Infrared imaging device and method of manufacturing the same
    3.
    发明授权
    Infrared imaging device and method of manufacturing the same 有权
    红外成像装置及其制造方法

    公开(公告)号:US08304848B2

    公开(公告)日:2012-11-06

    申请号:US12883732

    申请日:2010-09-16

    IPC分类号: H01L31/00 H01L31/04

    摘要: Certain embodiments provide an infrared imaging device including: an SOI structure that is placed at a distance from a substrate, and includes: heat-sensitive diodes that detect infrared rays and convert the infrared rays into heat; and STI regions that separate the heat-sensitive diodes from one another; an interlayer insulating film that is stacked on the SOI structure; and supporting legs that are connected to the heat-sensitive diodes and vertical signal lines provided in outer peripheral regions of the heat-sensitive diodes. Each of the supporting legs includes: an interconnect unit that transmit signals to the vertical signal lines; and interlayer insulating layers that sandwich the interconnect unit, each bottom side of the interlayer insulating layers being located in a higher position than the SOI structure.

    摘要翻译: 某些实施例提供了一种红外成像装置,包括:SOI结构,其被放置在离基板一定距离处,并且包括:热敏二极管,其检测红外线并将红外线转换成热; 以及将热敏二极管彼此分离的STI区域; 堆叠在SOI结构上的层间绝缘膜; 以及连接到热敏二极管的支撑腿和设置在热敏二极管的外周区域中的垂直信号线。 每个支撑腿包括:将信号传输到垂直信号线的互连单元; 以及层叠绝缘层,夹着所述互连单元,所述层间绝缘层的每个底侧位于比所述SOI结构更高的位置。

    Image sensor and manufacturing method thereof
    4.
    发明授权
    Image sensor and manufacturing method thereof 有权
    图像传感器及其制造方法

    公开(公告)号:US08067740B2

    公开(公告)日:2011-11-29

    申请号:US12508846

    申请日:2009-07-24

    IPC分类号: H01L31/02

    摘要: An image sensor includes a semiconductor substrate; first pixels laid out above cavities provided within the semiconductor substrate, the first pixels converting thermal energy generated by incident light into an electric signal; supporting parts connected between the first pixels and the semiconductor substrate, the supporting parts supporting the first pixels above the cavities; and second pixels fixedly provided on the semiconductor substrate without via the cavities, wherein a plurality of the first pixels and a plurality of the second pixels are laid out two-dimensionally to form a pixel region, and each of the second pixels is adjacent to the first pixels.

    摘要翻译: 图像传感器包括半导体衬底; 第一像素被布置在设置在半导体衬底内的腔上方,第一像素将由入射光产生的热能转换为电信号; 连接在第一像素和半导体衬底之间的支撑部件,支撑部件支撑空腔上方的第一像素; 以及固定地设置在半导体衬底上的第二像素,而不经由空腔,其中多个第一像素和多个第二像素被二维布置以形成像素区域,并且每个第二像素与 第一个像素。

    Infrared imaging device and method for manufacturing same
    5.
    发明授权
    Infrared imaging device and method for manufacturing same 有权
    红外成像装置及其制造方法

    公开(公告)号:US08749010B2

    公开(公告)日:2014-06-10

    申请号:US13426097

    申请日:2012-03-21

    IPC分类号: H01L27/146 H01L31/058

    CPC分类号: H04N5/33 G01J5/024 G01J5/10

    摘要: According to one embodiment, an infrared imaging device includes a substrate, a detecting section, an interconnection, a contact plug and a support beam. The detecting section is provided above the substrate and includes an infrared absorbing section and a thermoelectric converting section. The interconnection is provided on an interconnection region of the substrate and is configured to read the electrical signal. The contact plug is extends from the interconnection toward a connecting layer provided in the interconnection region. The contact plug is electrically connected to the interconnection and the connecting layer. The support beam includes a support beam interconnection and supports the detecting section above the substrate. The support beam interconnection transmits the electrical signal from the thermoelectric converting section to the interconnection.

    摘要翻译: 根据一个实施例,红外成像装置包括基板,检测部分,互连件,接触插塞和支撑梁。 检测部设置在基板的上方,并且包括红外线吸收部和热电转换部。 互连设置在基板的互连区域上,并被配置为读取电信号。 接触插头从互连延伸到设置在互连区域中的连接层。 接触插头电连接到互连和连接层。 支撑梁包括支撑梁互连并且支撑基板上方的检测部分。 支撑束互连将电信号从热电转换部传送到互连。

    INFRARED DETECTION DEVICE
    7.
    发明申请
    INFRARED DETECTION DEVICE 有权
    红外检测装置

    公开(公告)号:US20120061791A1

    公开(公告)日:2012-03-15

    申请号:US13069610

    申请日:2011-03-23

    IPC分类号: H01L29/66

    摘要: According to one embodiment, an infrared detection device includes a detection element. The detection element includes a semiconductor substrate, a signal interconnect section, a detection cell and a support section. The semiconductor substrate is provided with a cavity on a surface of the semiconductor substrate. The signal interconnect section is provided in a region surrounding the cavity of the semiconductor substrate. The detection cell spaced from the semiconductor substrate above the cavity includes a thermoelectric conversion layer, and an absorption layer. The absorption layer is laminated with the thermoelectric conversion layer, and provided with a plurality of holes each having a shape whose upper portion is widened. The support section holds the detection cell above the cavity and connects the signal interconnect section and the detection cell.

    摘要翻译: 根据一个实施例,红外检测装置包括检测元件。 检测元件包括半导体衬底,信号互连部分,检测单元和支撑部分。 半导体衬底在半导体衬底的表面上设置有空腔。 信号互连部分设置在围绕半导体衬底的空腔的区域中。 与空腔上方的半导体衬底间隔开的检测单元包括热电转换层和吸收层。 吸收层与热电转换层层叠,并且设置有多个孔,每个孔具有上部加宽的形状。 支撑部分将检测单元保持在空腔上方并连接信号互连部分和检测单元。

    INFRARED IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME
    8.
    发明申请
    INFRARED IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    红外成像装置及其制造方法

    公开(公告)号:US20120007205A1

    公开(公告)日:2012-01-12

    申请号:US12883732

    申请日:2010-09-16

    IPC分类号: H01L31/101 H01L31/18

    摘要: Certain embodiments provide an infrared imaging device including: an SOI structure that is placed at a distance from a substrate, and includes: heat-sensitive diodes that detect infrared rays and convert the infrared rays into heat; and STI regions that separate the heat-sensitive diodes from one another; an interlayer insulating film that is stacked on the SOI structure; and supporting legs that are connected to the heat-sensitive diodes and vertical signal lines provided in outer peripheral regions of the heat-sensitive diodes. Each of the supporting legs includes: an interconnect unit that transmit signals to the vertical signal lines; and interlayer insulating layers that sandwich the interconnect unit, each bottom side of the interlayer insulating layers being located in a higher position than the SOI structure.

    摘要翻译: 某些实施例提供了一种红外成像装置,包括:SOI结构,其被放置在离基板一定距离处,并且包括:热敏二极管,其检测红外线并将红外线转换成热; 以及将热敏二极管彼此分离的STI区域; 堆叠在SOI结构上的层间绝缘膜; 以及连接到热敏二极管的支撑腿和设置在热敏二极管的外周区域中的垂直信号线。 每个支撑腿包括:将信号传输到垂直信号线的互连单元; 以及层叠绝缘层,夹着所述互连单元,所述层间绝缘层的每个底侧位于比所述SOI结构更高的位置。

    UNCOOLED INFRARED IMAGING DEVICE
    10.
    发明申请
    UNCOOLED INFRARED IMAGING DEVICE 审中-公开
    未经处理的红外成像装置

    公开(公告)号:US20130248714A1

    公开(公告)日:2013-09-26

    申请号:US13728009

    申请日:2012-12-27

    IPC分类号: H01L27/146 G01J5/20

    摘要: An uncooled infrared imaging device according to an embodiment includes: reference pixels formed on a semiconductor substrate and arranged in at least one row; and infrared detection pixels arranged in the remaining rows and detecting incident infrared rays. Each of the reference pixels includes a first cell located above a first concave portion. The first cell includes a first thermoelectric conversion unit having a first infrared absorption film; and a first thermoelectric conversion element. Each of the infrared detection pixels includes a second cell located above a second concave portion, and having a larger area than the first cell. The second cell includes: a second thermoelectric converting unit located above the second concave portion; and first and second supporting structure units supporting the second thermoelectric converting unit above the second concave portion. The second thermoelectric converting unit includes: a second infrared absorption film; and a second thermoelectric conversion element.

    摘要翻译: 根据实施例的非冷却红外成像装置包括:形成在半导体衬底上并布置在至少一行中的参考像素; 以及布置在其余行中的红外检测像素,并检测入射的红外线。 每个参考像素包括位于第一凹部上方的第一单元。 第一电池包括具有第一红外线吸收膜的第一热电转换单元; 和第一热电转换元件。 每个红外检测像素包括位于第二凹部上方的第二单元,并且具有比第一单元更大的面积。 第二单元包括:位于第二凹部上方的第二热电转换单元; 以及第一和第二支撑结构单元,其在第二凹部上方支撑第二热电转换单元。 第二热电转换单元包括:第二红外线吸收膜; 和第二热电转换元件。