Manufacturable laser diodes on a large area gallium and nitrogen containing substrate

    公开(公告)号:US11715927B2

    公开(公告)日:2023-08-01

    申请号:US17552261

    申请日:2021-12-15

    CPC classification number: H01S5/0217 H01S5/0203 H01S5/34333 H01S2304/12

    Abstract: The present disclosure provides a method and structure for producing large area gallium and nitrogen engineered substrate members configured for the epitaxial growth of layer structures suitable for the fabrication of high performance semiconductor devices. In a specific embodiment the engineered substrates are used to manufacture gallium and nitrogen containing devices based on an epitaxial transfer process wherein as-grown epitaxial layers are transferred from the engineered substrate to a carrier wafer for processing. In a preferred embodiment, the gallium and nitrogen containing devices are laser diode devices operating in the 390 nm to 425 nm range, the 425 nm to 485 nm range, the 485 nm to 550 nm range, or greater than 550 nm.

    Safe laser light
    99.
    发明授权

    公开(公告)号:US11316321B1

    公开(公告)日:2022-04-26

    申请号:US16777355

    申请日:2020-01-30

    Abstract: The present invention provides a device and method for a laser based light source using a combination of laser diode or waveguide gain element excitation source based on gallium and nitrogen containing materials and wavelength conversion phosphor materials designed for inherent safety. In this invention a violet, blue, or other wavelength laser diode source based on gallium and nitrogen materials is closely integrated with phosphor materials, such as yellow phosphors, to form a compact, high-brightness, and highly-efficient, light source with closed loop design features to yield the light source as an eye safe light source.

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