Transfer of flux onto electrodes and production of bumps on electrodes
    1.
    发明授权
    Transfer of flux onto electrodes and production of bumps on electrodes 失效
    将焊剂转移到电极上并在电极上产生凸块

    公开(公告)号:US5899376A

    公开(公告)日:1999-05-04

    申请号:US677392

    申请日:1996-07-09

    IPC分类号: B23K1/20 H05K3/34

    摘要: A process of transferring a flux on electrodes of a semiconductor chip, a film carrier, or a substrate, the process comprising: using a transfer apparatus including a transfer baseplate having protrusions corresponding to said electrodes; dipping the tips of the protrusions of the transfer baseplate in a flux bath to cause the flux to stick to the tips; then aligning the protrusions of the transfer baseplate with the electrodes; and transferring the stuck flux onto the electrodes from the tips.

    摘要翻译: 一种在半导体芯片,薄膜载体或基板的电极上传送磁通的方法,该方法包括:使用包括具有对应于所述电极的突起的转印基板的转印装置; 将转移基板的突起的尖端浸入助熔剂槽中以使焊剂粘附到尖端; 然后将转印基板的突起与电极对准; 并将粘附的助焊剂从尖端转移到电极上。

    Method of partially plating substrate for electronic devices
    8.
    发明授权
    Method of partially plating substrate for electronic devices 有权
    部分电镀电镀基板的方法

    公开(公告)号:US06884708B2

    公开(公告)日:2005-04-26

    申请号:US09254118

    申请日:1997-08-27

    摘要: The object of the present invention is to provide a free and precise control of the plating amount while easily determining a selected portion to be plated.Small balls 24 are arranged at, and adhered or bonded to, via holes 22 of a TAB tape 21 and the small balls 24 are then melted so that a copper wiring 23 exposed at the via holes 22 of the TAB tape 21 can be selectively plated with a different metal to enable selected portions of a substrate for electronic devices to be partially plated easily and precisely.

    摘要翻译: 本发明的目的是提供对电镀量的自由精确控制,同时容易地确定所选择的被电镀部分。 小球24被布置在TAB带21的通孔22上并被粘接或粘合,然后使小球24熔化,使得露出在TAB带21的通孔22上的铜布线23能够被选择性地镀覆 具有不同的金属以使得用于电子器件的基板的选定部分能够容易且精确地部分地镀覆。