Infra-red device
    6.
    发明授权

    公开(公告)号:US10883804B2

    公开(公告)日:2021-01-05

    申请号:US15852225

    申请日:2017-12-22

    Abstract: We disclose herein an infra-red (IR) device comprising a substrate comprising an etched cavity portion and a substrate portion; a dielectric layer disposed on the substrate. The dielectric layer comprises a dielectric membrane which is adjacent, or directly above, or below the etched cavity portion of the substrate. The device further comprises a reflective layer on or in or above or below the dielectric membrane to enhance emission or absorption of infrared light at one or more wavelengths.

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