公开(公告)号：US20180274101A1

公开(公告)日：2018-09-27

申请号：US15985306

申请日：2018-05-21

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Mitsuru KANO

IPC: C23C16/54 ,  C23C16/455

CPC classification number: C23C16/54 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/545 ,  H01L21/02145 ,  H01L21/02178 ,  H01L21/02186 ,  H01L21/02194 ,  H01L21/02274 ,  H01L21/0228 ,  H01L51/0097 ,  H01L51/5253 ,  H01L51/56 ,  H01L2251/303 ,  H01L2251/5338

Abstract: An atomic layer deposition apparatus for forming an atomic layer on a flexible substrate, the apparatus including an unwinding chamber having an unwinding roll for unwinding the flexible substrate, a winding chamber having a winding roll for winding the flexible substrate on which the atomic layer is formed, a plurality of reaction chambers provided between the unwinding chamber and the winding chamber so that the flexible substrate can pass therethrough, a first supply part for storing a gas containing a first precursor, a first supply pipe connected to the first supply part, a second supply part for storing a purge gas, a second supply pipe connected to the second supply part, a third supply part for storing a gas containing a second precursor, a third supply pipe connected to the third supply part, and an exhaust pipe connected to the plurality of reaction chambers.

公开(公告)号：US20180323401A1

公开(公告)日：2018-11-08

申请号：US16019903

申请日：2018-06-27

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Jin SATO ,  Mitsuru KANO ,  Hiroshi KOYAMA ,  Kyoko KUROKI

IPC: H01L51/52 ,  C23C16/02 ,  C23C16/40 ,  C23C16/455 ,  C23C16/56 ,  H01L51/56

CPC classification number: H01L51/5253 ,  B32B9/00 ,  C23C14/08 ,  C23C16/0272 ,  C23C16/30 ,  C23C16/403 ,  C23C16/455 ,  C23C16/45525 ,  C23C16/56 ,  H01L51/50 ,  H01L51/56 ,  H01L2251/301 ,  H01L2251/558 ,  H05B33/02 ,  H05B33/04

Abstract: A laminate includes: a substrate having a first surface and made of a high-molecular-weight material; an undercoat layer located on at least part of the first surface of the substrate and containing a first inorganic substance that has adsorption sites to be coupled to precursors serving as film-forming materials of an atomic layer deposition film; a functional layer located covering an outer surface of the undercoat layer and containing a second inorganic substance to be coupled to the adsorption sites of the undercoat layer, the functional layer being the atomic layer deposition film formed of the precursors; and an overcoat layer located covering an outer surface of the functional layer and containing a third inorganic substance.

公开(公告)号：US20140020627A1

公开(公告)日：2014-01-23

申请号：US14034207

申请日：2013-09-23

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Mitsuru KANO ,  Yasuhiro Sasaki

IPC: C23C16/54

Abstract: A roll-to-roll thin film coating machine of the invention includes: a first vacuum chamber into which a first precursor gas is introduced; a second vacuum chamber into which a second precursor gas is introduced; a third vacuum chamber into which a purge gas is introduced, the purge gas discharging the first precursors and the second precursors; and a transfer mechanism transferring a windable base member through the first vacuum chamber, the second vacuum chamber, and the third vacuum chamber, the transfer mechanism including a holding unit holding both end portions of the base member in a width direction thereof.

Abstract translation: 本发明的卷对卷薄膜包衣机包括：第一真空室，其中引入第一前体气体; 第二真空室，其中引入第二前体气体; 第三真空室，其中引入吹扫气体，所述吹扫气体排出所述第一前体和所述第二前体; 以及传送机构，其通过所述第一真空室，所述第二真空室和所述第三真空室传送可卷绕基材，所述传送机构包括保持所述基部构件的宽度方向的两端部的保持单元。

公开(公告)号：US20160017491A1

公开(公告)日：2016-01-21

申请号：US14866407

申请日：2015-09-25

Applicant: Toppan Printing Co., Ltd.

Inventor： Hiroshi KOYAMA ,  Jin SATO ,  Mitsuru KANO

IPC: C23C16/455 ,  C23C16/02 ,  C23C16/40 ,  C23C16/04

CPC classification number: C23C16/45525 ,  B32B27/06 ,  B32B27/308 ,  B32B2307/7244 ,  B32B2457/20 ,  C23C16/0272 ,  C23C16/04 ,  C23C16/401 ,  C23C16/403 ,  C23C16/405

Abstract: A laminate includes: a base material having a top surface; an under coat layer formed on at least a part of the top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having an OH group; and an atomic layer deposition film formed in a membranous shape to cover an exposed surface of the under coat layer, the atomic layer deposition film being formed by a precursor as a material thereof. At least a part of the precursor is coupled to the OH group of the organic polymer.

Abstract translation: 层压体包括：具有顶表面的基材; 在所述基材的上表面的至少一部分上形成有膜状或膜状且含有具有OH基的有机聚合物的底涂层; 以及形成为膜状的原子层沉积膜以覆盖底涂层的暴露表面，原子层沉积膜由前体作为其材料形成。 至少一部分前体与有机聚合物的OH基团偶联。

公开(公告)号：US20140141255A1

公开(公告)日：2014-05-22

申请号：US14164867

申请日：2014-01-27

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Mitsuru KANO ,  JIN SATO ,  TOSHIAKI YOSHIHARA ,  MASATO KON

IPC: C23C16/40 ,  C23C16/02

CPC classification number: C23C16/403 ,  B05D3/007 ,  B05D3/107 ,  B05D3/141 ,  B05D3/145 ,  B05D3/148 ,  B32B7/04 ,  C08K3/01 ,  C08K3/013 ,  C09J201/02 ,  C09J201/025 ,  C09J201/06 ,  C09J201/08 ,  C09J2400/10 ,  C09J2400/22 ,  C23C16/02 ,  C23C16/0227 ,  C23C16/0245 ,  C23C16/0272 ,  C23C16/04 ,  C23C16/405 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45525 ,  C23C16/45555 ,  C23C28/00 ,  C23C28/042 ,  Y10T428/25 ,  Y10T428/251 ,  Y10T428/258 ,  Y10T428/259 ,  Y10T428/31562 ,  Y10T428/31721 ,  Y10T428/31757

Abstract: A laminate body includes a base material, a film-like or a membrane-like undercoat layer that is formed in at least a portion of the outer surface of the base material, and an atomic layer deposition film that is formed on a surface opposite to a surface coming into contact with the base material among both surfaces of the undercoat layer in the thickness direction thereof. At least a portion of precursors of the atomic layer deposition film bind to the undercoat layer, and the atomic layer deposition film is formed into a membrane shape covering the undercoat layer.

Abstract translation: 层压体包括形成在基材的外表面的至少一部分中的基材，膜状或膜状底涂层，以及形成在与基材的相反侧的表面上的原子层沉积膜 在底涂层的厚度方向的两面中与基材接触的表面。 原子层沉积膜的前体的至少一部分与底涂层结合，原子层沉积膜形成为覆盖底涂层的膜状。

公开(公告)号：US20200370165A1

公开(公告)日：2020-11-26

申请号：US16990364

申请日：2020-08-11

Applicant: TOPPAN PRINTING CO.,LTD.

Inventor： Hiroshi KOYAMA ,  Jin SATO ,  Mitsuru KANO

IPC: C23C14/20 ,  C23C16/40 ,  B32B9/00 ,  C23C28/04 ,  C23C16/54 ,  C23C14/00 ,  C23C16/455 ,  C23C16/02 ,  C23C14/08 ,  C23C14/34

Abstract: A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.

公开(公告)号：US20180002804A1

公开(公告)日：2018-01-04

申请号：US15704228

申请日：2017-09-14

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Hiroshi KOYAMA ,  Jin SATO ,  Mitsuru KANO

IPC: C23C14/20 ,  C23C16/455 ,  C23C16/40

CPC classification number: C23C14/20 ,  B32B9/00 ,  C23C14/0036 ,  C23C14/083 ,  C23C14/34 ,  C23C16/0272 ,  C23C16/40 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45525 ,  C23C16/4554 ,  C23C16/45555 ,  C23C16/545 ,  C23C28/04

Abstract: A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.

公开(公告)号：US20170137941A1

公开(公告)日：2017-05-18

申请号：US15417510

申请日：2017-01-27

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Hiroshi KOYAMA ,  Mitsuru KANO ,  Jin SATO

IPC: C23C16/455 ,  C23C14/10 ,  C23C14/20 ,  C23C16/02

CPC classification number: C23C16/45553 ,  B32B7/10 ,  B32B9/00 ,  B32B27/06 ,  C23C14/10 ,  C23C14/20 ,  C23C16/0245 ,  C23C16/0272 ,  C23C16/403 ,  C23C16/45555

Abstract: A laminate of the present invention includes: a substrate made of a polymer material; an undercoat layer disposed on at least part of an outer surface of the substrate and made up of an inorganic material containing an inorganic substance having a functional group; and an atomic layer deposition film disposed so as to cover an outer surface of the undercoat layer and containing a precursor which is a deposition raw material such that the precursor located on the outer surface of the undercoat layer and the functional group of the inorganic substance are bound to each other.