公开(公告)号：US20100167920A1

公开(公告)日：2010-07-01

申请号：US12308304

申请日：2008-01-22

申请人： Kenichi Uemura ,  Kenji Hirano ,  Tsutomu Sugiura ,  Tadashi Sakon ,  Shogo Konya

发明人： Kenichi Uemura ,  Kenji Hirano ,  Tsutomu Sugiura ,  Tadashi Sakon ,  Shogo Konya

IPC分类号： B01J23/89 ,  B01J21/04

CPC分类号： B01J23/8906 ,  B01D53/945 ,  B01D2255/1023 ,  B01D2255/1025 ,  B01D2255/2042 ,  B01D2255/20738 ,  B01D2255/20746 ,  B01J23/002 ,  B01J23/8913 ,  B01J23/8946 ,  B01J35/0006 ,  B01J37/0215 ,  B01J37/0219 ,  B01J37/0248 ,  B01J2523/00 ,  Y02T10/22 ,  B01J2523/24 ,  B01J2523/822 ,  B01J2523/824 ,  B01J2523/842 ,  B01J2523/845 ,  B01J2523/25

摘要： Disclosed are: an exhaust gas purification catalyst which is an inexpensive three-way catalyst, which contains a reduced amount of an expensive noble metal, particularly does not use Pt, and contains no expensive rare earth element, and which has the same level of catalytic activity as that of a conventional one; and a catalytic honey-comb structure for exhaust gas purification. Specifically disclosed are: an exhaust gas purification catalyst comprising (Λ) an oxide M(Co1-yFey)O3-δ [wherein M represents a combination of an element substantially selected from Ba and Sr; y represents a number of 0 to 1; and δ represents a value that is so defined as to satisfy the charge neutrality condition] carrying one or two noble metals selected from Pd and Rh and (B) active alumina carrying one or two noble metal selected from Pd and Rh; and a catalytic honey-comb structure for exhaust gas purification, which is produced by wash-coating the exhaust gas purification catalyst onto a ceramic- or metal-made honey-comb.

摘要翻译： 公开了一种廉价的三元催化剂的废气净化催化剂，它含有少量昂贵的贵金属，特别是不使用Pt，并且不含有昂贵的稀土元素，并具有相同的催化水平 活动为常规活动; 和用于排气净化的催化蜂窝结构。 具体公开的是：排气净化催化剂，其包含（Λ）氧化物M（Co1-yFey）O3-δ[其中M表示基本上选自Ba和Sr的元素的组合; y表示0〜1的数; δ表示满足选自Pd和Rh的一种或两种贵金属和（B）含有选自Pd和Rh的一种或两种贵金属的活性氧化铝的电荷中性条件]的值; 以及用于排气净化的催化蜂巢结构，其通过将废气净化催化剂洗涤到陶瓷或金属制蜜蜂上而制备。

公开(公告)号：US09476128B2

公开(公告)日：2016-10-25

申请号：US12451231

申请日：2008-04-30

申请人： Kenichi Uemura ,  Tadashi Sakon ,  Eiichi Kuboyama ,  Daisuke Sawada

发明人： Kenichi Uemura ,  Tadashi Sakon ,  Eiichi Kuboyama ,  Daisuke Sawada

IPC分类号： C23G1/08 ,  B08B3/02 ,  B08B3/12 ,  C23G1/19 ,  C23G3/02 ,  B21B45/02 ,  B21B45/04

CPC分类号： C23G1/08 ,  B08B3/022 ,  B08B3/12 ,  B08B2203/0288 ,  B21B45/0275 ,  B21B45/04 ,  C23G1/19 ,  C23G3/02

摘要： The present invention provides a method of cleaning steel sheet, said method of cleaning steel sheet feeding a cleaning solution activated by ultrasonic waves of a frequency of 0.8 MHz to 3 MHz to a surface of steel sheet at an angle inclined by 1 to 80° with respect to a line perpendicular to the surface of the steel sheet in a direction opposite to the running direction, thereby enabling megasonic waves to be applied to cleaning of running steel sheet and improving the cleaning effect and cleaning speed, and a continuous cleaning system of steel sheet.

摘要翻译： 本发明提供一种清洁钢板的方法，所述清洁钢板的方法是将以0.8MHz至3MHz频率的超声波激活的清洗液以倾斜1°至80°的角度向钢板表面进行清洁， 相对于与行进方向相反的方向垂直于钢板表面的线，从而能够对超声波进行清扫，提高清洗效果和清洗速度，以及钢的连续清洗系统 片。

公开(公告)号：US20100095980A1

公开(公告)日：2010-04-22

申请号：US12451231

申请日：2008-04-30

申请人： Kenichi Uemura ,  Tadashi Sakon ,  Eiichi Kuboyama ,  Daisuke Sawada

发明人： Kenichi Uemura ,  Tadashi Sakon ,  Eiichi Kuboyama ,  Daisuke Sawada

IPC分类号： B08B3/00

CPC分类号： C23G1/08 ,  B08B3/022 ,  B08B3/12 ,  B08B2203/0288 ,  B21B45/0275 ,  B21B45/04 ,  C23G1/19 ,  C23G3/02

摘要： The present invention provides a method of cleaning steel sheet, said method of cleaning steel sheet feeding a cleaning solution activated by ultrasonic waves of a frequency of 0.8 MHz to 3 MHz to a surface of steel sheet at an angle inclined by 1 to 80° with respect to a line perpendicular to the surface of the steel sheet in a direction opposite to the running direction, thereby enabling megasonic waves to be applied to cleaning of running steel sheet and improving the cleaning effect and cleaning speed, and a continuous cleaning system of steel sheet.

摘要翻译： 本发明提供一种清洁钢板的方法，所述清洁钢板的方法是将以0.8MHz至3MHz频率的超声波激活的清洗液以倾斜1°至80°的角度向钢板表面进行清洁， 相对于与行进方向相反的方向垂直于钢板表面的线，从而能够对超声波进行清扫，提高清洗效果和清洗速度，以及钢的连续清洗系统 片。

公开(公告)号：US5560857A

公开(公告)日：1996-10-01

申请号：US320220

申请日：1994-10-11

申请人： Tadashi Sakon ,  Kenichi Uemura ,  Yoshihiro Mori ,  Kengo Shimanoe ,  Susumu Ohtsuka ,  Shuji Munehira

发明人： Tadashi Sakon ,  Kenichi Uemura ,  Yoshihiro Mori ,  Kengo Shimanoe ,  Susumu Ohtsuka ,  Shuji Munehira

IPC分类号： C11D7/08 ,  C11D7/18 ,  H01L21/304 ,  H01L21/306 ,  H01L21/308 ,  C09K13/00 ,  H01L21/00

CPC分类号： H01L21/02052 ,  Y10S438/906

摘要： A cleaning solution for achieving highly accurate cleaning of silicon semiconductors and silicon oxides. The solution which enables a great reduction in the metal contaminants and the number of fine particles adhered on the surfaces and retention of the hydrophilic property of the surfaces to prevent the surfaces from being unstable, comprising an aqueous acidic solution containing 0.005% by weight or more to less than 0.05% by weight hydrogen fluoride and 0.3% by weight or more to 20.0% by weight or less hydrogen peroxide and having a pH in the range from 1 or more to less than 5.

摘要翻译： 用于实现硅半导体和硅氧化物的高精度清洗的清洁溶液。 能够大大减少附着在表面上的金属污染物和细小颗粒的数量，保持表面的亲水性，防止表面不稳定的溶液，其包含含有0.005重量％以上的酸性水溶液 至少于0.05重量％的氟化氢和0.3重量％或更多至20.0重量％或更少的过氧化氢，并且pH在1以上至小于5的范围内。

公开(公告)号：US06190780B1

公开(公告)日：2001-02-20

申请号：US09093109

申请日：1998-06-08

申请人： Hiromasa Shoji ,  Masao Sakashita ,  Tadashi Sakon ,  Kenichiro Tadokoro ,  Yoshihiro Kaneda

发明人： Hiromasa Shoji ,  Masao Sakashita ,  Tadashi Sakon ,  Kenichiro Tadokoro ,  Yoshihiro Kaneda

IPC分类号： B32B1504

CPC分类号： C09D5/084 ,  C23C22/08 ,  C23C22/10 ,  C23C22/23 ,  C23C22/40 ,  C23C30/00

摘要： Surface treated metal materials with corrosion-resistant coating layers composed mainly of oxyacid compounds of rare earth elements (lanthanum, cerium, etc.) or Group IVA elements (zirconium, etc.), oxyacids or mixtures thereof. The corrosion resistant coating layers may also contain resins. Also provided are corrosion resistant coating layers containing rare earth element and Group IVA element compounds in resin matrixes. The corrosion resistant coating layers, particularly inorganic layers, may be covered with resin layers.

摘要翻译： 具有主要由稀土元素（镧，铈等）的含氧酸化合物或IVA族元素（锆等），含氧酸或其混合物组成的耐腐蚀涂层的表面处理金属材料。 耐腐蚀涂层也可以含有树脂。 还提供了在树脂基体中含有稀土元素和IVA族元素化合物的耐腐蚀涂层。 耐腐蚀涂层，特别是无机层可以用树脂层覆盖。

公开(公告)号：US07153559B2

公开(公告)日：2006-12-26

申请号：US10363969

申请日：2001-09-07

申请人： Wataru Ito ,  Tadashi Sakon ,  Hitoshi Dohnomae ,  Toru Nagai

发明人： Wataru Ito ,  Tadashi Sakon ,  Hitoshi Dohnomae ,  Toru Nagai

IPC分类号： B01D61/36 ,  B01D63/06 ,  B32B1/04 ,  B32B1/06 ,  B32B7/04 ,  B32B10/08

CPC分类号： H01M8/0282 ,  B01D53/22 ,  B01D63/02 ,  B01D67/0046 ,  B01D71/02 ,  B01D71/024 ,  B01D2313/38 ,  B01D2313/42 ,  B01D2323/08 ,  B01D2323/12 ,  B01D2325/04 ,  B01J8/009 ,  B01J12/007 ,  B01J19/0073 ,  B01J19/02 ,  B01J19/2475 ,  B01J2219/0218 ,  B01J2219/0236 ,  C01B13/0255 ,  C01B2210/0046 ,  C01G51/006 ,  C01G51/44 ,  C01G51/66 ,  C01G51/68 ,  C01P2002/34 ,  C01P2006/40 ,  H01M8/0271 ,  H01M2008/1293 ,  Y02P20/149 ,  Y10T428/24174 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/2462 ,  Y10T428/249997

摘要： A sealing technique is established in which a seal can be easily formed and which is excellent in reliability and a heat cycle property in a high temperature region of 800° C. or higher, so as to provide a composite body preferably used for a device for producing pure oxygen, oxygen-rich air, and the like, a membrane reactor represented by that for partial oxidation of a hydrocarbon gas, a solid oxide fuel cell, an oxygen purification device, a heat exchanger, or the like. The present invention makes it possible to increase a possibility of practical use in a wide area which has been delayed in development owing to a bottleneck of improvement in a sealing property. Particularly, its application to the device for producing pure oxygen, oxygen-rich air, or the like, the membrane reactor represented by that for partial oxidation of the hydrocarbon gas, the solid oxide fuel cell, the oxygen purification device, the heat exchanger, or the like can greatly contribute to acceleration of the development.

摘要翻译： 建立了一种密封技术，其中可以容易地形成密封件，并且在800℃或更高的高温区域中的可靠性和热循环性能优异，从而提供优选用于装置的装置的复合体 生产纯氧，富氧空气等，用于烃气体的部分氧化，固体氧化物燃料电池，氧气净化装置，热交换器等的膜反应器。 本发明可以提高由于密封性能提高的瓶颈而在开发延迟的广泛领域中的实际应用的可能性。 特别是其用于生产纯氧，富氧空气等的装置，用于烃气体部分氧化的膜反应器，固体氧化物燃料电池，氧气净化装置，热交换器， 等等可以极大地促进开发的加速。

公开(公告)号：US06737118B2

公开(公告)日：2004-05-18

申请号：US10121381

申请日：2002-04-12

申请人： Noriko Yamada ,  Toru Takahashi ,  Tadashi Sakon ,  Yoichi Matsuzaki ,  Atsushi Nogami ,  Shingo Katayama ,  Ikuko Shiina

发明人： Noriko Yamada ,  Toru Takahashi ,  Tadashi Sakon ,  Yoichi Matsuzaki ,  Atsushi Nogami ,  Shingo Katayama ,  Ikuko Shiina

IPC分类号： B05D302

CPC分类号： H01L21/02126 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02348 ,  H01L21/3122 ,  H01L21/3124

摘要： Silica-based low dielectric constant materials having three-dimensional network structures containing siloxane backbones which comprise SiO4 tetrahedron structural units, as well as their production and use. The materials can be applied as interlayer dielectrics for semiconductor elements and the like.

摘要翻译： 具有三维网状结构的二氧化硅低介电常数材料，其含有包含SiO 4四面体结构单元的硅氧烷主链，以及它们的生产和使用。 这些材料可以用作半导体元件等的层间电介质。

公开(公告)号：US06254980B1

公开(公告)日：2001-07-03

申请号：US09091316

申请日：1998-06-16

申请人： Kenichiro Tadokoro ,  Hiromasa Shoji ,  Tadashi Sakon ,  Ikuo Jitsuhara ,  Makoto Yamasaki

发明人： Kenichiro Tadokoro ,  Hiromasa Shoji ,  Tadashi Sakon ,  Ikuo Jitsuhara ,  Makoto Yamasaki

IPC分类号： B32B516

CPC分类号： C09D5/086 ,  C09D5/082 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/254 ,  Y10T428/31692 ,  Y10T428/31699

摘要： A metal plate having a rust preventive organic layer, said rust-preventive organic layer being a colloid or micelle of a slightly water soluble organic corrosion inhibitor as an organic layer mixed with and dispersed in a matrix resin, its production process and a treatment liquid in which it is processed.

摘要翻译： 具有防锈有机层的金属板，所述防锈有机层是作为与基质树脂混合并分散在基质树脂中的有机层的微水溶性有机腐蚀抑制剂的胶体或胶束，其制备方法和处理液 它被处理。

公开(公告)号：US5373804A

公开(公告)日：1994-12-20

申请号：US882242

申请日：1992-05-08

申请人： Masaharu Tachimori ,  Tadashi Sakon ,  Takayuki Kaneko ,  Seizou Meguro

发明人： Masaharu Tachimori ,  Tadashi Sakon ,  Takayuki Kaneko ,  Seizou Meguro

IPC分类号： H01L21/208 ,  C30B15/00 ,  C30B15/20 ,  C30B29/06 ,  C30B15/02

CPC分类号： C30B29/06 ,  C30B15/00

摘要： A single silicon crystal wafer produced by the Czochvalski method and measuring not less than 100 mm in diameter, a single silicon crystal having low OSF density induced by oxidation, wherein regarding the local resistivity measured by the spread resistance method on the surface of said wafer subjected in advance to a heat treatment for extinction of oxygen donor, the proportion of the number of points of measurement registering errors exceeding .+-.1.0% of the mean value is not more than 35% of the total number of points of measurement, and regarding the distribution of oxygen concentration in solid solution in the wafer surface, the difference between the maximum and the minimum is not more than 2.0% of the maximum, and a method for production thereof.

摘要翻译： 通过Czochvalski法生产的单晶硅晶片，直径不小于100mm，由氧化引起的OSF密度低的单一硅晶体，其中通过扩展电阻法在所述晶片的表面上测得的局部电阻率 提前进行氧供体灭绝的热处理时，超过平均值的+/- 1.0％的测量点数误差的比例不超过总测量点的35％，并且关于 在晶片表面的固溶体中的氧浓度的分布，最大值与最小值之间的差别不大于最大值的2.0％及其制造方法。

公开(公告)号：US07151067B2

公开(公告)日：2006-12-19

申请号：US10492635

申请日：2002-10-11

申请人： Tadashi Sakon ,  Wataru Ito ,  Hitoshi Dohnomae ,  Toru Nagai ,  Hideki Kurimura ,  Shouichi Kaganoi ,  Youhei Suzuki ,  Takashi Ito

发明人： Tadashi Sakon ,  Wataru Ito ,  Hitoshi Dohnomae ,  Toru Nagai ,  Hideki Kurimura ,  Shouichi Kaganoi ,  Youhei Suzuki ,  Takashi Ito

IPC分类号： C04B35/01 ,  C01B3/02 ,  B01J23/02 ,  B01J12/00

CPC分类号： C04B35/01 ,  B01D71/024 ,  B01J12/007 ,  B01J19/248 ,  B01J23/002 ,  B01J23/78 ,  B01J35/065 ,  B01J37/0244 ,  B32B18/00 ,  B32B2315/02 ,  C01B3/386 ,  C01B3/40 ,  C01B13/0251 ,  C01B13/0255 ,  C01B2203/0261 ,  C01B2203/1005 ,  C01B2203/1052 ,  C01B2203/1064 ,  C01B2203/1082 ,  C01B2210/0046 ,  C04B35/053 ,  C04B35/2633 ,  C04B35/2641 ,  C04B35/2675 ,  C04B35/62615 ,  C04B2235/3203 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3217 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3232 ,  C04B2235/3241 ,  C04B2235/3244 ,  C04B2235/3251 ,  C04B2235/3272 ,  C04B2235/3275 ,  C04B2235/3277 ,  C04B2235/3279 ,  C04B2235/3281 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/405 ,  C04B2235/408 ,  C04B2235/768 ,  C04B2235/94 ,  C04B2237/34 ,  C04B2237/343 ,  C04B2237/704 ,  H01M8/0606 ,  Y02P20/52 ,  Y10S502/525

摘要： A porous catalyst layer containing mixed conducting oxide having substantially a perovskite structure and containing a first element selected from Co and Fe, and a second element selected from In, Sn and Y arranged in the B site in the perovskite structure is contiguous to a second surface (1a) of a selective oxygen-permeable dense continuous layer (1) containing mixed conducting oxide. A porous intermediate catalyst layer (3) containing mixed conducting oxide and at least one of Co, Fe, Mn and Pd is contiguous to a first layer (1b) of the dense continuous layer (1). A porous reactive catalyst layer (4) provided with a metal catalyst selected from at least one of Ni, Co, Ru, Rh, Pt, Pd, Ir and Re and a support is continguous to the porous intermediate catalyst layer (3) in a manner to sandwich between the dense continuous layer (1) and the porous reactive catalyst layer (4).

摘要翻译： 包含基本上钙钛矿结构并含有选自Co和Fe的第一元素的混合导电氧化物的多孔催化剂层和布置在钙钛矿结构中的B位点中的选自In，Sn和Y的第二元素邻接于第二表面 （1a）包含混合导电氧化物的选择性透氧致密连续层（1）。 含有混合的导电氧化物和Co，Fe，Mn和Pd中的至少一种的多孔中间催化剂层（3）与致密连续层（1）的第一层（1b）相邻。 设置有选自Ni，Co，Ru，Rh，Pt，Pd，Ir和Re中的至少一种的金属催化剂和载体的多孔反应催化剂层（4）与多孔中间体催化剂层（3） 在致密连续层（1）和多孔反应催化剂层（4）之间夹层的方式。