POST-SEED DEPOSITION PROCESS
    4.
    发明申请
    POST-SEED DEPOSITION PROCESS 审中-公开
    后期沉积过程

    公开(公告)号:WO2008101093B1

    公开(公告)日:2008-10-30

    申请号:PCT/US2008053982

    申请日:2008-02-14

    Abstract: A method involves pattern etching a photoresist that is located on a wafer that contains a deposited seed layer to expose portions of the seed layer, plating the wafer so that plating metal builds up on only the exposed seed layer until the plating metal has reached an elevation above the seed layer that is at least equal to a thickness of the seed layer, removing the solid photoresist, and removing seed layer exposed by removal of the phototresist and plated metal until all of the exposed seed layer has been removed.

    Abstract translation: 一种方法包括图案蚀刻位于晶片上的光致抗蚀剂,该光致抗蚀剂包含沉积的种子层以暴露种子层的部分,电镀晶片,使得电镀金属仅在暴露的种子层上积累,直到电镀金属达到高度 在晶种层上方至少等于种子层的厚度,去除固体光致抗蚀剂,以及通过除去光致抗蚀剂和电镀金属去除暴露的种子层,直到所有暴露的种子层已被去除。

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