SUBSTRATE PROCESSING APPARATUS
    5.
    发明公开

    公开(公告)号:US20240150500A1

    公开(公告)日:2024-05-09

    申请号:US18500087

    申请日:2023-11-01

    IPC分类号: C08F2/34 C08F2/00 C08G85/00

    CPC分类号: C08F2/34 C08F2/008 C08G85/008

    摘要: A substrate processing apparatus includes a processing container; a stage on which a substrate is placed, the stage being provided in the processing container; a gas supply provided at a position facing the stage and configured to supply a first processing gas containing a first monomer and a second processing gas containing a second monomer into the processing container to form a film of a polymer on the substrate; and a driver configured to move the stage so as to change a distance between the gas supply and the stage. The gas supply is configured to supply the first processing gas and the second processing gas into a space between the gas supply and the stage from an outside of a region on the stage in which the substrate is placed, when viewed in a direction from the gas supply toward the stage.