摘要:
A method and apparatus for packaging a semiconductor chip is presented. A semiconductor device includes a chip, a lead, and an encapsulant. The encapsulant includes a stabilization layer, a laminate molding layer connected to the stabilization layer, and a conductive strip connected to the laminate molding layer. The conductive strip electrically connects the contact area of the chip to the lead.
摘要:
A method and apparatus for packaging a semiconductor chip is presented. A semiconductor device includes a chip, a lead, and an encapsulant. The encapsulant includes a stabilization layer, a laminate molding layer connected to the stabilization layer, and a conductive strip connected to the laminate molding layer. The conductive strip electrically connects the contact area of the chip to the lead.
摘要:
A semiconductor power arrangement includes a chip carrier having a first surface and a second surface opposite the first surface. The semiconductor power arrangement further includes a plurality of power semiconductor chips attached to the chip carrier, wherein the power semiconductor chips are inclined to the first and/or second surface of the chip carrier.
摘要:
A semiconductor device fabrication method includes forming a barrier layer upon a dielectric layer, forming a pillar interconnect structure upon the barrier layer, forming solder upon the pillar interconnect structure, reflowing the solder to release solder voids, forming a perimeter material around at least a portion of an exposed sidewall of the pillar, and removing the barrier layer exterior to the pillar interconnect structure. Another fabrication method includes forming the barrier layer, forming the pillar interconnect structure, forming the solder upon the pillar interconnect structure, forming a perimeter material on exposed surfaces of the pillar interconnect structure, and removing the barrier layer on the surface of the dielectric layer exterior to the pillar interconnect structure. Another fabrication method includes forming the barrier layer, forming the pillar interconnect structure, forming a wettable material on sidewalls of the pillar, and removing the barrier layer exterior to the pillar interconnect structure.
摘要:
A semiconductor device fabrication method includes forming a barrier layer upon a dielectric layer, forming a pillar interconnect structure upon the barrier layer, forming solder upon the pillar interconnect structure, reflowing the solder to release solder voids, forming a perimeter material around at least a portion of an exposed sidewall of the pillar, and removing the barrier layer exterior to the pillar interconnect structure. Another fabrication method includes forming the barrier layer, forming the pillar interconnect structure, forming the solder upon the pillar interconnect structure, forming a perimeter material on exposed surfaces of the pillar interconnect structure, and removing the barrier layer on the surface of the dielectric layer exterior to the pillar interconnect structure. Another fabrication method includes forming the barrier layer, forming the pillar interconnect structure, forming a wettable material on sidewalls of the pillar, and removing the barrier layer exterior to the pillar interconnect structure.