到第一等离子体产生室中的第一反应气体供给单元， 第一放电电极，被配置为产生等离子体并激发第一反应气体;第一气体喷出口，安装在第一等离子体产生室的侧壁中，以向基板喷射活性物质;处理室中的第二等离子体产生室; 第二反应气体供给单元，被配置为将第二反应气体供应到第二等离子体产生室中;一对第二放电电极，被配置为产生等离子体并激发第二反应气体;以及第二气体喷出口，其安装在第二等离子体产生室的侧壁中 第二等离子体产生室以喷射活性物质。

公开(公告)号：US09175395B2

公开(公告)日：2015-11-03

申请号：US13230869

申请日：2011-09-13

申请人： Masayuki Asai ,  Koichi Honda ,  Mamoru Umemoto ,  Kazuyuki Okuda

发明人： Masayuki Asai ,  Koichi Honda ,  Mamoru Umemoto ,  Kazuyuki Okuda

IPC分类号： C23C16/455 ,  C23C16/52 ,  C23C16/08 ,  C23C16/34 ,  C23C16/40 ,  C23C16/44 ,  C23C16/509 ,  C23C16/54 ,  H01J37/32 ,  H01L21/02 ,  H01L21/033 ,  H01L21/3205

CPC分类号： C23C16/52 ,  C23C16/08 ,  C23C16/345 ,  C23C16/401 ,  C23C16/4401 ,  C23C16/4408 ,  C23C16/45542 ,  C23C16/45544 ,  C23C16/509 ,  C23C16/54 ,  H01J37/3244 ,  H01J37/32899 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02175 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/02568 ,  H01L21/0262 ,  H01L21/0337 ,  H01L21/32051 ,  H01L21/32053

摘要： Disclosed is a substrate processing apparatus including: a processing chamber; plural buffer chambers; a first processing gas supply system that supplies a first processing gas to the processing chamber; a second processing gas supply system that supplies a second processing gas to the buffer chambers; a RF power source; plasma-generating electrodes in the buffer chambers; a heating system; and a controller that controls the first and second processing gas supply systems, the power source, and the heating system to expose the substrate having a metal film thereon to the first processing gas, and the second processing gas that is activated in the plural buffer chambers with an application of RF power to the electrodes and that is supplied from the buffer chambers to the processing chamber to form a film on the metal film while heating the substrate to a self-decomposition temperature of the first processing gas or lower.

摘要翻译： 公开了一种基板处理装置，包括：处理室; 多个缓冲室; 第一处理气体供应系统，其向所述处理室供应第一处理气体; 向缓冲室供给第二处理气体的第二处理气体供给系统; 射频电源; 缓冲室中的等离子体产生电极; 加热系统; 以及控制器，其控制第一和第二处理气体供应系统，电源和加热系统，以将其上具有金属膜的基板暴露于第一处理气体，以及在多个缓冲室中被激活的第二处理气体 对电极施加RF功率，并且从缓冲室供应到处理室，以在将衬底加热至第一处理气体的自分解温度或更低温度的同时在金属膜上形成膜。

公开(公告)号：US20100300357A1

公开(公告)日：2010-12-02

申请号：US12783312

申请日：2010-05-19

申请人： Tetsuo Yamamoto ,  Naoki Matsumoto ,  Koichi Honda

发明人： Tetsuo Yamamoto ,  Naoki Matsumoto ,  Koichi Honda

IPC分类号： H01L21/46 ,  C23C16/513

CPC分类号： H01L21/02274 ,  C23C16/345 ,  C23C16/45544 ,  C23C16/45578 ,  C23C16/50 ,  C23C16/52 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/3244 ,  H01J2237/3321 ,  H01L21/0214 ,  H01L21/0228

摘要： Provided is a substrate processing apparatus, which comprises a process chamber configured to process a substrate, a first plasma generation chamber in the process chamber, a first reactive gas supply unit configured to supply first reactive gas into the first plasma generation chamber, a pair of first discharge electrodes configured to generate plasma and to excite the first reactive gas, a first gas ejection port installed in a side wall of the first plasma generation chamber to eject an active species toward the substrate, a second plasma generation chamber in the process chamber, a second reactive gas supply unit configured to supply second reactive gas into the second plasma generation chamber, a pair of second discharge electrodes configured to generate plasma and to excite the second reactive gas, and a second gas ejection port installed in a side wall of the second plasma generation chamber to eject an active species.

摘要翻译： 提供了一种基板处理装置，其包括处理基板的处理室，处理室中的第一等离子体生成室，被配置为将第一反应气体供应到第一等离子体产生室中的第一反应气体供给单元， 第一放电电极，被配置为产生等离子体并激发第一反应气体;第一气体喷出口，安装在第一等离子体产生室的侧壁中，以向基板喷射活性物质;处理室中的第二等离子体产生室; 第二反应气体供给单元，被配置为将第二反应气体供应到第二等离子体产生室中;一对第二放电电极，被配置为产生等离子体并激发第二反应气体;以及第二气体喷出口，其安装在第二等离子体产生室的侧壁中 第二等离子体产生室以喷射活性物质。

公开(公告)号：US20080305014A1

公开(公告)日：2008-12-11

申请号：US12132606

申请日：2008-06-03

申请人： Koichi Honda

发明人： Koichi Honda

IPC分类号： G05D7/00

CPC分类号： G05D7/0641

摘要： A substrate processing apparatus which stably supplies a vaporized gas of liquid raw material to a processing chamber includes liquid raw material tanks storing a liquid raw material, a carrier gas supply line supplying a carrier gas to one of the tanks, a raw material supply line pressure-feeding to this tank the liquid raw material of the other tank, a carrier gas supply line feeding a carrier gas to the tank, a raw material supply line feeding to the processing chamber a vaporized gas of the liquid raw material of the tank, a mass flow controller which controls the flow rate of the carrier gas, a mass flow controller detecting the flow rate of the vaporized gas of the liquid raw material, and a feedback device feeding back a detection result of the mass flow controller to the former mass flow controller.

摘要翻译： 将液体原料的汽化气体稳定地供给到处理室的基板处理装置包括：液体原料罐，储存液体原料的液体原料罐;向其中一个罐供给载气的载气供给管;原料供给管路压力 向该罐供给另一罐的液体原料，将载气供给到罐的载气供给管，向处理室供给罐的液体原料的气化气体的原料供给管， 控制载气流量的质量流量控制器，检测液体原料的汽化气体的流量的质量流量控制器以及将质量流量控制器的检测结果反馈到前一质量流量的反馈装置 控制器。

公开(公告)号：US5761339A

公开(公告)日：1998-06-02

申请号：US563533

申请日：1995-11-28

申请人： Nobuo Ikeshoji ,  Tatsuya Yamamoto ,  Toshiro Kamiuchi ,  Nagaharu Hamada ,  Koichi Honda ,  Hiromi Yamakawa

发明人： Nobuo Ikeshoji ,  Tatsuya Yamamoto ,  Toshiro Kamiuchi ,  Nagaharu Hamada ,  Koichi Honda ,  Hiromi Yamakawa

IPC分类号： H04N1/387 ,  G06T5/00 ,  G06T5/20 ,  H04N1/38 ,  H04N1/40 ,  H04N1/58 ,  H04N1/409

CPC分类号： H04N1/58 ,  H04N1/38

摘要： An image processing method for automatically executing operation steps of repairing a defect of an image of a document which is read by a scanner and changing a background image in a short time and a recording medium for storing them. An image processing method comprising: (a) A step of separating background image data from said image data by processing by a maximum filter for comparing the brightness of each pixel constituting said image data with the brightness of peripheral pixels and replacing it with the maximum brightness; and (b) a step of separating character and figure image data by subtracting the background image data obtained by the above step in (a) from the above image data.

摘要翻译： 一种图像处理方法，用于自动执行修复由扫描仪读取并在短时间内改变背景图像的文档的图像的缺陷的操作步骤以及用于存储它们的记录介质。 一种图像处理方法，包括：（a）通过最大滤波器处理从所述图像数据中分离背景图像数据的步骤，用于将构成所述图像数据的每个像素的亮度与周边像素的亮度进行比较，并将其替换为最大亮度 ; 以及（b）通过从上述图像数据中减去由（a）中的上述步骤获得的背景图像数据来分离字符和图像数据的步骤。

公开(公告)号：US5538882A

公开(公告)日：1996-07-23

申请号：US204656

申请日：1994-03-02

申请人： Ikuo Matsui ,  Kazuhiko Ishikawa ,  Sachio Miyairi ,  Koichi Honda

发明人： Ikuo Matsui ,  Kazuhiko Ishikawa ,  Sachio Miyairi ,  Koichi Honda

IPC分类号： C12N9/10 ,  C12N9/30 ,  C12N15/09 ,  C12N15/54 ,  C12P19/14 ,  C12P19/18 ,  C12R1/07 ,  C12R1/125 ,  C12R1/645 ,  C12R1/865 ,  C12N15/56

CPC分类号： C12N9/242 ,  C12N9/1074 ,  C12P19/18 ,  Y10S435/832

摘要： There is disclosed a variant-type carbohydrate hydrolase that has been increased transglycosylation activity by substituting another amino acid residue for the tyrosine residue that is present in the active center of the hydrolase, which hydrolase is an amylase or an enzyme analogous to amylase; a gene or a DNA sequence of the carbohydrate hydrolase with mutation introduced into the base sequence that encodes the tyrosine residue; and a vector or a transformant which comprises the DNA sequence. There is also disclosed a method for producing a variety of oligosaccharides and the like by using the variant-type carbohydrate hydrolase.

摘要翻译： 公开了通过用另一个氨基酸残基取代存在于水解酶的活性中心的酪氨酸残基而已经增加转糖基化活性的变体型碳水化合物水解酶，该水解酶是淀粉酶或类似于淀粉酶的酶; 具有导入编码酪氨酸残基的碱基序列的突变的碳水化合物水解酶的基因或DNA序列; 以及包含DNA序列的载体或转化体。 还公开了通过使用变体型碳水化合物水解酶来生产各种寡糖等的方法。

公开(公告)号：US5051090A

公开(公告)日：1991-09-24

申请号：US506185

申请日：1990-04-09

申请人： Norio Anzawa ,  Koji Adachi ,  Tetsuo Futakawa ,  Koichi Honda ,  Shigekazu Fujii ,  Hironari Sato ,  Toshiyuki Irita

发明人： Norio Anzawa ,  Koji Adachi ,  Tetsuo Futakawa ,  Koichi Honda ,  Shigekazu Fujii ,  Hironari Sato ,  Toshiyuki Irita

IPC分类号： F23D5/00

CPC分类号： F23D5/00

摘要： A method for burning foamed liquid fuel in a combustion chamber comprises the steps of foaming the liquid fuel and separately supplying air required for continuous stable combustion of the foamed fuel. An apparatus for carrying out the method is also disclosed.

摘要翻译： 在燃烧室中燃烧泡沫液体燃料的方法包括以下步骤：使液体燃料发泡，并分别供应发泡燃料的连续稳定燃烧所需的空气。 还公开了一种用于执行该方法的装置。

公开(公告)号：US4160698A

公开(公告)日：1979-07-10

申请号：US831649

申请日：1977-09-08

申请人： Sachio Miyairi ,  Hideaki Tanaka ,  Akira Yabe ,  Koichi Honda

发明人： Sachio Miyairi ,  Hideaki Tanaka ,  Akira Yabe ,  Koichi Honda

IPC分类号： C12N11/08 ,  C12N11/02 ,  C07G7/02

CPC分类号： C12N11/02

摘要： A given enzyme is immobilized by a method comprising the steps of mixing the enzyme with an azido compound and a high molecular compound as a carrier, forming the resultant mixture in a desired shape, drying the formed mixture and exposing the formed and dried mixture to light for thereby causing the enzyme to be bound to the azido group of the azido compound and to be bound to the high molecular compound.

摘要翻译： 通过包括以下步骤的方法固定给定的酶，所述方法包括将酶与叠氮化合物和高分子化合物作为载体混合，将所得混合物形成所需形状，干燥形成的混合物并将形成的和干燥的混合物暴露于光 从而使酶与叠氮化合物的叠氮基结合并与高分子化合物结合。

公开(公告)号：US20120100722A1

公开(公告)日：2012-04-26

申请号：US13230869

申请日：2011-09-13

申请人： Masayuki ASAI ,  Koichi HONDA ,  Mamoru UMEMOTO ,  Kazuyuki OKUDA

发明人： Masayuki ASAI ,  Koichi HONDA ,  Mamoru UMEMOTO ,  Kazuyuki OKUDA

IPC分类号： H01L21/31 ,  C23C16/505

CPC分类号： C23C16/52 ,  C23C16/08 ,  C23C16/345 ,  C23C16/401 ,  C23C16/4401 ,  C23C16/4408 ,  C23C16/45542 ,  C23C16/45544 ,  C23C16/509 ,  C23C16/54 ,  H01J37/3244 ,  H01J37/32899 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02175 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/02568 ,  H01L21/0262 ,  H01L21/0337 ,  H01L21/32051 ,  H01L21/32053

摘要： Disclosed is a substrate processing apparatus including: a processing chamber; plural buffer chambers; a first processing gas supply system that supplies a first processing gas to the processing chamber; a second processing gas supply system that supplies a second processing gas to the buffer chambers; a RF power source; plasma-generating electrodes in the buffer chambers; a heating system; and a controller that controls the first and second processing gas supply systems, the power source, and the heating system to expose the substrate having a metal film thereon to the first processing gas, and the second processing gas that is activated in the plural buffer chambers with an application of RF power to the electrodes and that is supplied from the buffer chambers to the processing chamber to form a film on the metal film while heating the substrate to a self-decomposition temperature of the first processing gas or lower.

摘要翻译： 公开了一种基板处理装置，包括：处理室; 多个缓冲室; 第一处理气体供应系统，其向所述处理室供应第一处理气体; 向缓冲室供给第二处理气体的第二处理气体供给系统; 射频电源; 缓冲室中的等离子体产生电极; 加热系统; 以及控制器，其控制第一和第二处理气体供应系统，电源和加热系统，以将其上具有金属膜的基板暴露于第一处理气体，以及在多个缓冲室中被激活的第二处理气体 对电极施加RF功率，并且从缓冲室供应到处理室，以在将衬底加热至第一处理气体的自分解温度或更低温度的同时在金属膜上形成膜。

公开(公告)号：US5943045A

公开(公告)日：1999-08-24

申请号：US920013

申请日：1997-08-26

申请人： Nobuo Ikeshoji ,  Tatsuya Yamamoto ,  Toshiro Kamiuchi ,  Nagaharu Hamada ,  Koichi Honda ,  Hiromi Yamakawa

发明人： Nobuo Ikeshoji ,  Tatsuya Yamamoto ,  Toshiro Kamiuchi ,  Nagaharu Hamada ,  Koichi Honda ,  Hiromi Yamakawa

IPC分类号： G09G5/06 ,  G06T1/00 ,  G06T9/00 ,  H04N1/407 ,  H04N1/60

CPC分类号： G09G5/06 ,  H04N1/4074 ,  H04N1/6027

摘要： An image file for recording natural images, a generation method of the image file and an image display apparatus for displaying image data from this image file. The image file includes image data obtained by digitizing an original, and conversion tables for separating the color tones of the original into R, G and B and converting the changes of the color tones to input luminance-v-output luminance. The image display apparatus controls a color look-up table by the conversion tables read out from the image file, and displays the image data read out from the image file. The generation method of the image file includes reading development data by reading the first original by a scanner, generating a histogram between luminance and appearance frequency for each of R, G and B, integrating the appearance frequency to obtain a first cumulative histogram, generating similarly the second cumulative histogram for each of R, G and B of the final original to obtain conversion tables for the second histogram with the first cumulative histogram being the reference, and continuously displaying the color tones of a still image by using the image data and the conversion tables of the first original.

摘要翻译： 用于记录自然图像的图像文件，图像文件的生成方法和用于从该图像文件显示图像数据的图像显示装置。 图像文件包括通过数字化原件获得的图像数据和用于将原稿的色调分离成R，G和B并将色调的变化转换为输入亮度-V输出亮度的转换表。 图像显示装置通过从图像文件读出的转换表来控制颜色查找表，并显示从图像文件读出的图像数据。 图像文件的生成方法包括通过扫描仪读取第一原稿来读取显影数据，为R，G和B中的每一个生成亮度和出现频率之间的直方图，对出现频率进行积分以获得第一累积直方图，同样生成 获得最终原件的R，G和B中的每一个的第二累积直方图，以获得具有第一累积直方图作为参考的第二直方图的转换表，并且通过使用图像数据连续显示静止图像的色调，并且 转换表的第一个原件。