Optical energy conversion
    1.
    发明授权
    Optical energy conversion 失效
    光能转换

    公开(公告)号:US4202704A

    公开(公告)日:1980-05-13

    申请号:US968887

    申请日:1978-12-13

    IPC分类号: H01L31/04 H01L31/055

    CPC分类号: H01L31/055 Y02E10/52

    摘要: Enhanced efficiency can be achieved in the construction of semiconductor optical energy conversion devices such as solar cells by providing a translucent frequency shifting supporting member with appropriate doping such as Al.sub.2 O.sub.3 :Cr.sup.+3 (Ruby) that is capable of shifting the wavelength of incident light energy in the direction of greatest efficiency of the semiconductor device. The efficiency can be further enhanced by providing a crystal perfection accommodation region between the active region of the device and the light frequency shifting substrate.

    摘要翻译: 通过提供具有适当掺杂的半透明变频支撑构件,例如能够移动入射光能量的波长的Al 2 O 3 :Cr + 3(红宝石),可以在诸如太阳能电池的半导体光能转换装置的构造中实现增强的效率 在半导体器件效率最高的方向。 通过在器件的有源区域和光变换衬底之间提供晶体完整的容纳区域可以进一步提高效率。

    MESFET semiconductor device fabrication with same metal contacting
source, drain and gate regions
    3.
    发明授权
    MESFET semiconductor device fabrication with same metal contacting source, drain and gate regions 失效
    具有相同金属接触源,漏极和栅极区域的MESFET半导体器件制造

    公开(公告)号:US4757358A

    公开(公告)日:1988-07-12

    申请号:US752216

    申请日:1985-07-03

    摘要: An FET transistor is provided having a two element semiconductor channel region between metal contacts and epitaxial therewith a graded three element seminconductor, in which two of the three elements are in common with the semiconductor of the channel, positioned between a Schottky barrier gate of the same contact metal and the channel. An FET with a GaAs channel between tin source and drain contacts, a graded 500 to 1000 Angstrom thick GaAlAs region epitaxial with the channel and a Schottky barrier tin metal gate over the GaAlAs region.

    摘要翻译: 提供一种FET晶体管,其在金属触点之间具有两个元件半导体沟道区域,并与其外延,分级三元素半导体,其中三个元件中的两个与通道的半导体共同,位于相同的肖特基势垒栅极之间 接触金属和通道。 在锡源极和漏极触点之间具有GaAs沟道的FET,在沟道上外延延伸的500至1000埃厚的GaAlAs区域以及GaAlAs区域上的肖特基势垒锡金属栅极。

    Control of surface recombination loss in solar cells
    4.
    发明授权
    Control of surface recombination loss in solar cells 失效
    太阳能电池表面复合损失的控制

    公开(公告)号:US4276137A

    公开(公告)日:1981-06-30

    申请号:US59855

    申请日:1979-07-23

    摘要: Surface recombination in solar cells that is produced by band bending at the surface of the semiconductor which is in turn caused by defect states which pin the Fermi level at the surface, may be improved by applying a surface layer which may be a plasma oxide that has been hydrogen annealed and this layer may also be useful as an antireflecting coating.

    摘要翻译: 通过在半导体的表面处的带状弯曲而产生的太阳能电池中的表面复合,其又由引导表面的费米能级的缺陷状态引起,可以通过施加表面层来改善,该表面层可以是具有 经过氢退火,该层也可用作抗反射涂层。

    Semiconductor device fabrication
    5.
    发明授权
    Semiconductor device fabrication 失效
    半导体器件制造

    公开(公告)号:US4379005A

    公开(公告)日:1983-04-05

    申请号:US348526

    申请日:1982-02-12

    摘要: Semiconductor devices can be fabricated using as an intermediate manufacturing structure a substrate of one semiconductor with a thin epitaxial surface layer of a different semiconductor with properties such that the semiconductors each have different solubilities with respect to a metal. When a vertical differentiation is used to expose the different materials and the metal is deposited on both and heated, the metal will form a Schottky barrier in one material and an ohmic contact in the other. Where the substrate is gallium arsenide and the epitaxial layer is gallium aluminum arsenide and the metal is tin, a self-aligned gallium arsenide MESFET is formed wherein the tin forms ohmic contacts with the gallium arsenide and a Schottky barrier contact with the gallium aluminum arsenide.

    摘要翻译: 可以使用具有不同半导体的薄外延表面层的半导体衬底作为中间制造结构来制造半导体器件,其性能使得半导体对于金属具有不同的溶解度。 当使用垂直分化来暴露不同的材料并且金属沉积在两者上并被加热时,金属将在一种材料中形成肖特基势垒并在另一种材料中形成欧姆接触。 在衬底是砷化镓并且外延层是砷化镓铝并且金属是锡的情况下,形成自对准的砷化镓MESFET,其中锡与砷化镓形成欧姆接触,并与砷化镓砷化物进行肖特基势垒接触。

    Semiconductor structure
    6.
    发明授权
    Semiconductor structure 失效
    半导体结构

    公开(公告)号:US4178195A

    公开(公告)日:1979-12-11

    申请号:US918114

    申请日:1978-06-22

    IPC分类号: H01L21/208 H01L31/0693

    摘要: A technique for fabricating a semiconductor heterostructure by growth of a ternary semiconductor on a binary semiconductor substrate from a melt of the ternary semiconductor containing less than saturation of at least one common ingredient of both the binary and ternary semiconductors wherein in a single temperature step the binary semiconductor substrate is etched, a p-n junction with specific device characteristics is produced in the binary semiconductor substrate by diffusion of a dopant from the melt and a region of the ternary semiconductor of precise conductivity type and thickness is grown by virtue of a change in the melt characteristics when the etched binary semiconductor enters the melt.

    摘要翻译: 一种用于通过在二元半导体衬底上由三元半导体的熔体生长含有少于二元和三元半导体的至少一种共同成分的饱和度的三元半导体制造半导体异质结构的技术,其中在单一温度步骤中,二元 半导体衬底被蚀刻,在二元半导体衬底中通过从熔体中扩散掺杂剂而产生具有特定器件特性的pn结,并且由于熔体的变化而使精确导电类型和厚度的三元半导体区域生长 当蚀刻的二元半导体进入熔体时的特性。

    Compositionally-graded band gap heterojunction solar cell
    9.
    发明授权
    Compositionally-graded band gap heterojunction solar cell 有权
    组分梯度带隙异质结太阳能电池

    公开(公告)号:US08653360B2

    公开(公告)日:2014-02-18

    申请号:US12849966

    申请日:2010-08-04

    IPC分类号: H01L31/00 H01L21/00

    摘要: A photovoltaic device includes a composition modulated semiconductor structure including a p-doped first semiconductor material layer, a first intrinsic compositionally-graded semiconductor material layer, an intrinsic semiconductor material layer, a second intrinsic compositionally-graded semiconductor layer, and an n-doped first semiconductor material layer. The first and second intrinsic compositionally-graded semiconductor material layers include an alloy of a first semiconductor material having a greater band gap width and a second semiconductor material having a smaller band gap with, and the concentration of the second semiconductor material increases toward the intrinsic semiconductor material layer in the first and second compositionally-graded semiconductor material layers. The photovoltaic device provides an open circuit voltage comparable to that of the first semiconductor material, and a short circuit current comparable to that of the second semiconductor material, thereby increasing the efficiency of the photovoltaic device.

    摘要翻译: 光伏器件包括组成调制的半导体结构,其包括p掺杂的第一半导体材料层,第一本征成分梯度半导体材料层,本征半导体材料层,第二本征组分梯度半导体层和n掺杂的第一半导体层 半导体材料层。 第一和第二本征成分梯度半导体材料层包括具有较大带隙宽度的第一半导体材料和具有较小带隙的第二半导体材料的合金,并且第二半导体材料的浓度朝向本征半导体 第一和第二组成梯度半导体材料层中的材料层。 光电器件提供与第一半导体材料相当的开路电压,以及与第二半导体材料相当的短路电流,从而提高光伏器件的效率。

    BEOL compatible FET structrure
    10.
    发明授权
    BEOL compatible FET structrure 有权
    BEOL兼容FET结构

    公开(公告)号:US08569803B2

    公开(公告)日:2013-10-29

    申请号:US13572742

    申请日:2012-08-13

    IPC分类号: H01L29/76

    摘要: This invention provides structures and a fabrication process for incorporating thin film transistors in back end of the line (BEOL) interconnect structures. The structures and fabrication processes described are compatible with processing requirements for the BEOL interconnect structures. The structures and fabrication processes utilize existing processing steps and materials already incorporated in interconnect wiring levels in order to reduce added cost associated with incorporating thin film transistors in the these levels. The structures enable vertical (3D) integration of multiple levels with improved manufacturability and reliability as compared to prior art methods of 3D integration.

    摘要翻译: 本发明提供了用于在线路后端(BEOL)互连结构中并入薄膜晶体管的结构和制造工艺。 所描述的结构和制造工艺与BEOL互连结构的处理要求相兼容。 结构和制造工艺利用已经并入到互连布线层中的现有处理步骤和材料,以便降低与在这些层级中引入薄膜晶体管相关联的附加成本。 与现有技术的3D集成方法相比,该结构能够实现多层次的垂直(3D)集成,具有改进的可制造性和可靠性。