公开(公告)号：US4844616A

公开(公告)日：1989-07-04

申请号：US200262

申请日：1988-05-31

Applicant: Murlidhar V. Kulkarni ,  William H. Lancaster, Jr.

Inventor： Murlidhar V. Kulkarni ,  William H. Lancaster, Jr.

IPC: G01B9/02 ,  G01J9/02 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01B9/0201 ,  G01B9/02048 ,  G01B9/02057 ,  G01N21/9501 ,  G01N21/9506 ,  G01B2290/70 ,  G01J2009/0265 ,  G01N2021/178

Abstract: The invention is a method for detecting both surface topography and defect presence using an AC interferometer. Surface topography measurements are maximized by adjusting the signal voltage of the light modulator to a relative phase-sensitive value. Defect detection is maximized by adjusting the signal voltage of the light modulator to a relatively phase-insensitive value. This method not only allows for heretofore unknown defect detection by an AC interferometer but, because the signal voltage can be switched electronically, permits both observations to be taken at a high speed and for many points of a specimen, thereby making the method suitable for the manufacturing environment. More specifically, the method would be applicable to both optical disk and microchip manufacturing.

Abstract translation: 本发明是使用AC干涉仪检测表面形貌和缺陷存在的方法。 通过将光调制器的信号电压调整到相对相敏值来最大化表面形貌测量。 通过将光调制器的信号电压调整到相对不敏感的值来最大化缺陷检测。 该方法不仅能够通过AC干涉仪进行未知的未知缺陷检测，而且由于可以电子地切换信号电压，因此允许以高速度和样本的多个点进行观察，从而使该方法适合于 制造环境。 更具体地，该方法将适用于光盘和微芯片制造。

公开(公告)号：US20170184455A1

公开(公告)日：2017-06-29

申请号：US14986560

申请日：2015-12-31

Applicant: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences

Inventor： Xiangzhao Wang ,  Feng Tang ,  Guoxian Zhang ,  Shifu Xu

IPC: G01J9/02

CPC classification number: G01M11/0271 ,  G01J9/0215 ,  G01J2009/0223 ,  G01J2009/0226 ,  G01J2009/0265 ,  G03F7/706

Abstract: A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.

公开(公告)号：US11933609B2

公开(公告)日：2024-03-19

申请号：US17644933

申请日：2021-12-17

Applicant: YOKOGAWA ELECTRIC CORPORATION ,  Yokogawa Test & Measurement Corporation

Inventor： Nobuhide Yamada

IPC: G01B9/02001 ,  G01B9/02 ,  G01J9/02

CPC classification number: G01B9/02011 ,  G01J9/0246 ,  G01B9/02051 ,  G01B2290/20 ,  G01B2290/45 ,  G01B2290/70 ,  G01J2009/0265

Abstract: The interferometer 10 according to this disclosure includes: a first optical component 12 that splits each of the P polarization component and the S polarization component of the light to be measured into the first optical path R1 and the second optical path R2 and combines the light to be measured; a second optical component 13 placed in the first optical path; a third optical component 14 that splits the light to be measured into the P polarization component and the S polarization component; and a P polarization detector 11a and an S polarization detector 11b that respectively detect the P polarization component and the S polarization component split by the third optical component, wherein the second optical component has an optical surface that changes the propagation direction of the light to be measured and gives a phase difference between the P polarization component and the S polarization component.

公开(公告)号：US09441948B2

公开(公告)日：2016-09-13

申请号：US11502330

申请日：2006-08-09

Applicant: Benjamin J. Vakoc ,  Seok-Hyun Yun ,  Guillermo J. Tearney ,  Brett Eugene Bouma

Inventor： Benjamin J. Vakoc ,  Seok-Hyun Yun ,  Guillermo J. Tearney ,  Brett Eugene Bouma

IPC: G01B9/02 ,  G01N21/21 ,  G01N21/47 ,  A61B5/00 ,  G01J3/45 ,  G01J9/02 ,  G01N21/27

CPC classification number: G01B9/02044 ,  A61B5/0059 ,  A61B5/0066 ,  G01B9/02004 ,  G01B9/02072 ,  G01B9/02081 ,  G01B9/02091 ,  G01B2290/45 ,  G01B2290/70 ,  G01J3/45 ,  G01J2009/0265 ,  G01N21/21 ,  G01N21/274 ,  G01N21/4795

Abstract: Apparatus, method and storage medium which can provide at least one first electro-magnetic radiation to a sample and at least one second electromagnetic radiation to a reference, such that the first and/or second electromagnetic radiations have a spectrum which changes over time. In addition, a first polarization component of at least one third radiation associated with the first radiation can be combined with a second polarization component of at least one fourth radiation associated with the second radiation with one another. The first and second polarizations may be specifically controlled to be at least approximately orthogonal to one another.

Abstract translation: 可以向样品提供至少一个第一电磁辐射和至少一个第二电磁辐射至参考物的装置，方法和存储介质，使得第一和/或第二电磁辐射具有随时间变化的光谱。 此外，与第一辐射相关联的至少一个第三辐射的第一偏振分量可以与与第二辐射相关联的至少一个第四辐射的第二偏振分量彼此组合。 可以将第一和第二偏振特别地控制为至少大致彼此正交。

公开(公告)号：US07123364B2

公开(公告)日：2006-10-17

申请号：US10267237

申请日：2002-10-08

Applicant: Vance A. Deason ,  Kenneth L. Telschow

Inventor： Vance A. Deason ,  Kenneth L. Telschow

IPC: G01B9/02

CPC classification number: G01H9/002 ,  G01B9/04 ,  G01H9/00 ,  G01J2009/0265

Abstract: An imaging system includes: an object wavefront source and an optical microscope objective all positioned to direct an object wavefront onto an area of a vibrating subject surface encompassed by a field of view of the microscope objective, and to direct a modulated object wavefront reflected from the encompassed surface area through a photorefractive material; and a reference wavefront source and at least one phase modulator all positioned to direct a reference wavefront through the phase modulator and to direct a modulated reference wavefront from the phase modulator through the photorefractive material to interfere with the modulated object wavefront. The photorefractive material has a composition and a position such that interference of the modulated object wavefront and modulated reference wavefront occurs within the photorefractive material, providing a full-field, real-time image signal of the encompassed surface area.

Abstract translation: 一种成像系统包括：物体波前源和光学显微镜物镜，其全部定位成将物体波前引导到由显微镜物镜的视场所包围的振动对象表面的区域上，并且引导从 通过光折射材料包围的表面积; 以及参考波前源和至少一个相位调制器，其全部定位成将参考波前引导通过相位调制器，并且通过光折射材料引导来自相位调制器的调制参考波阵面以干扰调制对象波前。 光折射材料具有组成和位置，使得调制对象波前和调制参考波阵面的干涉发生在光折射材料内，从而提供包围的表面区域的全场实时图像信号。

公开(公告)号：US20030128366A1

公开(公告)日：2003-07-10

申请号：US10267237

申请日：2002-10-08

Inventor： Vance A. Deason ,  Kenneth L. Telschow

IPC: G01B009/02

CPC classification number: G01H9/002 ,  G01B9/04 ,  G01H9/00 ,  G01J2009/0265

Abstract: An imaging system includes: an object wavefront source and an optical microscope objective all positioned to direct an object wavefront onto an area of a vibrating subject surface encompassed by a field of view of the microscope objective, and to direct a modulated object wavefront reflected from the encompassed surface area through a photorefractive material; and a reference wavefront source and at least one phase modulator all positioned to direct a reference wavefront through the phase modulator and to direct a modulated reference wavefront from the phase modulator through the photorefractive material to interfere with the modulated object wavefront. The photorefractive material has a composition and a position such that interference of the modulated object wavefront and modulated reference wavefront occurs within the photorefractive material, providing a full-field, real-time image signal of the encompassed surface area.

Abstract translation: 一种成像系统包括：物体波前源和光学显微镜物镜，其全部定位成将物体波前引导到由显微镜物镜的视场所包围的振动对象表面的区域上，并且引导从 通过光折射材料包围的表面积; 以及参考波前源和至少一个相位调制器，其全部定位成将参考波前引导通过相位调制器，并且通过光折射材料引导来自相位调制器的调制参考波阵面以干扰调制对象波前。 光折射材料具有组成和位置，使得调制对象波前和调制参考波阵面的干涉发生在光折射材料内，从而提供包围的表面区域的全场实时图像信号。

公开(公告)号：US11852795B2

公开(公告)日：2023-12-26

申请号：US17779283

申请日：2020-12-07

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Katsuhiro Nakamoto

IPC: G02B21/06 ,  H04N23/62 ,  H04N23/66 ,  H04N23/67 ,  G02B21/18 ,  G02B26/08 ,  G01J9/02

CPC classification number: G02B21/06 ,  G02B21/18 ,  G02B26/0833 ,  H04N23/62 ,  H04N23/66 ,  H04N23/672 ,  G01J2009/0265

Abstract: An imaging apparatus includes a light source, a spatial light modulator, a Fourier transform optical system, a photodetector, and a control unit. The control unit sets a first region and a second region on a modulation plane of the spatial light modulator, sequentially sets a plurality of light phase modulation patterns in the first region, sequentially sets a plurality of uniform phase shifts in a region other than the first region when setting each light phase modulation pattern in the first region to acquire a light intensity value, and acquires a phase image of a region of an object corresponding to the first region using a phase shift method.

公开(公告)号：US07564568B2

公开(公告)日：2009-07-21

申请号：US11680968

申请日：2007-03-01

Applicant: Peter De Groot ,  Leslie L. Deck

Inventor： Peter De Groot ,  Leslie L. Deck

IPC: G01B11/02

CPC classification number: G01B9/02011 ,  G01B9/02002 ,  G01B9/02004 ,  G01B9/02007 ,  G01B9/02012 ,  G01B9/02057 ,  G01B2290/45 ,  G01B2290/70 ,  G01J2009/0234 ,  G01J2009/0265

Abstract: An interferometer system is disclosed which is configured to combine measurement light with reference light to form an optical interference pattern, where the interferometer system includes a modulator configured to repetitively introduce a sequence of phase shifts between the measurement and reference light; and a camera system positioned to measure the optical interference pattern, where the camera system is configured to separately accumulate time-integrated images of the optical interference pattern corresponding to the different phase shifts in the sequence during the repetitions of the sequence.

Abstract translation: 公开了一种干涉仪系统，其被配置为将测量光与参考光结合以形成光学干涉图案，其中所述干涉仪系统包括被配置为在所述测量参考光和所述参考光之间重复地引入相移序列的调制器; 以及定位成测量光学干涉图案的相机系统，其中相机系统被配置为在序列的重复期间分别累积对应于序列中的不同相移的光学干涉图案的时间集成图像。

公开(公告)号：US20070035743A1

公开(公告)日：2007-02-15

申请号：US11502330

申请日：2006-08-09

Applicant: Benjamin Vakoc ,  Seok-Hyun Yun ,  Guillermo Tearney ,  Brett Bouma

Inventor： Benjamin Vakoc ,  Seok-Hyun Yun ,  Guillermo Tearney ,  Brett Bouma

IPC: G01B9/02 ,  G01B11/02

CPC classification number: G01B9/02044 ,  A61B5/0059 ,  A61B5/0066 ,  G01B9/02004 ,  G01B9/02072 ,  G01B9/02081 ,  G01B9/02091 ,  G01B2290/45 ,  G01B2290/70 ,  G01J3/45 ,  G01J2009/0265 ,  G01N21/21 ,  G01N21/274 ,  G01N21/4795

Abstract: Apparatus, method and storage medium which can provide at least one first electro-magnetic radiation to a sample and at least one second electromagnetic radiation to a reference, such that the first and/or second electromagnetic radiations have a spectrum which changes over time. In addition, a first polarization component of at least one third radiation associated with the first radiation can be combined with a second polarization component of at least one fourth radiation associated with the second radiation with one another. The first and second polarizations may be specifically controlled to be at least approximately orthogonal to one another.

Abstract translation: 可以向样品提供至少一个第一电磁辐射和至少一个第二电磁辐射至参考物的装置，方法和存储介质，使得第一和/或第二电磁辐射具有随时间变化的光谱。 此外，与第一辐射相关联的至少一个第三辐射的第一偏振分量可以与与第二辐射相关联的至少一个第四辐射的第二偏振分量彼此组合。 可以将第一和第二偏振特别地控制为至少大致彼此正交。

公开(公告)号：US4905169A

公开(公告)日：1990-02-27

申请号：US366348

申请日：1989-06-15

Applicant: Tudor N. Buican ,  John C. Martin

Inventor： Tudor N. Buican ,  John C. Martin

IPC: G01J3/447 ,  G01J3/453 ,  G01J9/02 ,  G01N15/10 ,  G01N15/14

CPC classification number: G01J3/453 ,  G01J3/447 ,  G01J9/0246 ,  G01J2009/0249 ,  G01J2009/0265 ,  G01N15/14 ,  G01N2015/1006 ,  G01N2021/6439

Abstract: An apparatus and method simultaneously measures a plurality of spectral wavelengths present in electromagnetic radiation. A modulatable birefringent optical element is employed to divide a polarized light beam into two components, thereby producing a phase difference in two resulting light beams such that the two beams can be made to interfere with one another when recombined, the interference pattern providing the wavelength information required for the analysis of the incident light. The interferometer thus created performs in a similar manner to a Michelson interferometer, but with no moving parts, and with a resolution dependent on the degree of phase shift introduced by the modulator.

Abstract translation: 一种装置和方法同时测量电磁辐射中存在的多个光谱波长。 采用可调制的双折射光学元件将偏振光束分成两个分量，从而在两个产生的光束中产生相位差，使得当重新组合时可以使两个光束彼此干扰，提供波长信息的干涉图案 需要分析入射光。 这样创建的干涉仪以与迈克尔逊干涉仪类似的方式执行，但没有移动部件，并且具有取决于由调制器引入的相移程度的分辨率。