-
公开(公告)号:US06496528B2
公开(公告)日:2002-12-17
申请号:US09895664
申请日:2001-06-29
IPC分类号: H01S308
CPC分类号: H01S3/036 , G03F7/70025 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/0401 , H01S3/08009 , H01S3/08059 , H01S3/0812 , H01S3/086 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of heat produced by the laser beam inside the line narrowing device. A flexural grating mount is provided which virtually eliminates stress on the grating caused by differential thermal expansion between the grating and the LNP housing structure. In a preferred embodiment the grating which is comprised of a very thin lined aluminum surface on a thick ultra low expansion glass substrate is attached to an aluminum housing structure using a flexural grating mount. At least one flexure joint is provided in the grating mount which permits thermal expansion and contraction of the aluminum housing without producing undesirable mechanical stresses in the glass substrate of the grating. In some embodiments the mount comprises a metal plate and the flexure joint is a H-Flex joint which is machined into the metal plate. In another embodiment two H-Flex joints are provided. In other embodiments, the flexure joint is a dovetail joint permitting one end of the mount to slip relative to the other. In another preferred embodiments a stream of gas is directed across the face of the grating. In other embodiments the effect of a hot gas layer on the face of the grating is reduced with the use of helium as a purge gas and in other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译: 用于生产高能量激光束的线窄激光器的基于光栅的线窄化装置。 提供了用于最小化由线束变窄装置内部的激光束产生的热的不利影响的技术。提供了一种弯曲光栅安装件,其实际上消除了由光栅和LNP壳体结构之间的差分热膨胀引起的对光栅的应力。 在优选实施例中,由厚的超低膨胀玻璃基板上的非常薄的衬里的铝表面组成的光栅使用弯曲光栅安装件附接到铝外壳结构。 在光栅安装件中提供至少一个弯曲接头,其允许铝外壳的热膨胀和收缩,而不会在光栅的玻璃基板中产生不期望的机械应力。 在一些实施例中,安装件包括金属板,并且挠曲接头是被加工成金属板的H-Flex接头。 在另一个实施例中,提供了两个H-Flex接头。 在其它实施例中,挠曲接头是燕尾接头,允许安装座的一端相对于另一端滑动。在另一优选实施例中,气流被引导穿过光栅的表面。 在其他实施例中,使用氦气作为净化气体来减少热气体层在光栅表面上的影响,并且在其它实施例中,减少吹扫气体压力以减少热气体层的光学效应。
-
公开(公告)号:US06882674B2
公开(公告)日:2005-04-19
申请号:US10036676
申请日:2001-12-21
申请人: Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
发明人: Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
IPC分类号: H01S3/097 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号: G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译: 本发明提供了一种准分子激光器,其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数,并控制非常快的PZT驱动调光镜和脉冲功率充电电压,以将波长和脉冲能量保持在所需的极限内。 在优选实施例中,两个风扇马达驱动单个切向风扇,其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。
-
公开(公告)号:US06795474B2
公开(公告)日:2004-09-21
申请号:US10000991
申请日:2001-11-14
申请人: William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
发明人: William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
IPC分类号: H01S322
CPC分类号: G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5 mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element to minimize thermal distortions in the LNP. This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter is provided with a special purge of a compartment exposed to the output laser beam.
摘要翻译: 具有清除光束路径的准分子激光器,其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。 通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。 优选实施例包括热去耦LNP孔元件以最小化LNP中的热失真。 该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 改进的波形计提供了暴露于输出激光束的隔室的特殊吹扫。
-
公开(公告)号:US06396582B1
公开(公告)日:2002-05-28
申请号:US09206526
申请日:1998-12-07
IPC分类号: G01J328
CPC分类号: H01S3/1303 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/134 , H01S3/1392 , H01S3/225
摘要: The present invention includes a system and method for characterizing the wavelength of a beam of radiation using a known reference transition. The invention comprises a vapor including a material having a transition which absorbs radiation of a known wavelength, the vapor being contained in a container. The container includes an optical path along which the beam of radiation can propagate through the vapor. A dispersive optical element is aligned along the optical path. A detector is aligned along the optical path after the dispersive element. Wavelength information about the beam of radiation is determined from the position of a dip in the detector signal that is correlated to the known reference transition. This method is most useful when the laser bandwidth substantially exceeds the transition bandwidth.
摘要翻译: 本发明包括使用已知参考转变来表征辐射束的波长的系统和方法。 本发明包括一种蒸汽,其包括具有吸收已知波长的辐射的过渡物质,该蒸气被包含在容器中。 容器包括一个光路,辐射束沿着该光路传播通过蒸汽。 色散光学元件沿光路对准。 在分散元件之后,检测器沿光路对齐。 关于辐射束的波长信息根据与已知参考转变相关的检测器信号中的倾角的位置来确定。 当激光带宽基本上超过转换带宽时,该方法是最有用的。
-
公开(公告)号:US07346093B2
公开(公告)日:2008-03-18
申请号:US10808157
申请日:2004-03-23
申请人: Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
发明人: Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
CPC分类号: H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要: A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译: 公开了一种高功率窄带,高重复率激光光源光学改进装置和方法,其具有快速可角度定位的反射镜,其具有镜安装框架,具有与安装框架系数不同的系数的反射光学元件,至少一个弯曲安装座 从柔性的安装框架开始,挠曲臂将挠性件附接到安装框架。 该装置可以包括具有细长杆的挠曲力机构。 力机构可以预应力挠曲。 镜子可以是包括在基板上形成有金属层的基板的光栅,以及形成在反射金属层上的由二氧化硅形成的保护涂层。 光栅可以使用电磁感应元件或磁敏元件进行主动调谐。 可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。
-
6.
公开(公告)号:US07277466B2
公开(公告)日:2007-10-02
申请号:US10820261
申请日:2004-04-07
申请人: William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
发明人: William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
CPC分类号: G03F7/70025 , G03F7/70575 , H01S3/027 , H01S3/036 , H01S3/0401 , H01S3/1055 , H01S3/225
摘要: A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the use of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译: 用于基于光栅的线窄化装置的氦气吹扫,用于最大限度地减少线性窄激光器中的热失真,以高重复率产生高能激光束。 与现有技术的氮气清洗相比,使用氦气吹扫的申请人已经显示出实质性的改善。 在优选实施例中,氦气流被引导穿过光栅的表面。 在其它实施例中,减少吹扫气体压力以减少热气体层的光学效应。
-
公开(公告)号:US08379687B2
公开(公告)日:2013-02-19
申请号:US11173955
申请日:2005-06-30
申请人: Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
发明人: Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
IPC分类号: H01S3/08
CPC分类号: H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译: 公开了一种窄气体放电激光系统及其操作方法,其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构,其定位折射元件中的至少一个,以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅,并且光束扩展器可以包括多个棱镜。 壳体可以包含分散中心波长选择元件和扩束器。 壳体定位元件可以包括位置锁定机构。
-
8.
公开(公告)号:US06778584B1
公开(公告)日:2004-08-17
申请号:US09716041
申请日:2000-11-17
申请人: William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
发明人: William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号: H01S310
CPC分类号: G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/0404 , H01S3/041 , H01S3/22 , H01S3/2207 , H01S3/225
摘要: A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the uses of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译: 用于基于光栅的线窄化装置的氦气吹扫,用于最大限度地减少线性窄激光器中的热失真,以高重复率产生高能激光束。 与现有技术的氮气吹扫相比,申请人已经显示出使用氦吹扫的性能方面的显着改进。在优选实施例中,氦气流被引导穿过光栅的表面。 在其它实施例中,减少吹扫气体压力以减少热气体层的光学效应。
-
公开(公告)号:US06735236B2
公开(公告)日:2004-05-11
申请号:US09451407
申请日:1999-11-30
申请人: Raymond F. Cybulski , Alexander I. Ershov , Eckehard D. Onkels , Palash P. Das , Danilo K. Richardson , Jesse D. Buck
发明人: Raymond F. Cybulski , Alexander I. Ershov , Eckehard D. Onkels , Palash P. Das , Danilo K. Richardson , Jesse D. Buck
IPC分类号: H01S308
CPC分类号: G03F7/70025 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/0401 , H01S3/08009 , H01S3/08059 , H01S3/0812 , H01S3/086 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating. In preferred embodiments a stream of gas is directed across the face of the grating. In other embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas and in other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译: 用于生产高能量激光束的线窄激光器的基于光栅的线窄化装置。 提供了用于最小化存在于光栅表面上的热气层的不利影响的技术。在优选实施例中,气流指向光栅的表面。 在其它实施例中,通过使用氦气作为净化气体来减少热气体层的影响,在其他实施例中,减少吹扫气体压力以减少热气体层的光学效应。
-
-
-
-
-
-
-
-