Heating apparatus for bump bonding, bump bonding method and bump forming apparatus, and semiconductor wafer
    8.
    发明授权
    Heating apparatus for bump bonding, bump bonding method and bump forming apparatus, and semiconductor wafer 失效
    用于凸块焊接的加热装置,凸块接合方法和凸块形成装置以及半导体晶片

    公开(公告)号:US06329640B1

    公开(公告)日:2001-12-11

    申请号:US09690746

    申请日:2000-10-18

    IPC分类号: F27B514

    CPC分类号: H01L21/67103 H01L21/68

    摘要: An object of the present invention is to provide a bump-bonding heating apparatus, a bump bonding method and a bump forming apparatus which do not involve large-sized apparatus configuration and which are easy to handle, and a semiconductor wafer in which bumps are formed by using the bump bonding method. The bump-bonding heating apparatus has a wafer turning member, a turning unit and a wafer heating unit. The turning member is turned by the turning unit without turning the wafer heating unit, whereby a semiconductor wafer mounted on the turning member is turned. Like this, since the wafer heating unit is not turned, the apparatus configuration can be made compact. Since the turning member is turned directly by the turning unit, the turning angle of the semiconductor wafer can be implemented with higher precision as compared with the conventional gas floating type turning method.

    摘要翻译: 本发明的目的是提供一种不涉及大型装置结构并易于处理的凸块焊接加热装置,凸块接合方法和凸块形成装置以及形成凸块的半导体晶片 通过使用凸块接合方法。 凸点焊接加热装置具有晶片转动部件,转动部件和晶片加热部件。 转动构件在不转动晶片加热单元的情况下由转动单元转动,从而转动安装在转动构件上的半导体晶片。 像这样,由于晶片加热单元没有转动,所以可以使装置结构紧凑。 由于转动构件直接由转动单元转动,与常规气浮式转动方法相比,可以以更高的精度实现半导体晶片的转动角度。