Lithographic contact elements
    22.
    发明公开
    Lithographic contact elements 审中-公开
    光刻胶Kontaktelemente

    公开(公告)号:EP1316803A2

    公开(公告)日:2003-06-04

    申请号:EP03003497.9

    申请日:1999-12-01

    Abstract: A method of forming an interconnection, including a spring contact element, by lithographic techniques. The method comprises successively patterning a first and a second layer of masking material (125, 140) over a substrate (105), each layer of masking material having an opening; depositing a first conductive material (130) after patterning said first layer of masking material and depositing a second conductive material (145) after patterning said second layer of making material to form an electromechanical contact element having: a first portion (130) formed in an opening in said first masking material layer (125) and a second portion (145) coupled to the first portion and formed in an opening in said second masking material layer (140); and removing the plurality of layers of masking material.

    Abstract translation: 通过光刻技术形成包括弹簧接触元件的互连的方法。 该方法包括在衬底(105)上连续地构图第一和第二掩蔽材料层(125,140),每层掩模材料具有开口; 在图案化所述第一掩模材料层之后沉积第一导电材料(130),并且在图案化所述第二制造材料层之后沉积第二导电材料(145)以形成机电接触元件,所述机电接触元件具有:第一部分 在所述第一掩蔽材料层(125)中开口,以及耦合到所述第一部分并形成在所述第二掩模材料层(140)中的开口中的第二部分(145); 以及去除多层掩模材料。

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