Abstract:
A method of fabricating a direct contact through hole type wafer. Devices and contact plugs are formed in one side of a silicon-on-insulator substrate, and multilevel interconnects are formed over the side of the silicon-on-insulator substrate. The multilevel interconnects are coupled with the devices and the contact plugs. Bonding pads, which couples with the multilevel interconnects, are formed over the multilevel interconnects. An opening is formed on the other side of the silicon-on-insulator substrate to expose the contact plugs. An insulation layer, a barrier layer and a metal layer are formed in sequence in the opening. Bumps are formed on the bonding pads and the metal layer, respectively.
Abstract:
An architecture for wafer scale memories and a placement method replaces defective chips with spare chips in a memory module so as to provide minimum critical signal delay. The SDRAM memory chips are classified into normal chips and spare chips, where the normal chips are formed into groups such as rows or columns, and the spare chips are used to replace defective normal chips. A delay model for metal lines and vias is used to compute the signal delay for placement and routing. The placement problem is modeled as a bipartite graph and solved using a branch and bound algorithm to obtain a chip replacement configuration having the shortest critical signal delay. Also described is a hierarchical routing approach, which classifies the signals into different types and levels of signals. During fabrication, the replacement of defective chips with spare chips is accomplished by using two extra conductive layers and patterning the extra layers using a mask that is independent of the defect distribution of a particular wafer.
Abstract:
A direct contact through hole type wafer structure. Both sides of a wafer have devices and contacts. The contacts are coupled with the devices. Bumps are formed on the contacts, respectively.
Abstract:
A direct contact through hole type wafer structure. Both sides of a wafer have devices and contacts. The contacts are coupled with the devices. Bumps are formed on the contacts, respectively.
Abstract:
A cascade-type chip module. A laminate substrate having contacts is provided. Chips suitable for the cascade-type module are provided. Each chip includes a redistribution layer having a first region and a second region and bump contacts over the redistribution layer. A layout of the bump contacts coupling with the first region of the redistribution layer is an image rotationally symmetrical to the layout of those coupling with the second region of the redistribution layer, and each of the bump contacts coupling with the first region is coupled with a corresponding bump contact coupling with the second region through the redistribution layer. The chips are divided into a first group and a second group; the first group is stacked on the second group such that the first region of each chip of the first group is aligned with the second region of each chip of the second group and the second region of each chip of the first group is aligned with the first region of each chip of the second group. The chips are coupled to each other by bumps. The chips are attached to the laminate substrate and the first group and the second group are respectively coupled with the contacts by two film carriers.
Abstract:
A method of fabricating a direct contact through hole type wafer. Devices and contact plugs are formed in one side of a silicon-on-insulator substrate, and multilevel interconnects are formed over the side of the silicon-on-insulator substrate. The multilevel interconnects are coupled with the devices and the contact plugs. Bonding pads, which couples with the multilevel interconnects, are formed over the multilevel interconnects. An opening is formed on the other side of the silicon-on-insulator substrate to expose the contact plugs. An insulation layer, a barrier layer and a metal layer are formed in sequence in the opening. Bumps are formed on the bonding pads and the metal layer, respectively.
Abstract:
A preburn-in DRAM module circuit board is provided, which allows a plurality of DRAM modules to be constructed directly thereon, and which can be directly connected to a large burn-in oven so as to perform a burn-in process concurrently on the DRAM modules mounted thereon to check for any defected IC chips that are to be reworked. After the burn-in process, each of the DRAM modules can be cut apart from the circuit board to serve as a single memory module. The preburn-in DRAM module circuit board allows the manufacturing process for the DRAM modules to be reduced in schedule and manufacturing cost. Material cost can also be saved since the burn-in circuit and the module circuit are arranged on the same circuit board.
Abstract:
A wafer level IC structure and a method of manufacturing this wafer level IC structure are proposed, which can help increase the yield of the IC manufacture. The wafer level IC structure is constructed on a semiconductor wafer which is defined into a plurality of discrete IC blocks on the wafer, each IC block being used to form a plurality of IC components such as memory cells. A multi-layer interconnect structure is formed to electrically interconnect these IC components in each of the IC blocks. A first testing and repair process is then perform to disconnect any inoperative IC components from active use. This completes the fabrication stage of the manufacture process. In the subsequent packaging stage, a redistribution line structure is formed to interconnect the discrete IC blocks into an integral functional unit. A second testing and repair process is then perform to disconnect any inoperative IC blocks from active use. The overall IC manufacture would have an increased yield as compared to the prior art.
Abstract:
A repairable memory module, such as a DRAM (dynamic random access memory) or a flash memory module, and a method of repairing memory modules are proposed. Based on the repairable memory module, any failed memory ICs in the module that are found before shipment or after use can be repaired through the use of a backup memory IC. Fundamentally, when any failed memory ICs are found in the module, a set of zero-ohm resistors are used to short-circuit a number of selected pairs of jumping pads to thereby redirect the connections to the I/O (input/output) and column-address strobe pins on the failed memory IC instead to the same nominal pins on the backup memory IC. This allows the function of the failed ICs to be instead performed by the backup memory chip.
Abstract:
This invention relates to a method and a means for packaging integrated circuits, especially relates to a heat sink in the operating integrated circuit packages. The heat sink is bonded on the lead frame by a tap and take advantage of the length between the heat sink and the first mold packaged materials at the first axis to be about equal to the length between the chip and the second mold packaged materials at the first axis to prevent producing voids form unbalanceable thermal mold flow. The heat sink can also dissipating heat from the lead frame to others spaces in the integrated circuit packages. This method and means can prevent delaminating and cracking occurring in the chip and increasing the qualities in integrated circuits.