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    Rear projection screen and manufacturing method therefor as well as molding die for shaping rear projection screen, overhead projector and projection television set
    4.
    发明授权
    Rear projection screen and manufacturing method therefor as well as molding die for shaping rear projection screen, overhead projector and projection television set 失效
    背投屏幕及其制造方法以及用于成形背投屏幕，高架投影仪和投影电视机的成型模具

    公开(公告)号：US5166824A

    公开(公告)日：1992-11-24

    申请号：US782588

    申请日：1991-10-25

    申请人： Takashi Nishiguchi ,  Masami Masuda ,  Noriyuki Taguchi

    发明人： Takashi Nishiguchi ,  Masami Masuda ,  Noriyuki Taguchi

    IPC分类号： G03B21/132 ,  G03B21/62 ,  H04N5/74

    CPC分类号： G03B21/625

    摘要： In a rear projection screen, a plurality of convex lenses of the prescribed configuration are made of photoresist and formed and arranged on a surface or surfaces of a substrate in the prescribed pattern. In case that the convex lenses are formed in the shapes of ellipsoid, the longer radial direction of the ellipsoid is made to coincide with the horizontal direction and shapes of the lenses are changed gradually from the center of the screen to the extremity thereof. Bottom surfaces of non-lens boundary grooves between adjacent convex lenses are made rougher than the convex lens surfaces. A screen manufacturing method comprises the steps of applying photoresist onto a surface or surfaces of a substrate, exposing a patttern of boundary grooves onto the photoresist by photolithography, forming the boundary grooves by etching, and heating and melting the photoresist which is formed with the boundary grooves so as to form a plurality of convex lenses having the prescribed configuration. Further, it is possible to form a plurality of convex lenses of the prescribed configuration by rotating the substrate about the center thereof in the horizontal plane following the heating and melting step. In addition, it is possible, in forming the boundary grooves, to change the setting conditions of etching so that the bottom surfaces of the boundary grooves are made rougher than the convex lens surfaces.

    摘要翻译： 在背投屏幕中，规定构造的多个凸透镜由光致抗蚀剂制成并且以规定图案形成并布置在基板的表面上。 在凸透镜形成为椭圆形的情况下，使椭圆体的较长径向与水平方向一致，并且透镜的形状从屏幕的中心到其末端逐渐变化。 相邻凸透镜之间的非透镜边界槽的底面比凸透镜表面更粗糙。 屏幕制造方法包括以下步骤：将光致抗蚀剂施加到基板的表面或表面上，通过光刻将边界槽的凹槽暴露在光致抗蚀剂上，通过蚀刻形成边界槽，并加热和熔化形成有边界的光致抗蚀剂 以形成具有规定构造的多个凸透镜。 此外，可以通过在加热和熔融步骤之后在水平面中围绕其中心旋转基板来形成规定构造的多个凸透镜。 此外，在形成边界槽时，可以改变蚀刻的设置条件，使得边界槽的底表面比凸透镜表面更粗糙。

    Plasma processing device and plasma processing method
    5.
    发明申请
    Plasma processing device and plasma processing method 审中-公开
    等离子体处理装置和等离子体处理方法

    公开(公告)号：US20050016456A1

    公开(公告)日：2005-01-27

    申请号：US10490293

    申请日：2003-02-20

    申请人： Noriyuki Taguchi ,  Yasushi Sawada ,  Kohichi Matsunaga

    发明人： Noriyuki Taguchi ,  Yasushi Sawada ,  Kohichi Matsunaga

    IPC分类号： H05H1/24 ,  C23C16/00

    CPC分类号： H05H1/2406 ,  H05H2001/2412 ,  H05H2001/2462 ,  H05H2245/123

    摘要： A plasma treatment apparatus and method are provided, which have the capability of maintaining a stable discharge, achieving a sufficient plasma treatment, and reducing plasma temperature. In this apparatus, electrodes are arranged to define a discharge space therebetween, and a dielectric material is disposed at a discharge-space side of at least one of the electrodes. A voltage is applied between the electrodes, while a plasma generation gas being supplied into the discharge space, to develop the discharge in the discharge space under a pressure substantially equal to atmospheric pressure, and provide the plasma generated by the discharge from the discharge space. A waveform of the voltage applied between the electrodes is an alternating voltage waveform without rest period. At least one of rising and falling times of the alternating voltage waveform is 100 μsec or less. A repetition frequency is in a range of 0.5 to 1000 kHz. An electric-field intensity applied between the electrodes is in a range of 0.5 to 200 kV/cm.

    摘要翻译： 提供了具有保持稳定放电，实现足够的等离子体处理和降低等离子体温度的能力的等离子体处理装置和方法。 在该装置中，电极被布置为在其间限定放电空间，并且电介质材料设置在至少一个电极的放电空间侧。 在电极之间施加电压，同时将等离子体产生气体供应到放电空间中，以在基本上等于大气压的压力下在放电空间中产生放电，并且提供通过从放电空间的放电产生的等离子体。 施加在电极之间的电压的波形是没有休止期的交流电压波形。 交流电压波形的上升和下降时间中至少有一个是100个或更少。 重复频率在0.5至1000kHz的范围内。 施加在电极之间的电场强度在0.5至200kV / cm的范围内。