ELECTRODE STRUCTURE OF MEMORY CAPACITOR AND MANUFACTURING METHOD THEREOF
    9.
    发明申请
    ELECTRODE STRUCTURE OF MEMORY CAPACITOR AND MANUFACTURING METHOD THEREOF 有权
    存储电容器的电极结构及其制造方法

    公开(公告)号:US20090224362A1

    公开(公告)日:2009-09-10

    申请号:US12205935

    申请日:2008-09-08

    IPC分类号: H01L27/06 H01L21/20

    CPC分类号: H01L28/86 H01L28/82 H01L28/90

    摘要: After a fabrication process intended to miniaturize semiconductor devices, a surface area of a stack capacitor in a random access memory (RAM) is significantly reduced and capacity thereof is thus decreased, which in turn causes the capacitor not able to function properly. The present invention provides a composite lower electrode structure consisting of an exterior annular pipe and a central pillar having concave-convex surfaces to increase a surface area of the capacitor within a limited memory cell so as to enhance the capacity. To reinforce intensity of a structure of the capacitor, the exterior annular pipe has an elliptic radial cross section and a thicker thickness along a short axis direction.

    摘要翻译: 在旨在使半导体器件小型化的制造工艺之后,随机存取存储器(RAM)中的堆叠电容器的表面积显着减小,并且其容量因此降低,这又导致电容器不能正常工作。 本发明提供了一种由外部环形管和具有凹凸表面的中心柱构成的复合下电极结构,以增加有限存储单元内的电容器的表面积,从而提高容量。 为了加强电容器的结构的强度,外部环形管具有沿着短轴方向的椭圆形的径向横截面和较厚的厚度。