公开(公告)号：US20060126697A1

公开(公告)日：2006-06-15

申请号：US11346519

申请日：2006-02-01

申请人： David Knowles ,  Daniel Brown ,  Herve Besaucele ,  David Myers ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Palash Das ,  Stuart Anderson ,  Igor Fomenkov ,  Richard Ujazdowski ,  Eckehard Onkels ,  Richard Ness ,  Scott Smith ,  William Hulburd ,  Jeffrey Oicles

发明人： David Knowles ,  Daniel Brown ,  Herve Besaucele ,  David Myers ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Palash Das ,  Stuart Anderson ,  Igor Fomenkov ,  Richard Ujazdowski ,  Eckehard Onkels ,  Richard Ness ,  Scott Smith ,  William Hulburd ,  Jeffrey Oicles

IPC分类号： H01S3/22

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.

公开(公告)号：US20050271109A1

公开(公告)日：2005-12-08

申请号：US11199691

申请日：2005-08-09

申请人： David Knowles ,  Daniel Brown ,  Herve Besaucele ,  David Myers ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Palash Das ,  Stuart Anderson ,  Igor Fomenkov ,  Richard Ujazdowski ,  Eckehard Onkels ,  Richard Ness ,  Scot Smith ,  William Hulburd ,  Jeffrey Oicles

发明人： David Knowles ,  Daniel Brown ,  Herve Besaucele ,  David Myers ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Palash Das ,  Stuart Anderson ,  Igor Fomenkov ,  Richard Ujazdowski ,  Eckehard Onkels ,  Richard Ness ,  Scot Smith ,  William Hulburd ,  Jeffrey Oicles

IPC分类号： H01S1/00 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.

摘要翻译： 公开了一种振荡放大器气体放电激光器系统和方法，其可以包括第一激光器单元，该第一激光器单元可以包括可包含受激准分子或分子氟激光气体介质的第一放电区域; 限定含有激光气体介质的第一放电区域的第一对电极，用于使在所述第一放电区域中产生的输出激光脉冲光束脉冲的光谱带宽变窄的线窄化单元; 第二激光单元，其可以包括可包含受激准分子或分子氟激光气体介质的第二放电室; 限定包含所述激光气体介质的所述第二放电区域的第二对电极; 脉冲功率系统，其向所述第一对电极和所述第二对电极提供电脉冲，在所述相应的第一和第二对电极之间的所述激光气体介质中产生气体放电，以及激光参数控制机构修改所选择的所选择的参数 通过控制第一对电极之间的气体放电的发生时间和第二对电极之间的气体放电的发生的时间，由所述气体放电激光系统产生的激光输出光脉冲束脉冲。

公开(公告)号：US20080023657A1

公开(公告)日：2008-01-31

申请号：US11880319

申请日：2007-07-20

申请人： Stephen Melnychuk ,  William Partlo ,  Igor Fomenkov ,  I. Oliver ,  Richard Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis Rettig ,  Gerry Blumenstock ,  Timothy Dyer ,  Rodney Simmons ,  Jerzy Hoffman ,  R. Johnson

发明人： Stephen Melnychuk ,  William Partlo ,  Igor Fomenkov ,  I. Oliver ,  Richard Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis Rettig ,  Gerry Blumenstock ,  Timothy Dyer ,  Rodney Simmons ,  Jerzy Hoffman ,  R. Johnson

IPC分类号： H01L31/18

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70916 ,  H01S3/005 ,  H05G2/005 ,  H05G2/008 ,  H05H1/06

摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

公开(公告)号：US20050230645A1

公开(公告)日：2005-10-20

申请号：US11107535

申请日：2005-04-14

申请人： Stephan Melnychuk ,  William Partlo ,  Igor Fomenkov ,  I. Oliver ,  Richard Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis Rettig ,  Gerry Blumenstock ,  Timothy Dyer ,  Rodney Simmons ,  Jerzy Hoffman ,  R. Johnson

发明人： Stephan Melnychuk ,  William Partlo ,  Igor Fomenkov ,  I. Oliver ,  Richard Ness ,  Norbert Bowering ,  Oleh Khodykin ,  Curtis Rettig ,  Gerry Blumenstock ,  Timothy Dyer ,  Rodney Simmons ,  Jerzy Hoffman ,  R. Johnson

IPC分类号： G21K5/00 ,  G01J1/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01S3/00 ,  H05G2/00 ,  H05H1/06 ,  H05H1/24

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70916 ,  H01S3/005 ,  H05G2/005 ,  H05G2/008 ,  H05H1/06

摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

公开(公告)号：US20050265417A1

公开(公告)日：2005-12-01

申请号：US11181258

申请日：2005-07-14

申请人： John Fallon ,  John Rule ,  Robert Jacques ,  Jacob Lipcon ,  William Partlo ,  Alexander Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard Ness ,  Paul Melcher

发明人： John Fallon ,  John Rule ,  Robert Jacques ,  Jacob Lipcon ,  William Partlo ,  Alexander Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard Ness ,  Paul Melcher

IPC分类号： H01S3/00 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1055 ,  H01S3/22 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/097 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/10038 ,  H01S3/1055 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

摘要翻译： 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制特征包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体 温度控制和（4）F 2注入控制与新的学习算法。

公开(公告)号：US20060209917A1

公开(公告)日：2006-09-21

申请号：US11376364

申请日：2006-03-15

申请人： John Fallon ,  John Rule ,  Robert Jacques ,  Jacob Lipcon ,  William Partlo ,  Alexander Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard Ness ,  Paul Melcher

发明人： John Fallon ,  John Rule ,  Robert Jacques ,  Jacob Lipcon ,  William Partlo ,  Alexander Ershov ,  Toshihiko Ishihara ,  John Meisner ,  Richard Ness ,  Paul Melcher

IPC分类号： H01S3/22 ,  H01S3/04 ,  H01S3/13 ,  H01S3/10 ,  H01S3/00 ,  H01S3/097 ,  H01S3/223

CPC分类号： H01S3/097 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/10038 ,  H01S3/1055 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2333 ,  H01S3/2366

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

公开(公告)号：US20050018739A1

公开(公告)日：2005-01-27

申请号：US10922692

申请日：2004-08-20

申请人： Alexander Ershov ,  Richard Ness

发明人： Alexander Ershov ,  Richard Ness

IPC分类号： H01S3/097 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2333 ,  H01S3/2366

摘要： Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber.

公开(公告)号：US20060222034A1

公开(公告)日：2006-10-05

申请号：US11095976

申请日：2005-03-31

申请人： Richard Ujazdowski ,  Richard Ness ,  J. Algots ,  Vladimir Fleurov ,  Frederick Palenschat ,  Walter Gillespie ,  Bryan Moosman ,  Thomas Steiger ,  Brett Smith ,  Thomas McKelvey

发明人： Richard Ujazdowski ,  Richard Ness ,  J. Algots ,  Vladimir Fleurov ,  Frederick Palenschat ,  Walter Gillespie ,  Bryan Moosman ,  Thomas Steiger ,  Brett Smith ,  Thomas McKelvey

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： H01S3/036 ,  H01F3/10 ,  H01F27/22 ,  H01F27/266 ,  H01F38/10 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/225 ,  H01S3/2308

摘要： A high pulse repetition rate gas discharge laser system pulse power system magnetic reactor may comprise a housing comprising a core containing compartment between an inner wall of the housing, an outer wall and a bottom wall of the housing; a cooling mechanism operative to withdraw heat from the at least one of the inner wall, outer wall and bottom of the housing; at least one two magnetic cores contained within the core containing compartment; a cooling fin disposed between each of the at least two magnetic cores; and a thermal conductivity enhancement mechanism intermediate at least one of each respective cooling fin and each respective core and a respective one of the inner wall, the outer wall or the bottom wall, the thermal conductivity enhancement mechanism comprising a band comprising a plurality of torsion spring or leaf spring elements.

摘要翻译： 高脉冲重复率气体放电激光系统脉冲功率系统磁反应器可以包括壳体，该壳体包括在壳体的内壁，外壁和壳体的底壁之间的容纳核心的隔间; 冷却机构，用于从壳体的内壁，外壁和底部中的至少一个中提取热量; 至少一个两个磁芯包含在所述芯容纳室内; 设置在所述至少两个磁芯中的每一个之间的冷却翅片; 以及在每个相应的冷却翅片和每个相应的芯部以及内壁，外壁或底壁中的相应的一个中的至少一个的热导率增强机构，所述热导率增强机构包括包括多个扭转弹簧 或板簧元件。

公开(公告)号：US20060251135A1

公开(公告)日：2006-11-09

申请号：US11482339

申请日：2006-07-06

申请人： Alexander Ershov ,  Richard Ness

发明人： Alexander Ershov ,  Richard Ness

IPC分类号： H01S3/10 ,  H01S3/13 ,  H01S3/22 ,  H01S3/223

CPC分类号： H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2333 ,  H01S3/2366

摘要： Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber.

公开(公告)号：US20070071047A1

公开(公告)日：2007-03-29

申请号：US11300979

申请日：2005-12-15

申请人： Chaofeng Huang ,  Paul Melcher ,  Richard Ness

发明人： Chaofeng Huang ,  Paul Melcher ,  Richard Ness

IPC分类号： H01S3/04 ,  H01S3/00 ,  H01S3/22 ,  H01S3/223

CPC分类号： H01S3/097 ,  H01S3/04 ,  H01S3/09702 ,  H01S3/0975 ,  H01S3/225 ,  H03K3/57 ,  H03K17/127 ,  H03K17/567 ,  H03K17/6872 ,  H03K17/785

摘要： A method and apparatus for operating a very high repetition gas discharge laser system magnetic switch pulsed power system is disclosed, which may comprise a solid state switch, a charging power supply electrically connected to one side of the solid state switch; a charging inductor electrically connected to the other side of the solid state switch; a deque circuit electrically in parallel with the solid state switch comprising a deque switch; a peaking capacitor electrically connected to the charging inductor, a peaking capacitor charging control system operative to charge the peaking capacitor by opening the deque switch and leaving the solid state switch open and then shutting the solid state switch. The solid state switch may comprise a plurality of solid state switches electrically in parallel.

摘要翻译： 公开了一种用于操作非常高重复气体放电激光系统磁开关脉冲功率系统的方法和装置，其可以包括固态开关，电连接到固态开关的一侧的充电电源; 充电电感器电连接到固态开关的另一侧; 与固态开关并联电路的德克电路，其包括德克式开关; 与充电电感器电连接的峰值电容器，峰值电容器充电控制系统，其操作以通过打开所述开关开关并使固态开关断开并且然后关断所述固态开关来对所述峰值电容器充电。 固态开关可以并联电连接多个固态开关。