利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

10 条记录 (耗时 0.047 秒)

    Laser thin film poly-silicon annealing optical system
    3.
    发明申请
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US20050035103A1

    公开(公告)日：2005-02-17

    申请号：US10884101

    申请日：2004-07-01

    申请人： William Partlo ,  Palash Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William Partlo ,  Palash Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/06 ,  B23K26/073 ,  C30B1/02 ,  C30B13/24 ,  H01L21/20 ,  H01S3/22 ,  H01S3/223

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of teh long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser ouput light pulse beam as delivered to the workpiece and a a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热方法和装置，其可以使在等于或高于4000Hz的工作的脉冲XeF激光器产生在约351nm的中心波长的激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20um，并且扩大激光输出光脉冲光束以在光束的长轴上形成工件覆盖的长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构，其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。

    Laser thin film poly-silicon annealing optical system
    4.
    发明申请
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US20050269300A1

    公开(公告)日：2005-12-08

    申请号：US11201877

    申请日：2005-08-11

    申请人： William Partlo ,  Palash Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William Partlo ,  Palash Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/06 ,  B23K26/073 ,  C30B1/02 ,  C30B13/24 ,  H01L21/20 ,  H01S3/22 ,  H01S3/223 ,  B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser output light pulse beam as delivered to the workpiece and a a line bow correction mechanism in a short axis optical assembly. The line bow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a line bow is correction mechanism within a field stop optical assembly correcting line bow at the field stop plane and within a workpiece projection optical assembly correcting line bow at the workpiece plane.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热方法和装置，其可以包括在4000Hz以上工作的脉冲XeF激光器，并在约351nm的中心波长处产生激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20μm，并且扩大激光输出光脉冲光束，以在光束的长轴上形成工件覆盖长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有线弯曲校正机构。 线弯曲校正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的线弓形校正机构，其在场停止平面处以及在工件投影光学组件中校正线弓在工件平面处的校正线弓。

    Laser thin film poly-silicon annealing system
    5.
    发明申请
    Laser thin film poly-silicon annealing system 有权
    激光薄膜多晶硅退火系统

    公开(公告)号：US20050141580A1

    公开(公告)日：2005-06-30

    申请号：US10884547

    申请日：2004-07-01

    申请人： William Partlo ,  Palash Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William Partlo ,  Palash Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/06 ,  G03F20060101 ,  H01L21/20 ,  H01S3/081 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

    CPC分类号： H01S3/0818 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/0738 ,  B23K26/705 ,  H01L21/02532 ,  H01L21/02675 ,  H01S3/225 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2366

    摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.

    摘要翻译： 公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光 脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。 该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。 该系统可以包括振荡器激光单元中的发散控制。 发散控制可以包括不稳定的谐振器装置。 该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。 光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。

    Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
    6.
    发明申请
    Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate 审中-公开
    用于实现形成为线束的激光与沉积在衬底上的膜之间的相互作用的系统和方法

    公开(公告)号：US20050259709A1

    公开(公告)日：2005-11-24

    申请号：US11138001

    申请日：2005-05-26

    申请人： Palash Das ,  Thomas Hofmann ,  Jesse Davis ,  Scot Smith ,  William Partlo

    发明人： Palash Das ,  Thomas Hofmann ,  Jesse Davis ,  Scot Smith ,  William Partlo

    IPC分类号： B23K26/04 ,  B23K26/06 ,  B23K26/073 ,  C30B1/02 ,  C30B13/24 ,  H01S3/10 ,  H01S3/13

    CPC分类号： B23K26/043 ,  B23K26/04 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24

    摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.

    摘要翻译： 公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。 该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。 在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。 在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。 在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

    Systems and methods for generating laser light shaped as a line beam
    8.
    发明申请
    Systems and methods for generating laser light shaped as a line beam 有权
    用于产生形成为线束的激光的系统和方法

    公开(公告)号：US20070097511A1

    公开(公告)日：2007-05-03

    申请号：US11261948

    申请日：2005-10-28

    申请人： Palash Das ,  Albert Cefalo ,  David Knowles ,  Vitaliy Shklover ,  Holger Muenz

    发明人： Palash Das ,  Albert Cefalo ,  David Knowles ,  Vitaliy Shklover ,  Holger Muenz

    IPC分类号： G02B27/10

    CPC分类号： G02B19/0009 ,  G02B7/004 ,  G02B19/0028 ,  G02B19/0052 ,  G02B27/095 ,  G02B27/0977 ,  G02B27/0988

    摘要： Systems and methods are disclosed for shaping a laser beam for interaction with a film in which the laser beam travels along a beam path and defines a short-axis and a long-axis. In one aspect, the system may include a first short-axis element having an edge positioned at a distance, d1, along the beam path from the film and a second short-axis element having an edge positioned at a distance, d2, along the beam path from the film, with d2

    摘要翻译： 公开了用于成形激光束以与激光束沿着光束路径行进并且限定短轴和长轴的膜相互作用的系统和方法。 在一个方面，该系统可以包括第一短轴元件，该第一短轴元件具有沿着从胶片的光束路径定位在一定距离处的边缘，以及具有定位的边缘的第二短轴元件 沿着离膜的光束路径距离d 2> 2 ，具有d 2 1 。 光学元件可以沿着第二元件和膜之间的光束路径定位，用于将光束聚焦在短轴中以与膜相互作用。 在另一方面，可以提供一种系统，其具有可操作以选择性地调节短轴元件的一个或两个边缘的曲率的机构。

    Confocal pulse stretcher
    9.
    发明申请
    Confocal pulse stretcher 有权
    共焦脉冲担架

    公开(公告)号：US20070237192A1

    公开(公告)日：2007-10-11

    申请号：US11394512

    申请日：2006-03-31

    申请人： Palash Das ,  Thomas Hofmann ,  Gang Lei

    发明人： Palash Das ,  Thomas Hofmann ,  Gang Lei

    IPC分类号： H01S3/10 ,  H01S3/03

    CPC分类号： H01S3/0057 ,  G03F7/7055 ,  H01S3/225

    摘要： A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse along a laser system output pulse optical axis and diverting a portion of the output pulse into an optical delay having an optical delay path and which may comprise a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic; an optical axis alignment mechanism comprising an radial mirror positioning mechanism operable to position the output of the optical delay to the align with the portion of the laser output pulse transmitted along the optical axis of the portion of the laser system output pulse transmitted by the laser output pulse optical delay initiating optic.

    摘要翻译： 公开了一种产生激光输出脉冲的气体放电激光器系统和一种操作这种系统的方法，其可以包括脉冲展宽器，其可以包括激光输出脉冲光学延迟启动光学器件，以将激光输出脉冲的一部分沿着激光系统输出 脉冲光轴并将输出脉冲的一部分转换成具有光学延迟路径的光学延迟，并且可以包括串联对准的多个共焦谐振器，以将光学延迟的输出传递到激光输出脉冲光学延迟启动光学器件; 光轴对准机构，其包括径向镜定位机构，其可操作以将光学延迟的输出定位成与激光输出脉冲的沿激光输出脉冲发射的激光系统输出脉冲部分的光轴传输的部分对准 脉冲光学延迟启动光学器件。

    Gas discharge laser light source beam delivery unit
    10.
    发明申请
    Gas discharge laser light source beam delivery unit 审中-公开
    气体放电激光光源射束单元

    公开(公告)号：US20070160103A1

    公开(公告)日：2007-07-12

    申请号：US11715082

    申请日：2007-03-06

    申请人： Palash Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Webb

    发明人： Palash Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Webb

    IPC分类号： H01S3/22

    CPC分类号： B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/04 ,  G01J1/0418 ,  G01J1/4257 ,  G01J2001/0285 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

    摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

    摘要翻译： 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光束脉冲束传送 从气体放电激光器的输出到使用包含在输出激光脉冲光束中的光的工作装置的输入的路径; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构，包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在可调节地安装在外壳内的外壳内的光束衰减器单元，用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。