ACCELERATION SENSOR AND FABRICATION METHOD THEREOF
    116.
    发明申请
    ACCELERATION SENSOR AND FABRICATION METHOD THEREOF 有权
    加速度传感器及其制造方法

    公开(公告)号:US20080302184A1

    公开(公告)日:2008-12-11

    申请号:US11946507

    申请日:2007-11-28

    IPC分类号: G01P15/125 G01R3/00

    摘要: First and second semiconductor layers are attached to each other with an insulation layer sandwiched therebetween. An acceleration sensor device is formed in the first semiconductor layer. A control device for controlling the acceleration sensor device is formed on the second semiconductor layer. Through holes are formed in the second semiconductor layer, and an insulation layer is formed to cover the wall surfaces of the through holes. Through interconnections are formed within the through holes for electrically connecting the acceleration sensor device and the control device to each other. Accordingly, it is possible to obtain an acceleration sensor having excellent detection accuracy while having a reduced size, and a fabrication method thereof.

    摘要翻译: 第一和第二半导体层通过夹在其间的绝缘层彼此附接。 在第一半导体层中形成加速度传感器装置。 用于控制加速度传感器装置的控制装置形成在第二半导体层上。 在第二半导体层中形成通孔,并且形成绝缘层以覆盖通孔的壁表面。 通孔之间形成有用于将加速度传感器装置和控制装置彼此电连接的通孔。 因此,能够获得尺寸小的检测精度优异的加速度传感器及其制造方法。

    Electron beam apparatus and a device manufacturing method by using said electron beam apparatus
    118.
    发明授权
    Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 有权
    电子束装置和使用所述电子束装置的装置制造方法

    公开(公告)号:US07361895B2

    公开(公告)日:2008-04-22

    申请号:US11304680

    申请日:2005-12-16

    IPC分类号: H01J49/44

    摘要: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

    摘要翻译: 电子束装置,其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上,并且从样品发出的二次电子被引导到检测器中,该装置还包括用于优化照射的装置 从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器,其偏转并引导沿特定方向发射的电子束以与光学器件对准 电子束装置的轴方向,由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实,在特定方向上发射的电子束相对于光轴成一定角度 电子束发射与光轴方向不对准。

    ELECTRON BEAM APPARATUS AND AN ABERRATION CORRECTION OPTICAL APPARATUS
    119.
    发明申请
    ELECTRON BEAM APPARATUS AND AN ABERRATION CORRECTION OPTICAL APPARATUS 有权
    电子束装置和抛光校正光学装置

    公开(公告)号:US20080067377A1

    公开(公告)日:2008-03-20

    申请号:US11760235

    申请日:2007-06-08

    IPC分类号: G21K7/00

    摘要: An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a 1/4 plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

    摘要翻译: 一种用于提供诸如半导体晶片的样品的评估的电子束装置,其包括具有不大于0.1μm的最小线宽的微量图案,具有高生产量。 由电子枪产生的一次电子束照射在样品上,从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和拉伸电极3,阴极的电子发射表面1a限定凹面。 拉制电极3具有由面对阴极的电子发射表面1a的第二球体的部分外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同大小的多极维恩滤波器,其布置成使得它们的中心分别与像差校正光学中的物平面图像平面段的1/4平面位置和¾平面位置对准 装置和具有分别设置在像差校正光学装置中的物平面位置,中间图像形成平面位置和图像平面位置的双向焦点的光学元件。

    Steering lock
    120.
    发明授权
    Steering lock 有权
    转向锁

    公开(公告)号:US07328596B2

    公开(公告)日:2008-02-12

    申请号:US11188944

    申请日:2005-07-25

    IPC分类号: B60R25/02 E05B63/00

    摘要: A steering lock that is easy to assemble but difficult for an automobile thief to dismantle. The steering lock includes a cover on which a support structure for supporting a lock mechanism is integrally formed. The lock mechanism is attached to the cover to assemble a first subunit. A steering lock ECU is attached to an ECU case to assemble a second subunit. The first subunit is attached to the second subunit to assemble a lock unit. The lock unit is attached to the housing. A bolt fastens the lock unit and the housing to each other. A second connector is then attached to the housing.

    摘要翻译: 一种易于组装但难以将汽车小偷拆卸的转向锁。 转向锁包括盖,其上一体地形成有用于支撑锁定机构的支撑结构。 锁定机构附接到盖子以组装第一子单元。 转向锁定ECU附接到ECU壳体以组装第二子单元。 第一子单元附接到第二子单元以组装锁单元。 锁定单元连接到外壳。 螺栓将锁定单元和壳体彼此紧固。 然后将第二连接器附接到壳体。