METHOD OF FORMING REDISTRIBUTION PAD AND METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE

    公开(公告)号:US20250167153A1

    公开(公告)日:2025-05-22

    申请号:US18932984

    申请日:2024-10-31

    Abstract: A method of forming a redistribution pad, the method including forming a hole exposing a redistribution pattern in a redistribution insulating layer and forming a photoresist composition on a surface of the redistribution insulating layer and filling the hole. The photoresist composition including at least one first photoinitiator and at least one first crosslinking agent that cause a crosslinking reaction by a first light and at least one second photoinitiator and at least one second crosslinking agent that cause a crosslinking reaction by a second light having a different wavelength from the first light. The method further includes irradiating the first light to the photoresist composition, forming a photoresist pattern having a pattern hole using the photoresist composition to which the first light is irradiated, irradiating the second light to the photoresist pattern, and forming the redistribution pad using the photoresist pattern to which the second light is irradiated.

    SEMICONDUCTOR PACKAGE HAVING REDISTRIBUTION STRUCTURE

    公开(公告)号:US20230154841A1

    公开(公告)日:2023-05-18

    申请号:US17823634

    申请日:2022-08-31

    Abstract: A semiconductor package includes: a redistribution structure including a plurality of redistribution insulation layers, which are stacked, a plurality of redistribution line patterns on an upper surface and a lower surface of the plurality of redistribution insulation layers, and constituting a plurality of distribution layers at different vertical levels from each other, and a plurality of redistribution vias that penetrate at least one redistribution insulation layer of the plurality of redistribution insulation layers and are connected to some of the plurality of redistribution line patterns; and at least one semiconductor chip on the redistribution structure and electrically connected to the plurality of redistribution line patterns and the plurality of redistribution vias.

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