公开(公告)号：US20230282445A1

公开(公告)日：2023-09-07

申请号：US18146644

申请日：2022-12-27

Applicant: Kyoto University

Inventor： Shinya Yamanaka ,  Keisuke Okita

IPC: H01J37/32 ,  H01J37/24

CPC classification number: H01J37/32073 ,  H01J37/241 ,  H01J2237/038 ,  H01J2237/06375

Abstract: A method of producing an induced pluripotent stem cell, comprising the step of introducing at least one kind of non-viral expression vector incorporating at least one gene that encodes a reprogramming factor into a somatic cell. In some embodiments, the gene that encodes a reprogramming factor is one or more kind of genes selected from the group consisting of an Oct family gene, a Klf family gene, a Sox family gene, a Myc family gene, a Lin family gene, and the Nanog gene.

公开(公告)号：US09633814B2

公开(公告)日：2017-04-25

申请号：US14288753

申请日：2014-05-28

Applicant: TOSHIBA MEDICAL SYSTEMS CORPORATION

Inventor： Daizo Oikawa ,  Fumio Ishiyama

IPC: H01J35/02 ,  H01J37/24 ,  H05G1/32 ,  H05G1/46 ,  G05F1/10 ,  G05F1/56 ,  G05F1/565 ,  H01J37/302 ,  H01J37/248 ,  A61B6/00 ,  A61B6/03

CPC classification number: H01J35/025 ,  A61B6/032 ,  A61B6/405 ,  A61B6/4241 ,  A61B6/54 ,  A61B6/542 ,  A61B6/58 ,  G05F1/10 ,  G05F1/565 ,  H01J37/241 ,  H01J37/248 ,  H01J37/3023 ,  H01J2237/2487 ,  H05G1/32 ,  H05G1/46

Abstract: X-ray CT apparatus is provided in which the photon energy distribution of X-rays to be radiated is flattened. X-ray CT apparatus includes an X-ray tube, a detector, a data acquisition system, a tube voltage generator, and a grid controller. The X-ray tube radiates X-rays onto a subject. The detector includes multiple detection elements for detecting photons forming the X-rays. The data acquisition system counts the number of the detected photons to acquire projection data based on the counted photons. The tube voltage generator applies the tube voltage to the X-ray tube while changing the tube voltage of the X-ray tube in a predetermined cycle. A tube current controller decreases the tube current upon an increase in the tube voltage, and increases the tube current upon a decrease in the tube voltage. Thus, the photon energy distribution of the X-rays radiated from the X-ray tube is flattened.

公开(公告)号：US20160365225A1

公开(公告)日：2016-12-15

申请号：US14820747

申请日：2015-08-07

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Kevin Anglin ,  William Davis Lee ,  Peter Kurunczi ,  Ryan Downey ,  Jay T. Scheuer ,  Alexandre Likhanskii ,  William M. Holber

IPC: H01J37/317 ,  B08B7/00 ,  H01J37/34 ,  H01J37/24

CPC classification number: H01J37/3171 ,  B08B7/0035 ,  H01J37/241 ,  H01J37/32862 ,  H01J37/3467 ,  H01J2237/022 ,  H01J2237/04756 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/334 ,  H01J2237/335

Abstract: Provided herein are approaches for in-situ plasma cleaning of one or more components of an ion implantation system. In one approach, the component may include a beam-line component having one or more conductive beam optics. The system further includes a power supply for supplying a first voltage and first current to the component during a processing mode and a second voltage and second current to the component during a cleaning mode. The second voltage and current may be applied to the conductive beam optics of the component, in parallel, to selectively (e.g., individually) generate plasma around one or more of the one or more conductive beam optics. The system may further include a flow controller for adjusting an injection rate of an etchant gas supplied to the component, and a vacuum pump for adjusting pressure of an environment of the component.

Abstract translation: 本文提供了用于离子注入系统的一个或多个组分的原位等离子体清洗的方法。 在一种方法中，组件可以包括具有一个或多个导电束光学器件的束线分量。 该系统还包括用于在处理模式期间向组件提供第一电压和第一电流的电源，以及在清洁模式期间向组件提供第二电压和第二电流的电源。 第二电压和电流可以并联地施加到部件的导电束光学器件，以选择性地（例如，单独地）在一个或多个导电束光学器件中的一个或多个上产生等离子体。 该系统还可以包括用于调节供应给部件的蚀刻剂气体的喷射速率的流量控制器和用于调节部件的环境压力的真空泵。

公开(公告)号：US20160314931A1

公开(公告)日：2016-10-27

申请号：US15135841

申请日：2016-04-22

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Edgar Fichter ,  Joerg Fober ,  Dirk Preikszas ,  Christian Hendrich ,  Michael Schnell ,  Momme Mommsen

IPC: H01J37/24 ,  H01J37/28

CPC classification number: H01J37/241 ,  H01J37/28 ,  H01J2237/002

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract translation: 本文所述的系统涉及用于提供粒子束装置的输出电压的高压供应单元，其中，粒子束装置被实施为例如电子束装置和/或离子束装置。 本文描述的系统基于这样的事实，即认识到可以通过单极第一电流源和单极第二电流源形成双极性电压供应单元，所述双极性电压供应单元能够在两个方向上实现负载电流。 根据本文描述的系统的高压供应单元可以在4象限操作中操作。 在4象限操作中，用于提供第一电流源的第一电压源和用于提供第二电流源的第二电压源被实施为不同的电压源。

公开(公告)号：US20160093466A1

公开(公告)日：2016-03-31

申请号：US14838848

申请日：2015-08-28

Applicant: NuFlare Technology, Inc.

Inventor： Hironori MIZOGUCHI

IPC: H01J37/244 ,  H01J37/24 ,  H01J37/317 ,  H01J37/21

CPC classification number: H01J37/3174 ,  H01J37/21 ,  H01J37/241 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/3045 ,  H01J2237/30461 ,  H01J2237/31776

Abstract: A method for correcting a drift of an accelerating voltage includes measuring, after a position of a focus of a charged particle beam has been adjusted based on a first adjustment value and a predetermined time period has passed, a second adjustment value when the position of the focus of the charged particle beam is newly adjusted, calculating a deviation amount between the first adjustment value and the second adjustment value, calculating, using a correlation stored in a storage device, a correction value of an accelerating voltage to be applied to a beam source which emits the charged particle beam, where the correction value corresponds to the deviation amount, and correcting the accelerating voltage to be applied to the beam source, by using the correlation value.

Abstract translation: 一种用于校正加速电压的漂移的方法包括：在基于第一调整值和预定时间段已经调整带电粒子束的焦点的位置之后，测量第二调整值，当位置 重新调整带电粒子束的焦点，计算第一调整值和第二调整值之间的偏差量，使用存储在存储装置中的相关性来计算要施加到光束源的加速电压的校正值 其发射带电粒子束，其中校正值对应于偏差量，并且通过使用相关值来校正要施加到束源的加速电压。

公开(公告)号：US20150371816A1

公开(公告)日：2015-12-24

申请号：US14763363

申请日：2014-01-17

Applicant: Hitachi High- Technologies Corporation

Inventor： Ayumi DOI ,  Tomohiro FUNAKOSHI ,  Takuma YAMAMOTO ,  Tomohiro TAMORI ,  Tsunehiro SAKAI

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/241 ,  H01J37/28 ,  H01J2237/225 ,  H01J2237/281

Abstract: A sample observation device of the invention includes: a charged particle optical column for irradiating a sample with charged particle beams at a first acceleration voltage, the sample having a target part to be observed which is a concave part; an image acquisition part for acquiring an image including the target part to be observed on the basis of signals obtained by irradiation with the charged particle beams; a memory part for memorizing in advance, at each of a plurality of acceleration voltages, information indicating a relationship between a brightness ratio of a concave part to a periphery part of the concave part in a standard sample and a value indicating a structure of the concave part in the standard sample; and an operation part for obtaining a brightness ratio of the concave part to a periphery part of the concave part in the image. The operation part judges appropriateness/inappropriateness of the first acceleration voltage with the use of the information indicating the relationship and the brightness ratio in the image.

Abstract translation: 本发明的样品观察装置包括：带电粒子光学柱，用于以第一加速电压照射带有带电粒子束的样品，所述样品具有作为凹部的观察对象部分; 图像获取部分，用于基于通过照射带电粒子束获得的信号来获取包括要观察的目标部分的图像; 存储器部分，用于在多个加速电压中的每一个处预先存储指示在标准样品中凹部与凹部的周边部分的亮度比与凹部的结构的值之间的关系的信息 标准样品的一部分; 以及用于获得图像中的凹部与凹部的周边部的亮度比的操作部。 操作部通过使用表示图像的关系和亮度比的信息来判断第一加速电压的适当性/不适当性。

公开(公告)号：US09105447B2

公开(公告)日：2015-08-11

申请号：US14011305

申请日：2013-08-27

Applicant: Advanced Energy Industries, Inc.

Inventor： Victor Brouk ,  Daniel J. Hoffman ,  Daniel Carter ,  Dmitri Kovalevskii

IPC: H01J37/24 ,  H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/241 ,  H01J37/32146

Abstract: This disclosure describes systems, methods, and apparatus for operating a plasma processing chamber. In particular, a periodic voltage function combined with an ion current compensation can be provided as a bias to a substrate support as a modified periodic voltage function. This in turn effects a DC bias on the surface of the substrate that controls an ion energy of ions incident on a surface of the substrate. A peak-to-peak voltage of the periodic voltage function can control the ion energy, while the ion current compensation can control a width of an ion energy distribution function of the ions. Measuring the modified periodic voltage function can provide a means to calculate an ion current in the plasma and a sheath capacitance of the plasma sheath. The ion energy distribution function can be tailored and multiple ion energy peaks can be generated, both via control of the modified periodic voltage function.

Abstract translation: 本公开描述了用于操作等离子体处理室的系统，方法和装置。 特别地，可以将与离子电流补偿组合的周期性电压功能作为偏置提供给衬底支架作为修改的周期性电压功能。 这进一步影响基板表面上的DC偏压，该DC偏压控制入射在基板的表面上的离子的离子能。 周期电压功能的峰 - 峰电压可以控制离子能量，而离子电流补偿可以控制离子的离子能量分布函数的宽度。 测量修改的周期性电压功能可以提供计算等离子体中的离子电流和等离子体护套的护套电容的方法。 离子能量分布函数可以通过修改的周期性电压函数的控制来定制并产生多个离子能量峰值。

公开(公告)号：US09062377B2

公开(公告)日：2015-06-23

申请号：US14033642

申请日：2013-09-23

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： William T. Levay ,  George M. Gammel ,  Bon-Woong Koo ,  Brant S. Binns ,  Richard M. White

IPC: C23C14/00 ,  C23C14/30 ,  H05H1/00 ,  C23C14/48 ,  C23C14/58 ,  C23C14/02 ,  C23C14/04 ,  H01J37/24 ,  H01J37/248 ,  H01J37/317 ,  H01J37/32

CPC classification number: C23C14/48 ,  C23C14/021 ,  C23C14/022 ,  C23C14/048 ,  C23C14/5826 ,  H01J37/241 ,  H01J37/243 ,  H01J37/248 ,  H01J37/3171 ,  H01J37/32412 ,  H01J37/32935 ,  H01J2237/0206 ,  H01J2237/24535 ,  H01L2224/81913

Abstract: Methods of reducing glitch rates within an ion implanter are described. In one embodiment, a plasma-assisted conditioning is performed, wherein the bias voltage to the extraction electrodes is modified so as to inhibit the formation of an ion beam. The power supplied to the plasma generator in the ion source is increased, thereby creating a high density plasma, which is not extracted by the extraction electrodes. This plasma extends from the ion source chamber through the extraction aperture. Energetic ions then condition the extraction electrodes. In another embodiment, a plasma-assisted cleaning is performed. In this mode, the extraction electrodes are moved further from the ion source chamber, and a different source gas is used to create the plasma. In some embodiments, a combination of these modes is used to reduce glitches in the ion implanter.

Abstract translation: 描述了降低离子注入机内毛刺率的方法。 在一个实施例中，执行等离子体辅助调理，其中对提取电极的偏压被修改以便抑制离子束的形成。 提供给离子源中的等离子体发生器的功率增加，从而产生不被提取电极提取的高密度等离子体。 该等离子体从离子源室延伸穿过提取孔。 能量离子然后调节萃取电极。 在另一个实施例中，执行等离子体辅助清洁。 在该模式中，提取电极进一步从离子源室移动，并且使用不同的源气体来产生等离子体。 在一些实施例中，使用这些模式的组合来减少离子注入机中的毛刺。

公开(公告)号：US20150130348A1

公开(公告)日：2015-05-14

申请号：US14481642

申请日：2014-09-09

Applicant: FEI Company

Inventor： John Keller ,  Noel Smith ,  Roderick Boswell ,  Lawrence Scipioni ,  Christine Charles ,  Orson Sutherland

IPC: H01J37/32 ,  H01J37/24

CPC classification number: H01J37/32183 ,  H01J27/16 ,  H01J37/08 ,  H01J37/241 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32669 ,  H01J2237/0815

Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.

Abstract translation: 本发明提供了一种电感耦合磁增强型离子束源，适用于与探针形成光学器件结合使用以产生离子束而不产生由该源引起的动能振荡。

公开(公告)号：US20150061496A1

公开(公告)日：2015-03-05

申请号：US14460711

申请日：2014-08-15

Applicant: Mectron Engineering Company

Inventor： James L. Hanna ,  Glenn D. Gram

IPC: H01J37/32 ,  H01J37/24 ,  H01J37/08

CPC classification number: H01J37/241 ,  H01J37/08 ,  H01J37/3244

Abstract: The invention relates to a system for generating an ion stream which may be useful for various applications. In one application, the ion stream may be used to excite nano-spheres. In another application, the ion stream may be used for sterilization and therapy in accordance with the teachings of the invention.

Abstract translation: 本发明涉及一种用于产生可用于各种应用的离子流的系统。 在一个应用中，离子流可用于激发纳米球体。 在另一个应用中，根据本发明的教导，离子流可用于灭菌和治疗。