Image Collection
    2.
    发明申请
    Image Collection 有权
    图像集合

    公开(公告)号:US20110043797A1

    公开(公告)日:2011-02-24

    申请号:US12545042

    申请日:2009-08-20

    IPC分类号: G01N21/88

    CPC分类号: G01N21/956

    摘要: An inspection system for creating images of a substrate. A light source directs an incident light onto the substrate, and a light source timing control controls a pulse timing of the incident light. A stage holds the substrate and moves the substrate under the incident light, so that the substrate reflects the incident light as a reflected light. A stage position sensor reports a position of the stage, and a stage position control controls the position of the stage. A time domain integration sensor receives the reflected light, and a time domain integration sensor timing control controls a line shift of the time domain integration sensor. A control system is in communication with the light source timing control, the stage position control, and the time delay integration sensor timing control, and sets the pulse timing of the incident light, the position of the stage, and the line shift of the time delay integration sensor, such that a single line of the time domain integration sensor integrates reflected light from more than one pulse of the incident light from the light source.

    摘要翻译: 一种用于创建基板的图像的检查系统。 光源将入射光引导到基板上,并且光源定时控制器控制入射光的脉冲定时。 台阶保持基板并在入射光下移动基板,使得基板作为反射光反射入射光。 舞台位置传感器报告舞台的位置,舞台位置控制控制舞台的位置。 时域积分传感器接收反射光,时域积分传感器定时控制控制时域积分传感器的线偏移。 控制系统与光源定时控制,平台位置控制和时间延迟积分传感器定时控制通信,并且设置入射光的脉冲定时,平台的位置和时间的线偏移 延迟积分传感器,使得单行的时域积分传感器集成来自光源的入射光的多于一个脉冲的反射光。

    Cell motility and chemotaxis test device and methods of using same
    3.
    发明授权
    Cell motility and chemotaxis test device and methods of using same 失效
    细胞运动性和趋化性试验装置及其使用方法

    公开(公告)号:US06921660B2

    公开(公告)日:2005-07-26

    申请号:US10097351

    申请日:2002-03-15

    IPC分类号: B01L3/00 C12M1/34

    摘要: The present invention discloses a device for monitoring chemotaxis or chemoinvasion including a housing comprising: a support member and a top member, the top member mounted to the support member by being placed in substantially fluid-tight conformal contact with the support member. The support member and the top member are configured such that they together define a discrete chamber adapted to allow a monitoring of chemotaxis or chemoinvasion therein. The discrete chamber includes a first well region including at least one first well, the at least one first well configured to received a test agent therein; a second well region including at least one second well, the at least one second well configured to receive a sample comprising cells therein; and a channel region including at least one channel connecting the first well region and the second well region with one another. The second well region is preferably horizontally offset with respect to the first well region in a test orientation of the device.

    摘要翻译: 本发明公开了一种用于监测趋化性或化学侵蚀的装置,包括:壳体,包括:支撑构件和顶部构件,顶部构件通过与支撑构件基本上不流体密封地共形接触而安装到支撑构件。 支撑构件和顶部构件被构造成使得它们一起限定适于允许监测其中的趋化性或化学侵蚀的离散室。 离散室包括包括至少一个第一井的第一井区,所述至少一个第一井构造成在其中接收测试剂; 包括至少一个第二阱的第二阱区,所述至少一个第二阱被配置为在其中接收包含电池的样品; 以及沟道区域,其包括将第一阱区域和第二阱区域彼此连接的至少一个沟道。 在设备的测试方向上,第二阱区域优选地相对于第一阱区域水平偏移。

    Optical defect amplification for improved sensitivity on patterned layers
    7.
    发明授权
    Optical defect amplification for improved sensitivity on patterned layers 有权
    光学缺陷放大,提高图案层的灵敏度

    公开(公告)号:US08705027B2

    公开(公告)日:2014-04-22

    申请号:US13384330

    申请日:2010-07-15

    IPC分类号: G01N21/00

    摘要: A method for wafer defect inspection may include, but is not limited to: providing an inspection target; applying at least one defect inspection enhancement to the inspection target; illuminating the inspection target including the at least one inspection enhancement to generate one or more inspection signals associated with one or more features of the inspection target; detecting the inspection signals; and generating one or more inspection parameters from the inspection signals. An inspection target may include, but is not limited to: at least one inspection layer; and at least one inspection enhancement layer.

    摘要翻译: 晶片缺陷检查的方法可以包括但不限于:提供检查目标; 对检查对象应用至少一个缺陷检查增强; 照亮包括所述至少一个检查增强的所述检查目标以产生与所述检查对象的一个​​或多个特征相关联的一个或多个检查信号; 检测检测信号; 以及从所述检查信号生成一个或多个检查参数。 检查对象可以包括但不限于:至少一个检查层; 和至少一个检查增强层。

    OPTICAL DEFECT AMPLIFICATION FOR IMPROVED SENSITIVITY ON PATTERNED LAYERS
    8.
    发明申请
    OPTICAL DEFECT AMPLIFICATION FOR IMPROVED SENSITIVITY ON PATTERNED LAYERS 有权
    光学缺陷放大对改进的层的敏感性

    公开(公告)号:US20120113416A1

    公开(公告)日:2012-05-10

    申请号:US13384330

    申请日:2010-07-15

    IPC分类号: G01N21/95 B32B9/00 B32B3/30

    摘要: A method for wafer defect inspection may include, but is not limited to: providing an inspection target; applying at least one defect inspection enhancement to the inspection target; illuminating the inspection target including the at least one inspection enhancement to generate one or more inspection signals associated with one or more features of the inspection target; detecting the inspection signals; and generating one or more inspection parameters from the inspection signals. An inspection target may include, but is not limited to: at least one inspection layer; and at least one inspection enhancement layer.

    摘要翻译: 晶片缺陷检查的方法可以包括但不限于:提供检查目标; 对检查对象应用至少一个缺陷检查增强; 照亮包括所述至少一个检查增强的所述检查目标以产生与所述检查对象的一个​​或多个特征相关联的一个或多个检查信号; 检测检测信号; 以及从所述检查信号生成一个或多个检查参数。 检查对象可以包括但不限于:至少一个检查层; 和至少一个检查增强层。