摘要:
In order to compensate for variation in output of sensor elements 10, there is provided a compensating resistor 220 that has a resistance value reflected by correction information. The resistor 220 is connected in parallel with a VS cell 245 through paired electrode leads 236 and 237 and paired electrode pads 232 and 233. The paired electrode leads 236 and 237 are placed at a position electrically isolated from solid electrolyte substrates 120 and 140.
摘要:
A gas sensor element for detecting a specific gas component contained in a gas to be measured includes: a solid electrolyte layer; a first electrode disposed on the solid electrolyte layer; a second electrode disposed on the solid electrolyte layer; and a porous layer disposed on one of the first electrode and the second electrode such that the gas to be measured is introduced from the outside of said gas sensor element and passes through the porous layer to at least one of the first electrode and the second electrode. The porous layer includes: a first porous layer including a first ceramic porous body which does not include noble metal particles dispersed therein; and a second porous layer provided on the first porous layer and including a second ceramic porous body and noble metal particles dispersed therein.
摘要:
A gas sensor including: a gas sensing element including first and second ceramic layers. The first ceramic layer has a first through hole and a first through hole conductor covering an inner surface thereof. The first ceramic layer includes a first conductor which includes: a first peripheral conductive portion electrically connected to the first through hole conductor; a first lead portion that is narrower than the first peripheral conductive portion; and a first contact conductive portion that is wider than the first lead portion. The first peripheral conductive portion, the first lead portion and the first contact conductive portion are integrally formed and arranged in this order in a longitudinal direction. The second ceramic layer includes a second conductor electrically connected to at least the first contact conductive portion.
摘要:
In an oxygen sensor control apparatus, a CPU obtains a correction coefficient for calibrating the relation between output value of an oxygen sensor and oxygen concentration when a fuel cut operation is performed. When the amount of scavenging air (total supply amount of air) becomes equal to or greater than a predetermined amount in each fuel cut period, the CPU calculates an average output value Ipav from a plurality of output values (concentration corresponding values) Ipr of the oxygen sensor, from which values deviating from a predetermined range R1 have been removed. Subsequently, the CPU averages the values obtained in a plurality of fuel cut periods to thereby obtain a plural-time average output value Ipavf. The CPU obtains a correction coefficient for correcting the actual output value Ip of the oxygen sensor 20 on the basis of the Ipavf value and a previously set reference output value.
摘要:
A transparent board is positioned on a support board provided with a positioning mark, and a release material is provided. A semiconductor element is then positioned so that the electrode element faces upward, and the support board is then removed. An insulating resin is then formed on the release material so as to cover the semiconductor element; and a via, a wiring layer, an insulation layer, an external terminal, and a solder resist are then formed. The transparent board is then peeled from the semiconductor device through the use of the release material. A chip can thereby be mounted with high precision, there is no need to provide a positioning mark during mounting of the chip on the substrate in the manufacturing process, and the substrate can easily be removed. As a result, a semiconductor device having high density and a thin profile can be manufactured at low cost.
摘要:
There is provided an ink for printing a conductor pattern on a substrate, including platinum particles, wherein 70% or more of the platinum particles have a particle size of 0.05 to 0.5 μm. Even when the viscosity of the printing ink is controlled to a relatively low level for use in ink-jet printing process, it is possible by such particle size distribution control to prevent sedimentation of the platinum particles and excessive shrinkage of the conductor pattern due to sintering of the platinum particles during firing so that the conductor pattern can attain improved conduction characteristics.
摘要:
A wiring board including a built-in semiconductor element includes the semiconductor element, a peripheral insulating layer covering an outer peripheral side surface of the semiconductor element, an upper surface-side wiring provided on an upper surface side of the wiring board, and a lower surface-side wiring provided on a lower surface side of the wiring board. The semiconductor element includes a first wiring structure layer including a first wiring and a first insulating layer alternately provided on a semiconductor substrate, and a second wiring structure layer including a second wiring and a second insulating layer alternately provided on the first wiring structure layer. The upper surface-side wiring includes a wiring electrically connected to the first wiring via the second wiring. The second wiring is thicker than the first wiring and thinner than the upper surface-side wiring. The second insulating layer is formed of a resin material and is thicker than the first insulating layer.
摘要:
A semiconductor device includes a core substrate, and at least one insulating layer and at least one wiring layer that are disposed on a first surface and a second, opposite surface of the substrate. The semiconductor device includes a via disposed in the insulating layer and in the core substrate, and which connects the wiring layers to one another. The semiconductor device includes a semiconductor element mounted on the first surface, forming an electrode terminal that faces up. The semiconductor device includes a connecting portion that penetrates the insulating layer and directly connects the electrode terminal of the semiconductor element and the wiring layer on the first surface. A minimum wiring pitch of this wiring that of any wiring layer on the second surface.
摘要:
A nuclear reactor vessel structure includes an inner peripheral tube-shaped steel plate, an outer peripheral tube-shaped steel plate, and an intermediate tube-shaped steel plate disposed between the inner and outer peripheral tube-shaped steel plates, and is configured to support a nuclear reactor vessel on the inner peripheral side of a tube-shaped structure with concrete placed between the steel plates. The nuclear reactor vessel structure includes a support having a tube-shaped plate disposed on the inner peripheral side of the intermediate tube-shaped steel plate, and an annular plate which protrudes to the inner peripheral side of the tube-shaped plate and to which a connection section is affixed. The support is affixed to the concrete, which is placed between the inner peripheral and the intermediate tube-shaped steel plates, by first bar members, and the support is also affixed to the inner peripheral tube-shaped steel plate by second bar members.
摘要:
An object of the present invention is to provide a semiconductor device built-in substrate, which can be made thin and can suppress occurrence of warpage. The present invention provides a semiconductor substrate which is featured by including a first semiconductor device serving as a substrate, a second semiconductor device placed on the circuit surface side of the first semiconductor device in the state where the circuit surfaces of the first and second semiconductor devices are placed to face in the same direction, and an insulating layer incorporating therein the second semiconductor device, and which is featured in that a heat dissipation layer is formed at least between the first semiconductor device and the second semiconductor device, and in that the heat dissipation layer is formed on the first semiconductor device so as to extend up to the outside of the second semiconductor device.