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205 条记录 (耗时 0.035 秒)

    End Point Detection in Grinding
    3.
    发明申请
    End Point Detection in Grinding 有权
    研磨中的终点检测

    公开(公告)号：US20130115854A1

    公开(公告)日：2013-05-09

    申请号：US13290879

    申请日：2011-11-07

    申请人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

    发明人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

    IPC分类号： B24B49/10

    CPC分类号： H01L22/26 ,  B24B7/228 ,  B24B37/013 ,  B24B49/10 ,  H01L22/12 ,  H01L23/3114 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method for performing grinding includes selecting a target wheel loading for wafer grinding processes, and performing a grinding process on a wafer. With the proceeding of the grinding process, wheel loadings of the grinding process are measured. The grinding process is stopped after the target wheel loading is reached. The method alternatively includes selecting a target reflectivity of wafer grinding processes, and performing a grinding process on a wafer. With a proceeding of the grinding process, reflectivities of a light reflected from a surface of the wafer are measured. The grinding process is stopped after one of the reflectivities reaches the target reflectivity.

    摘要翻译： 执行磨削的方法包括：选择用于晶片研磨工艺的目标轮加载，以及对晶片进行研磨处理。 随着研磨过程的进行，测量研磨过程的轮载荷。 在达到目标轮加载后停止研磨过程。 该方法或者包括选择晶片研磨过程的目标反射率，以及对晶片进行研磨处理。 随着研磨过程的进行，测量从晶片表面反射的光的反射率。 在一个反射率达到目标反射率之后停止研磨过程。

    Molding Wafer Chamber
    9.
    发明申请
    Molding Wafer Chamber 有权
    成型晶圆室

    公开(公告)号：US20130037990A1

    公开(公告)日：2013-02-14

    申请号：US13208197

    申请日：2011-08-11

    申请人： Jing-Cheng Lin ,  Chin-Chuan Chang ,  Jui-Pin Hung ,  Szu Wei Lu ,  Shin-Puu Jeng ,  Chen-Hua Yu

    发明人： Jing-Cheng Lin ,  Chin-Chuan Chang ,  Jui-Pin Hung ,  Szu Wei Lu ,  Shin-Puu Jeng ,  Chen-Hua Yu

    IPC分类号： H01L21/56

    CPC分类号： H01L21/561 ,  B29C33/123 ,  H01L21/566 ,  H01L23/3121 ,  H01L24/96 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/00

    摘要： A bottom chase and a top chase of a molding system form a cavity to house a molding carrier and one or more devices. The molding carrier is placed in a desired location defined by a guiding component. The guiding component may be entirely within the cavity, or extend above a surface of the bottom chase and extend over a contacting edge of the top chase and the bottom chase, so that there is a gap between the edge of the top chase and the edge of the molding carrier which are filled by molding materials to cover the edge of the molding carrier. Releasing components may be associated with the top chase and/or the bottom chase, which may be a plurality of tape roller with a releasing film, or a plurality of vacuum holes within the bottom chase, or a plurality of bottom pins with the bottom chase.

    摘要翻译： 模制系统的底部追逐和顶部追逐形成容纳模制载体和一个或多个装置的空腔。 模制载体被放置在由引导部件限定的期望位置。 引导部件可以完全在腔内，或者延伸到底部追逐的表面之上，并延伸到顶部追逐和底部追逐的接触边缘上，使得在顶部追逐的边缘和边缘之间存在间隙 由模制材料填充以覆盖模制载体的边缘的模制载体。 释放部件可以与顶部追逐和/或底部追逐相关联，其可以是具有释放膜的多个带辊或底部追逐内的多个真空孔，或者具有底部追逐的多个底部销 。