Abstract:
A touch liquid crystal display is disclosed. The display includes a TFT array substrate, and an opposite substrate opposite to the TFT array substrate. The TFT array substrate and the opposite substrate collectively define a display area and a non-display area. In addition, the opposite substrate includes a first substrate, a plurality of first electrodes, and a plurality of second electrodes, where the plurality of first electrodes are located in the display area of the first substrate, and the plurality of second electrodes are located in the non-display area of the first substrate. The TFT array substrate includes a second substrate, and a plurality of third electrodes, where the third electrodes are located in the display area of the second substrate and are opposite the first electrodes, and where the third electrodes are common electrodes of the TFT array substrate.
Abstract:
An electrochromic device (1) comprises an electrochromic layered structure (10) having a first substrate sheet (21), a second substrate sheet (22), a first (23) and a second (24) electron conducting layer at least partially covering a respective substrate sheet, an electrochromic layer (25) and a counter electrode layer (26) at least partially covering a respective electron conducting layer and an electrolyte layer (30) laminated between and at least partially covering the first electrochromic layer and the counter electrode layer. The electrochromic layered structure also has an area (51, 52) in which the electrochromic layer or the counter electrode layer is not covered by the electrolyte layer. An electrode (41, 42) is soldered to the respective electron conducting layer through the electrochromic layer or the counter electrode layer.
Abstract:
A semiconductor device is provided with a plurality of protrusions which are made of a resin and which protrude higher than electrodes, and conductive layers which are electrically connected to the electrodes and which cover the top surfaces of the protrusions. A method for manufacturing the semiconductor device includes a step of applying a layer of the resin to the semiconductor device except for the electrodes, a step of patterning the conductive layers on the electrodes and the layer of the resin in accordance with the protrusions, and a step of removing the layer of the resin located between the conductive layers by the use of the patterned conductive layers as masks so as to form the protrusions.
Abstract:
A novel display panel excellent in convenience or reliability, or a novel display panel with excellent mountability on a housing is provided. The display panel includes a terminal, a first base that supports the terminal, the second base that has a region overlapping with the first base, a bonding layer that bonds the first base to the second base, a display element that is between the first base and the second base and is electrically connected to the terminal, and an insulating layer that is in contact with the first base, the second base, and the bonding layer. The insulating layer includes an opening in a region overlapping with the display element.
Abstract:
An object of the present invention is to protect exposed inspection pads with a conductive tape when the application of resin is ceased and to enhance the reliability of the inspection pads. A liquid crystal display device is provided with a transparent electrode formed on a superficial side of a CF board, a grounded electrode, an inspection pad and a switching device between the inspection pad and a signal line or a scanning line respectively formed in a terminal area a TFT board and a conductive tape that electrically connects the transparent electrode of the CF board, the grounded electrode and the inspection pad respectively of the TFT board.
Abstract:
This invention aims at reducing the probability of short-circuiting between terminals in a display device in which an IC driver is connected by COG. Terminals for connection with the IC driver are formed in a terminal region of a TFT substrate. The terminals are each comprised of a terminal metal, a first through-hole formed in a first insulation film, a second through-hole formed in a second insulation film, a first ITO formed in the first through-hole and being in contact with the terminal metal, and a second ITO formed over the first ITO. The second ITO is formed within an area where the second ITO is in contact with the first ITO but is not formed outside the second through-hole. This ensures that the distance between the ITOs of the adjacent terminals can be enlarged, whereby the probability of short-circuiting between the terminals can be lowered.
Abstract:
A pixel structure and a manufacturing method thereof are provided. The pixel structure includes a substrate, a scan line, a data line, a first insulating layer, an active device, a second insulating layer, a common electrode and a first pixel electrode. The data line crossed to the scan line is disposed on the substrate and includes a linear transmitting part and a cross-line transmitting part. The first insulating layer covering the scan line and the linear transmitting part is disposed between the scan line and the cross-line transmitting part. The active device, including a gate, an oxide channel, a source and a drain, is connected to the scan line and the data line. The second insulating layer is disposed on the oxide channel and the linear transmitting part. The common electrode is disposed above the linear transmitting part. The first pixel electrode is connected to the drain.
Abstract:
A display panel including an array substrate and a COF substrate is provided. The COF is provided with a plurality of welded lead lines. The array substrate includes a metal layer disposed on a surface of the substrate, a silicon nitride layer disposed on a surface of the metal layer, and a plurality of terminal wires disposed in a spaced arrangement in a welding region on a surface of the second silicon nitride layer. The welding region between the adjacent terminal wires is provided with through holes, which expose the metal layer. The risk of corrosion and breakage of the welded lead lines on the COF substrate is effectively reduced.
Abstract:
A display device and manufacturing method thereof are disclosed. In one aspect, the display device includes a substrate including a display area and a peripheral area surrounding the display area, wherein the display area includes a plurality of pixels configured to display images and a plurality of inspection pads formed in the peripheral area and configured to transmit a plurality of inspection signals to the pixels. Each of the inspection pads includes a poly resistor formed over the substrate, at least one insulating layer formed over the poly resistor, first and second conductive wires formed over the insulating layer and respectively connected to opposing ends of the poly resistor, and a protective layer formed over the insulating layer and substantially overlapping the poly resistor.
Abstract:
In a liquid crystal display device of an IPS system, to realize reduction of manufacturing cost and improvement of yield by decreasing the number of steps for manufacturing a TFT. A channel etch type bottom gate TFT structure, where patterning of a source region and a drain region and patterning of a source wiring and a pixel electrode are carried out by the same photomask.