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    Laser chamber with fully integrated electrode feedthrough main insulator
    2.
    发明授权
    Laser chamber with fully integrated electrode feedthrough main insulator 有权
    具有完全集成电极馈通主绝缘体的激光室

    公开(公告)号：US06208674B1

    公开(公告)日：2001-03-27

    申请号：US09386938

    申请日：1999-08-31

    Applicant: R. Kyle Webb ,  William N. Partlo

    Inventor： R. Kyle Webb ,  William N. Partlo

    IPC: H01S322

    CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70558 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/225

    Abstract: A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.

    Abstract translation: 气体放电激光室的馈通结构通过密封的气体外壳的壁将电力传导到外壳内的单件电极。 馈通结构包括大于电极的单件集成主绝缘体。 主绝缘体在电极和外壳壁之间被压缩。 在电极和单件绝缘体之间形成界面的表面是绝缘体，并且壁都非常光滑，以允许部件随着室温度变化而膨胀和收缩。 馈通结构还为电极提供机械支撑和对准，并且包括用于防止馈通结构周围的气体泄漏的密封件。

    Cross-flow blower with braces
    4.
    发明授权
    Cross-flow blower with braces 失效
    带大括弧的横流鼓风机

    公开(公告)号：US5870420A

    公开(公告)日：1999-02-09

    申请号：US912737

    申请日：1997-08-18

    Applicant: R. Kyle Webb

    Inventor： R. Kyle Webb

    IPC: F04D17/04 ,  F04D29/28 ,  F04D29/62 ,  H01S3/036 ,  H01S3/097 ,  H01S3/22

    CPC classification number: H01S3/036 ,  F04D17/04

    Abstract: A trussed cross-flow blower comprising truss elements on the inside of a cylindrically-shaped cross-flow blower element form at least three trusses which provide rigidity to the blower element. Preferably three trusses are provided, and they are located at radial 120.degree. spacings.

    Abstract translation: 包括在圆柱形横流鼓风机元件的内侧上的桁架元件的桁架横流鼓风机形成至少三个提供鼓风机元件的刚性的桁架。 优选地，提供三个桁架，并且它们位于径向120°间隔处。

    Gas discharge laser light source beam delivery unit
    5.
    发明授权
    Gas discharge laser light source beam delivery unit 有权
    气体放电激光光源射束单元

    公开(公告)号：US07190707B2

    公开(公告)日：2007-03-13

    申请号：US10739961

    申请日：2003-12-17

    Applicant: Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

    Inventor： Palash P. Das ,  Khurshid Ahmed ,  Gregory Francis ,  Holger Glatzel ,  Alexei Lukashev ,  Jeremy Tyler ,  R. Kyle Webb

    IPC: H01S3/22

    CPC classification number: B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/04 ,  G01J1/0418 ,  G01J1/4257 ,  G01J2001/0285 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

    Abstract: A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.

    Abstract translation: 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光光脉冲束传送 从气体放电激光器的输出拍摄到使用包含在输出激光脉冲光束中的光的工作装置的输入; 可操作地连接到射束输送罩的清洗机构; 外壳内的原位波束参数监视和调节机构，包括可伸缩的豆重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在外壳内的光束衰减器单元，其可调节地安装在外壳内用于定位在光束输送光点内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

    Discharge produced plasma EUV light source
    6.
    发明授权
    Discharge produced plasma EUV light source 有权

    公开(公告)号：US07180081B2

    公开(公告)日：2007-02-20

    申请号：US10742233

    申请日：2003-12-18

    Applicant: John Walker ,  R. Kyle Webb ,  Oleh Khodykin

    Inventor： John Walker ,  R. Kyle Webb ,  Oleh Khodykin

    IPC: H01J65/04

    CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70908 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H01S3/005 ,  H01S3/225 ,  H05G2/005 ,  H05H1/06

    Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

    Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
    7.
    发明授权
    Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly 有权
    带磁轴承的气体放电激光器和用于风扇驱动组件的磁阻中心

    公开(公告)号：US06104735A

    公开(公告)日：2000-08-15

    申请号：US290851

    申请日：1999-04-13

    Applicant: R. Kyle Webb

    Inventor： R. Kyle Webb

    IPC: F16C32/04 ,  G03F7/20 ,  H01S3/036 ,  H01S3/225 ,  H01S3/00

    CPC classification number: G03F7/708 ,  F16C32/047 ,  H01S3/036

    Abstract: The present invention provides an electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported by an active radial magnetic bearing system and driven by a brushless DC motor in which the rotor of the motor and the rotors of at least two radial bearings are sealed within the gas environment of the laser cavity and the motor stator and the coils of the bearing magnets are located outside the gas environment. No thrust bearing is provided. Axial positioning of the shaft is provided by reluctance centering produced by the at least two radial magnetic bearings and the brushless DC motor. In a preferred embodiment the motor stator is larger in the axial direction than the rotor to increase the magnetic centering effect.

    Abstract translation: 本发明提供了一种具有激光腔的放电气体激光器，其中包含激光气体和用于循环激光气体的风扇。 风扇由主动径向磁轴承系统支撑，由无刷直流电动机驱动，其中电动机的转子和至少两个径向轴承的转子被密封在激光腔和电动机定子的气体环境中 轴承磁体的线圈位于气体环境之外。 没有提供推力轴承。 通过由至少两个径向磁轴承和无刷直流电动机产生的磁阻定心来提供轴的轴向定位。 在优选实施例中，电动机定子在轴向上比转子大，以增加磁对中效果。

    Lithography laser with beam delivery and beam pointing control
    8.
    发明授权
    Lithography laser with beam delivery and beam pointing control 失效
    光束激光器具有光束传递和光束指向控制

    公开(公告)号：US07230964B2

    公开(公告)日：2007-06-12

    申请号：US10425361

    申请日：2003-04-29

    Applicant: Plash P. Das ,  R. Kyle Webb ,  Marco Giovanardi ,  Gregory Francis ,  Huckleberry B. Dorn ,  Kyle P. Erlandsen ,  John W. Nelson ,  Richard L. Sandstrom ,  Alexander I. Ershov

    Inventor： Plash P. Das ,  R. Kyle Webb ,  Marco Giovanardi ,  Gregory Francis ,  Huckleberry B. Dorn ,  Kyle P. Erlandsen ,  John W. Nelson ,  Richard L. Sandstrom ,  Alexander I. Ershov

    IPC: H01S3/22 ,  G21G5/00

    CPC classification number: G03F7/7055 ,  G02B26/0816 ,  G02B27/0972 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70058 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/136 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2333 ,  H01S3/2366

    Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

    Abstract translation: 本发明提供了一种向生产线机器输送光束的模块化高重复率紫外线气体放电激光光源。 该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。 优选实施例包括用于光束衰减的设备，用于自动反馈光束对准的设备和用于在安装和维护期间精确的光学模块定位的设备。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

    Applanation lens and method for ophthalmic surgical applications
    9.
    发明授权
    Applanation lens and method for ophthalmic surgical applications 有权
    用于眼科外科应用的矫形镜片和方法

    公开(公告)号：US06899707B2

    公开(公告)日：2005-05-31

    申请号：US09896429

    申请日：2001-06-29

    Applicant: Gordon Scott Scholler ,  R. Kyle Webb

    Inventor： Gordon Scott Scholler ,  R. Kyle Webb

    IPC: A61B18/20 ,  A61B17/30 ,  A61F9/007 ,  A61F9/008 ,  A61F9/009 ,  A61F9/01 ,  A61B18/18

    CPC classification number: A61F9/009 ,  A61B2017/306 ,  A61F9/008 ,  A61F2009/00846

    Abstract: An improved applanation lens and method for use in an interface between a patient's eye and a surgical laser system does not discolor or lose light transmittance when subjected to gamma radiation. The improved applanation lens has an applanation surface configured to contact the eye upon application of a pressure. The lens is formed of high purity silicon dioxide (SiO2) with purity great enough to resist discoloration upon prolonged irradiation by high-energy radiation such as UV, x-rays, gamma rays or neutrons, and is preferably a fused silica.

    Abstract translation: 用于患者眼睛和手术激光系统之间的界面的改进的压平透镜和方法在经受伽马辐射时不会变色或失去透光性。 改进的压平透镜具有配置成在施加压力时与眼睛接触的压平表面。 透镜由纯度足够高的高纯度二氧化硅（SiO 2）形成，以在通过诸如UV，X射线，γ射线或中子的高能量辐射的长时间照射下抵抗变色，并且是 优选熔融二氧化硅。

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