公开(公告)号：US20250004368A1

公开(公告)日：2025-01-02

申请号：US18560005

申请日：2022-05-09

Applicant: XSYS GERMANY GmbH

Inventor： Patrick-Kurt Dannecker ,  Isabel Schlegel

IPC: G03F7/027 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/36 ,  G03F7/40

Abstract: A relief precursor includes a dimensionally stable support, and at least one photopolymer layer including at least one binder, at least one photoinitiator or photoinitiating system, and at least one component with at least one unsaturated group and at least one plasticizer. The at least one plasticizer is a bio-based plasticizer, and has a UV transmission at 365 nm of a solution of 5 wt % plasticizer in n-hexane of higher than 15%.

公开(公告)号：US20240427239A1

公开(公告)日：2024-12-26

申请号：US18731702

申请日：2024-06-03

Applicant: Inpria Corporation

Inventor： Robert E. Jilek ,  Christopher J. Reed

IPC: G03F7/027 ,  C08F30/04 ,  G03F7/004

Abstract: Organotin compositions suitable for radiation based patterning have ligands providing fluorinated groups and unsaturated carbon-carbon bonds, such as C═C bonds. The fluorinated groups and unsaturated carbon-carbon bonds may or may not be located on the same ligand. Blends of precursors with different ligands provide added flexibility with respect to precursor design. Fluorinated organometallic compounds can be represented by the formula RUFSn(OR′)3, wherein RUF is an organo group with 1 to 31 carbon atoms with at least one C═C bond and at least one fluorine atom bonded to a carbon, with the organo group forming a C—Sn bond, wherein R′ is an organo group with 1 to 10 carbon atoms. Precursors are suitable for solution based deposition or vapor based deposition.

公开(公告)号：US20240427238A1

公开(公告)日：2024-12-26

申请号：US18698428

申请日：2022-10-03

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Tetsuya KIMURA ,  Hirokazu NISHIMAKI

IPC: G03F7/027 ,  G03F7/004 ,  G03F7/025 ,  H01L21/311

Abstract: A resist underlayer film-forming composition improves an ability to fill patterns during baking by improving heat-reflowability of a polymer; a resist underlayer film being a baked product of a coating film formed from the resist underlayer film-forming composition; and a method for producing a semiconductor device includes a step of forming the resist underlayer film. The resist underlayer film-forming composition includes a compound of the following formula (A) or (B) and a solvent.

公开(公告)号：US12055851B2

公开(公告)日：2024-08-06

申请号：US17487515

申请日：2021-09-28

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Young Lee ,  Sundae Kim ,  Yeji Yang ,  Chaehyuk Ko ,  Ieju Kim ,  Arum Yu ,  Myungho Cho ,  Xinhui Feng ,  Jungsun Lee

IPC: G03F7/00 ,  G02B1/04 ,  G02B5/20 ,  G03F7/027 ,  H01L27/146

CPC classification number: G03F7/0007 ,  G02B1/04 ,  G03F7/027 ,  H01L27/14621 ,  G02B5/20

Abstract: A core-shell compound, a photosensitive resin composition including the same, a photosensitive resin layer produced using the photosensitive resin composition, a color filter including the photosensitive resin layer, and a CMOS image sensor including the color filter, the core-shell compound including a core represented by Chemical Formula 1; and a shell surrounding the core, the shell being represented by Chemical Formula 2:

公开(公告)号：US20240076471A1

公开(公告)日：2024-03-07

申请号：US18385951

申请日：2023-11-01

Applicant: STRATASYS, INC.

Inventor： Mingbo HE ,  Beth RUNDLETT

IPC: C08K3/36 ,  B29C64/135 ,  B33Y70/10 ,  C08F2/50 ,  C08L33/10 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/038

CPC classification number: C08K3/36 ,  B29C64/135 ,  B33Y70/10 ,  C08F2/50 ,  C08L33/10 ,  G03F7/0037 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/038 ,  C08F222/103 ,  Y10T428/31511

Abstract: Matrix-filled liquid radiation curable resin compositions for additive fabrication are described and claimed. Such resins include a cationically polymerizable component that is an aliphatic epoxide, a multifunctional (meth)acrylate component, a cationic photoinitiator, a free-radical photo initiator, and a matrix of inorganic fillers, wherein the matrix further constitutes prescribed ratios of at least one microparticle constituent and at least one nanoparticle constituent. Also described and claimed is a process for using the matrix-filled liquid radiation curable resins for additive fabrication to create three dimensional parts, and the three-dimensional parts made from the liquid radiation curable resins for additive fabrication.

公开(公告)号：US11809077B2

公开(公告)日：2023-11-07

申请号：US17198749

申请日：2021-03-11

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Thomas Cardolaccia ,  Jason A. DeSisto ,  Choong-Bong Lee ,  Mingqi Li ,  Tomas Marangoni ,  Chunyi Wu ,  Cong Liu ,  Gregory P. Prokopowicz

IPC: G03F7/004 ,  C08F220/28 ,  C08F220/18 ,  G03F7/027

CPC classification number: G03F7/0045 ,  C08F220/18 ,  C08F220/281 ,  G03F7/027

Abstract: A photoresist composition comprises a first polymer formed by free radical polymerization. The first polymer comprises polymerized units formed from a monomer that comprises an ethylenically unsaturated double bond and an acid-labile group; a photoacid generator; a quencher of formula (1):




and a solvent.

公开(公告)号：US11762289B2

公开(公告)日：2023-09-19

申请号：US16155691

申请日：2018-10-09

Applicant: Samsung SDI Co., Ltd.

Inventor： Jinsuop Youn ,  Misun Kim ,  Hong Jeong Yu ,  Bumjin Lee ,  Yonghee Kang ,  Dongjun Kim ,  Byeonggeun Son ,  Jihyeon Yim ,  Mi Jeong Choi ,  Jonggi Kim ,  Minjee Park ,  Hojeong Paek ,  Woo Jung Shin ,  Young Woong Jang

IPC: G03F7/004 ,  C09K11/02 ,  C09K11/88 ,  G03F7/00 ,  G03F7/033 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/031 ,  G03F7/038 ,  G03F7/027 ,  G03F7/105 ,  C09D11/30 ,  B82Y35/00 ,  B82Y20/00 ,  B82Y30/00

CPC classification number: G03F7/0048 ,  C09D11/30 ,  C09K11/025 ,  C09K11/883 ,  G03F7/0007 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/031 ,  G03F7/033 ,  G03F7/038 ,  G03F7/105 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/38 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y35/00

Abstract: A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A′) a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.

公开(公告)号：US20230213857A1

公开(公告)日：2023-07-06

申请号：US17417634

申请日：2020-02-13

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Satoshi KAMIBAYASHI ,  Takafumi ENDO ,  Yuto HASHIMOTO ,  Yuki ENDO ,  Takahiro KISHIOKA ,  Rikimaru SAKAMOTO

IPC: G03F7/027 ,  G03F7/031 ,  G03F7/32 ,  G03F7/20 ,  G03F7/11 ,  G03F7/38

CPC classification number: G03F7/0275 ,  G03F7/031 ,  G03F7/322 ,  G03F7/20 ,  G03F7/11 ,  G03F7/38

Abstract: Provided is a resist underlayer film-forming composition that is used in a lithographic process in semiconductor manufacturing and has excellent storage stability. The resist underlayer film-forming composition contains: a polymer having a disulfide bond in a main chain; a radical trapping agent; and a solvent. The radical trapping agent is preferably a compound having a ring structure or a thioether structure. The ring structure is preferably an aromatic ring structure having 6-40 carbon atoms or a 2,2,6,6-tetramethylpiperidine structure.

公开(公告)号：US11680172B2

公开(公告)日：2023-06-20

申请号：US15762383

申请日：2017-02-14

Applicant: LG CHEM, LTD.

Inventor： Jin Seok Byun ,  Jae Young Kim ,  Boo Kyung Kim ,  Seok Hoon Jang ,  Yeong Rae Chang

IPC: C09D5/00 ,  C09D4/00 ,  C09D7/40 ,  C09D7/62 ,  C08J7/04 ,  G02B1/111 ,  G02B1/14 ,  G03F7/004 ,  G03F7/027 ,  G03F7/038 ,  G03F7/075 ,  C08J7/043 ,  C08J7/044 ,  C08J7/046 ,  C08K9/00 ,  G03F7/09 ,  C08K3/36

CPC classification number: C09D5/006 ,  C08J7/042 ,  C08J7/043 ,  C08J7/044 ,  C08J7/046 ,  C09D4/00 ,  C09D7/62 ,  C09D7/67 ,  G02B1/111 ,  G02B1/14 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0755 ,  C08J2301/12 ,  C08J2483/07 ,  C08K3/36 ,  C08K9/00 ,  G03F7/091 ,  C09D4/00 ,  C08F230/085

Abstract: The present invention relates to a photocurable coating composition for forming a low refractive layer, a method for preparing an antireflection film using the photocurable coating composition, and an anti-reflective film prepared by using the photocurable coating composition. According to the present invention, a low refractive layer is formed of a photocurable coating composition containing two or more types of photo-polymerizable compounds, a photoinitiator, surface-treated hollow inorganic nanoparticles, and surface-treated solid inorganic nanoparticles.

公开(公告)号：US11650498B2

公开(公告)日：2023-05-16

申请号：US16309533

申请日：2017-06-27

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Daniel J. Skamser ,  Carsten Franke

IPC: B33Y70/00 ,  B33Y10/00 ,  G03F7/031 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027

CPC classification number: G03F7/031 ,  B33Y70/00 ,  G03F7/0037 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/027 ,  B33Y10/00

Abstract: The present disclosure provides a method for building a three-dimensional object using a printable composition including high viscosity polymerizable components. The method includes the steps of a) providing a printable composition comprising a high viscosity polymerizable component and a temporary solvent; b) selectively curing the printable composition to form an article representing the shape of the three-dimensional object; and c) removing a substantial amount of the temporary solvent from the article. The method is particularly well suited to making an orthodontic clear tray aligner. Also disclosed are a variety of printable compositions including high viscosity polymerizable components, such as polyurethane methacrylates, and temporary solvents.