摘要:
The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.
摘要:
A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; tracking a multidimensional operating point in the multidimensional variable state space according to the variation of the selected variables in either or both of the oscillator or the amplifier to determine the position of the multidimensional operating point in the multidimensional state space; determining from the position of the multidimensional operating point in the multidimensional operating space a region from a plurality of defined regions in the multidimensional operating space in which the multidimensional operating point is located and identifying the region; based upon the identity of the identified region, and parameters of that region relative to the condition of an actuator in each of the oscillator and the amplifier, determining a necessary modification to the actuator for each of the oscillator and the amplifier to attempt to move the multidimensional operating point from the parameters indicated by the position of the multidimensional operating point being in the particular region to a preselected region in the coordinate system. The method and apparatus may also comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; changing the gas mixture in one or both of the oscillator and amplifier by injection of at least one constituent gas in the gas mixture at least part of which injection for the respective oscillator and amplifier is based upon a calculated estimate of consumption of the at least one constituent gas in the gas mixture in the respective oscillator and amplifier from a prior change in the gas mixture; allowing the oscillator and amplifier to operate for a selected period of time with the changed gas mixture; determining the position of an operating point in the multidimensional variable state space and based upon the location of the operating point in the multidimensional state space determining a respective boost factor to modify the calculated estimate of consumption for the current change of the gas mixture in the respective oscillator and amplifier. A third dimension may be added relating to a spectral characteristic of the output of the oscillator or the amplifier, which may be bandwidth of the output of the amplifier, and including modifying that output with a beam correction device.
摘要:
A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; tracking a multidimensional operating point in the multidimensional variable state space according to the variation of the selected variables in either or both of the oscillator or the amplifier to determine the position of the multidimensional operating point in the multidimensional state space; determining from the position of the multidimensional operating point in the multidimensional operating space a region from a plurality of defined regions in the multidimensional operating space in which the multidimensional operating point is located and identifying the region; based upon the identity of the identified region, and parameters of that region relative to the condition of an actuator in each of the oscillator and the amplifier, determining a necessary modification to the actuator for each of the oscillator and the amplifier to attempt to move the multidimensional operating point from the parameters indicated by the position of the multidimensional operating point being in the particular region to a preselected region in the coordinate system. The method and apparatus may also comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; changing the gas mixture in one or both of the oscillator and amplifier by injection of at least one constituent gas in the gas mixture at least part of which injection for the respective oscillator and amplifier is based upon a calculated estimate of consumption of the at least one constituent gas in the gas mixture in the respective oscillator and amplifier from a prior change in the gas mixture; allowing the oscillator and amplifier to operate for a selected period of time with the changed gas mixture; determining the position of an operating point in the multidimensional variable state space and based upon the location of the operating point in the multidimensional state space determining a respective boost factor to modify the calculated estimate of consumption for the current change of the gas mixture in the respective oscillator and amplifier. A third dimension may be added relating to a spectral characteristic of the output of the oscillator or the amplifier, which may be bandwidth of the output of the amplifier, and including modifying that output with a beam correction device.
摘要:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要:
An iterative process of depositing on a solid electrolyte a coating of unconnected particles composed of an ionically conductive material. A liquid solution is also applied. The liquid solution includes an inorganic component. The deposited liquid is heated to a temperature sufficient to evaporate or otherwise remove some or all of the volatile components of the liquid solution. Typically the temperature is below 1000° and often at about 850° C. The effect of heating the solution is to cause ion conducting material in the solution to adhere to the surface of the existing ion conducting particles and form connections between these particles. This is understood to create an ion conducting skeletal support structure. Within the intrestices of this skeletal support structure, the step of heating is also understood to result in the deposition of the inorganic component that will begin to form a electron conducting structure. The process of applying the liquid solution and heating may be repeated until a sufficiently thick layer of material is laid over the solid electrolyte to provide the composite electrode structure desired.
摘要:
The present invention concerns a method for doping a polysilicon layer with phosphorous in which phosphorous oxychloride is supplied to the silicon wafer near the beginning of the oven temperature ramping of the silicon wafer. By introducing the phosphorous oxychloride earlier than in prior art methods, the present invention can reduce the poly rho and poly rho sigma of the doped polysilicon layer. Alternatively, the root DT of the diffusion of the doped material in the doped silicon region on the silicon wafer can be reduced, which helps to maintain the junction depth of the doped silicon region.
摘要:
An iterative process of depositing on a solid electrolyte a coating of unconnected particles composed of an ionically conductive material. A liquid solution is also applied. The liquid solution includes an inorganic component. The deposited liquid is heated to a temperature sufficient to evaporate or otherwise remove some or all of the volatile components of the liquid solution. Typically the temperature is below 1000° and often at about 850° C. The effect of heating the solution is to cause ion conducting material in the solution to adhere to the surface of the existing ion conducting particles and form connections between these particles. This is understood to create an ion conducting skeletal support structure. Within the intrestices of this skeletal support structure, the step of heating is also understood to result in the deposition of the inorganic component that will begin to form a electron conducting structure. The process of applying the liquid solution and heating may be repeated until a sufficiently thick layer of material is laid over the solid electrolyte to provide the composite electrode structure desired.
摘要:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要:
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要:
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.