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公开(公告)号:US20100171197A1
公开(公告)日:2010-07-08
申请号:US12348622
申请日:2009-01-05
申请人: Hung-Pin Chang , Kuo-Ching Hsu , Chen-Shien Chen , Wen-Chih Chiou , Chen-Hua Yu
发明人: Hung-Pin Chang , Kuo-Ching Hsu , Chen-Shien Chen , Wen-Chih Chiou , Chen-Hua Yu
CPC分类号: H01L23/481 , H01L21/6835 , H01L24/11 , H01L24/13 , H01L24/14 , H01L2221/6834 , H01L2224/03912 , H01L2224/0401 , H01L2224/05009 , H01L2224/05558 , H01L2224/1147 , H01L2224/13009 , H01L2224/13025 , H01L2924/00013 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01019 , H01L2924/01022 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01073 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/014 , H01L2924/04953 , H01L2924/12042 , H01L2924/14 , H01L2924/15788 , H01L2924/19041 , H01L2924/19043 , H01L2224/13099 , H01L2924/00
摘要: An isolation structure for stacked dies is provided. A through-silicon via is formed in a semiconductor substrate. A backside of the semiconductor substrate is thinned to expose the through-silicon via. An isolation film is formed over the backside of the semiconductor substrate and the exposed portion of the through-silicon via. The isolation film is thinned to re-expose the through-silicon via, and conductive elements are formed on the through-silicon via. The conductive element may be, for example, a solder ball or a conductive pad. The conductive pad may be formed by depositing a seed layer and an overlying mask layer. The conductive pad is formed on the exposed seed layer. Thereafter, the mask layer and the unused seed layer may be removed.
摘要翻译: 提供了一种用于堆叠模具的隔离结构。 在半导体衬底中形成贯通硅通孔。 半导体衬底的背面变薄以暴露通硅通孔。 在半导体衬底的背面和透硅通孔的暴露部分之后形成隔离膜。 隔离膜被稀薄以重新暴露通硅通孔,并且导电元件形成在穿硅通孔上。 导电元件可以是例如焊球或导电垫。 可以通过沉积种子层和覆盖掩模层来形成导电焊盘。 导电焊盘形成在暴露的种子层上。 此后,可以去除掩模层和未使用的种子层。
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122.
公开(公告)号:US20100068866A1
公开(公告)日:2010-03-18
申请号:US12539374
申请日:2009-08-11
申请人: Chia-Lin Yu , Chen-Hua Yu , Ding-Yuan Chen , Wen-Chih Chiou
发明人: Chia-Lin Yu , Chen-Hua Yu , Ding-Yuan Chen , Wen-Chih Chiou
IPC分类号: H01L21/768
CPC分类号: H01L21/02365 , H01L21/02104 , H01L21/0237 , H01L21/02381 , H01L21/02458 , H01L21/02491 , H01L21/02502 , H01L21/02538 , H01L21/02639 , H01L21/02642 , H01L21/02645 , H01L29/12
摘要: A method of forming a circuit structure includes providing a substrate; forming recesses in the substrate; forming a mask layer over the substrate, wherein the mask layer covers non-recessed portions of the substrate, with the recesses exposed through openings in the mask layer; forming a buffer/nucleation layer on exposed portions of the substrate in the recesses; and growing a group-III group-V (III-V) compound semiconductor material from the recesses until portions of the III-V compound semiconductor material grown from the recesses join each other to form a continuous III-V compound semiconductor layer.
摘要翻译: 形成电路结构的方法包括提供基板; 在基板上形成凹部; 在所述基板上形成掩模层,其中所述掩模层覆盖所述基板的非凹部,所述凹部通过所述掩模层中的开口暴露; 在所述凹部中的所述基板的暴露部分上形成缓冲/成核层; 以及从所述凹部生长第III族V族化合物半导体材料,直到从所述凹部生长的所述III-V族化合物半导体材料的部分相互连接形成连续的III-V族化合物半导体层。
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公开(公告)号:US20100059779A1
公开(公告)日:2010-03-11
申请号:US12547428
申请日:2009-08-25
申请人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
发明人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
IPC分类号: H01L33/00
摘要: A light-emitting diode (LED) device is provided. The LED device has a substrate and an LED structure overlying the substrate. Embedded elements are embedded within one or more layers of the LED structure. In an embodiment, the embedded elements include a dielectric material extending through the LED structure such that the embedded elements are surrounded by the LED structure. In another embodiment, the embedded elements only extend through an upper layer of the LED structure, or alternatively, partially through the upper layer of the LED structure. Another conductive layer may be formed over the upper layer of the LED structure and the embedded elements.
摘要翻译: 提供了一种发光二极管(LED)装置。 LED器件具有衬底和覆盖衬底的LED结构。 嵌入式元件嵌入LED结构的一层或多层内。 在一个实施例中,嵌入元件包括延伸穿过LED结构的电介质材料,使得嵌入元件被LED结构包围。 在另一个实施例中,嵌入式元件仅延伸穿过LED结构的上层,或者部分地穿过LED结构的上层。 另外的导电层可以形成在LED结构的上层和嵌入元件上。
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公开(公告)号:US20100038661A1
公开(公告)日:2010-02-18
申请号:US12269497
申请日:2008-11-12
申请人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
发明人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
CPC分类号: H01L33/16 , H01L33/0079 , H01L33/10
摘要: A light-emitting diode (LED) device is provided. The LED device has a substrate, a reflective structure over the substrate, and an LED structure over the reflective structure. The reflective structure is formed of non-metallic materials. In one embodiment, the reflective structure is formed of alternating layers of different non-metallic materials having different refractive indices. In another embodiment, the reflective structure is formed of alternating layers of high-porosity silicon and low-porosity silicon. In yet another embodiment, the reflective structure is formed of silicon dioxide, which may allow the use of fewer layers. The reflective structure may be formed directly on the same substrate as the LED structure or formed on a separate substrate and then bonded to the LED structure.
摘要翻译: 提供了一种发光二极管(LED)装置。 LED器件具有衬底,衬底上的反射结构以及反射结构上的LED结构。 反射结构由非金属材料形成。 在一个实施例中,反射结构由具有不同折射率的不同非金属材料的交替层形成。 在另一个实施例中,反射结构由高孔隙率硅和低孔隙率硅的交替层形成。 在另一个实施例中,反射结构由二氧化硅形成,其可以允许使用更少的层。 反射结构可以直接形成在与LED结构相同的基板上,或者形成在单独的基板上,然后结合到LED结构。
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公开(公告)号:US20090267105A1
公开(公告)日:2009-10-29
申请号:US12235269
申请日:2008-09-22
申请人: Chen-Hua Yu , Ding-Yuan Chen , Wen-Chih Chiou
发明人: Chen-Hua Yu , Ding-Yuan Chen , Wen-Chih Chiou
IPC分类号: H01L33/00
CPC分类号: H01L33/42 , H01L33/005 , H01L33/20 , H01L33/382 , H01L33/405
摘要: An LED device and a method of manufacturing, including an embedded top electrode, are presented. The LED device includes an LED structure and a top electrode. The LED structure includes layers disposed on a substrate, including an active light-emitting region. A top layer of the LED structure is a top contact layer. The top electrode is embedded into the top contact layer, wherein the top electrode electrically contacts the top contact layer.
摘要翻译: 提出了一种LED器件及其制造方法,包括嵌入式顶部电极。 LED装置包括LED结构和顶部电极。 LED结构包括设置在基板上的层,包括有源发光区域。 LED结构的顶层是顶部接触层。 顶部电极嵌入到顶部接触层中,其中顶部电极电接触顶部接触层。
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126.
公开(公告)号:US08803189B2
公开(公告)日:2014-08-12
申请号:US12538701
申请日:2009-08-10
申请人: Chen-Hua Yu , Chia-Lin Yu , Ding-Yuan Chen , Wen-Chih Chiou , Hung-Ta Lin
发明人: Chen-Hua Yu , Chia-Lin Yu , Ding-Yuan Chen , Wen-Chih Chiou , Hung-Ta Lin
IPC分类号: H01L33/00
CPC分类号: H01L21/8258 , H01L21/0237 , H01L21/02458 , H01L21/02491 , H01L21/02502 , H01L21/0254 , H01L21/02642 , H01L21/02645 , H01L29/2003 , H01L29/66462 , H01L33/007
摘要: A circuit structure includes a substrate; a patterned mask layer over the substrate, wherein the patterned mask layer includes a plurality of gaps; and a group-III group-V (III-V) compound semiconductor layer. The III-V compound semiconductor layer includes a first portion over the mask layer and second portions in the gaps, wherein the III-V compound semiconductor layer overlies a buffer/nucleation layer.
摘要翻译: 电路结构包括基板; 在所述衬底上的图案化掩模层,其中所述图案化掩模层包括多个间隙; 和III族V族(III-V)族化合物半导体层。 III-V族化合物半导体层包括掩模层上的第一部分和间隙中的第二部分,其中III-V族化合物半导体层覆盖缓冲层/成核层。
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公开(公告)号:US08525200B2
公开(公告)日:2013-09-03
申请号:US12269497
申请日:2008-11-12
申请人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
发明人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
CPC分类号: H01L33/16 , H01L33/0079 , H01L33/10
摘要: A light-emitting diode (LED) device is provided. The LED device has a substrate, a reflective structure over the substrate, and an LED structure over the reflective structure. The reflective structure is formed of non-metallic materials. In one embodiment, the reflective structure is formed of alternating layers of different non-metallic materials having different refractive indices. In another embodiment, the reflective structure is formed of alternating layers of high-porosity silicon and low-porosity silicon. In yet another embodiment, the reflective structure is formed of silicon dioxide, which may allow the use of fewer layers. The reflective structure may be formed directly on the same substrate as the LED structure or formed on a separate substrate and then bonded to the LED structure.
摘要翻译: 提供了一种发光二极管(LED)装置。 LED器件具有衬底,衬底上的反射结构以及反射结构上的LED结构。 反射结构由非金属材料形成。 在一个实施例中,反射结构由具有不同折射率的不同非金属材料的交替层形成。 在另一个实施例中,反射结构由高孔隙率硅和低孔隙率硅的交替层形成。 在另一个实施例中,反射结构由二氧化硅形成,其可以允许使用更少的层。 反射结构可以直接形成在与LED结构相同的基板上,或者形成在单独的基板上,然后结合到LED结构。
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128.
公开(公告)号:US08486730B2
公开(公告)日:2013-07-16
申请号:US13567734
申请日:2012-08-06
申请人: Ding-Yuan Chen , Hung-Ta Lin , Chen-Hua Yu , Wen-Chih Chiou
发明人: Ding-Yuan Chen , Hung-Ta Lin , Chen-Hua Yu , Wen-Chih Chiou
CPC分类号: H01L33/007 , C23C14/048 , H01L21/0254 , H01L21/0262 , H01L21/02639 , H01L21/0265 , H01L25/167 , H01L33/0079 , H01L2924/0002 , H01L2924/00
摘要: A method of forming a light-emitting diode (LED) device and separating the LED device from a growth substrate is provided. The LED device is formed by forming an LED structure over a growth substrate. The method includes forming and patterning a mask layer on the growth substrate. A first contact layer is formed over the patterned mask layer with an air bridge between the first contact layer and the patterned mask layer. The first contact layer may be a contact layer of the LED structure. After the formation of the LED structure, the growth substrate is detached from the LED structure along the air bridge.
摘要翻译: 提供一种形成发光二极管(LED)器件并将LED器件与生长衬底分离的方法。 LED器件通过在生长衬底上形成LED结构而形成。 该方法包括在生长衬底上形成和图案化掩模层。 在图案化掩模层之上形成第一接触层,在第一接触层和图案化掩模层之间具有空气桥。 第一接触层可以是LED结构的接触层。 在形成LED结构之后,生长衬底沿着空气桥与LED结构分离。
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公开(公告)号:US20120289062A1
公开(公告)日:2012-11-15
申请号:US13562101
申请日:2012-07-30
申请人: Ching-Yu Lo , Hung-Jung Tu , Hai-Ching Chen , Tien-I Bao , Wen-Chih Chiou , Chen-Hua Yu
发明人: Ching-Yu Lo , Hung-Jung Tu , Hai-Ching Chen , Tien-I Bao , Wen-Chih Chiou , Chen-Hua Yu
IPC分类号: H01L21/71
CPC分类号: H01L21/6835 , H01L21/76898 , H01L23/481 , H01L24/02 , H01L2221/68372 , H01L2224/0557 , H01L2924/00014 , H01L2924/0002 , H01L2924/01019 , H01L2924/04941 , H01L2924/12042 , H01L2924/14 , H01L2924/19041 , H01L2924/19043 , H01L2224/05552 , H01L2924/00
摘要: An integrated circuit structure includes a semiconductor substrate; a through-semiconductor via (TSV) opening extending into the semiconductor substrate; and a TSV liner in the TSV opening. The TSV liner includes a sidewall portion on a sidewall of the TSV opening and a bottom portion at a bottom of the TSV opening. The bottom portion of the TSV liner has a bottom height greater than a middle thickness of the sidewall portion of the TSV liner.
摘要翻译: 集成电路结构包括半导体衬底; 贯穿半导体衬底的贯通半导体通孔(TSV)开口; 和TSV开口的TSV衬管。 TSV衬套包括在TSV开口的侧壁上的侧壁部分和TSV开口底部的底部。 TSV衬管的底部部分的底部高度大于TSV衬套的侧壁部分的中间厚度。
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公开(公告)号:US20120025222A1
公开(公告)日:2012-02-02
申请号:US13269968
申请日:2011-10-10
申请人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
发明人: Ding-Yuan Chen , Wen-Chih Chiou , Chen-Hua Yu
IPC分类号: H01L33/62
CPC分类号: H01L25/0753 , H01L33/642 , H01L33/647 , H01L2224/48091 , H01L2224/48227 , H05K1/0206 , H05K1/113 , H05K2201/10106 , H01L2924/00014 , H01L2924/00
摘要: A circuit structure includes a carrier substrate, which includes a first through-via and a second through-via. Each of the first through-via and the second through-via extends from a first surface of the carrier substrate to a second surface of the carrier substrate opposite the first surface. The circuit structure further includes a light-emitting diode (LED) chip bonded onto the first surface of the carrier substrate. The LED chip includes a first electrode and a second electrode connected to the first through-via and the second through-via, respectively.
摘要翻译: 电路结构包括载体基板,其包括第一通孔和第二通孔。 第一通孔和第二通孔中的每一个从载体衬底的第一表面延伸到与第一表面相对的载体衬底的第二表面。 电路结构还包括结合到载体基板的第一表面上的发光二极管(LED)芯片。 LED芯片包括分别连接到第一通孔和第二通孔的第一电极和第二电极。
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