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131.
公开(公告)号:US20130119557A1
公开(公告)日:2013-05-16
申请号:US13683344
申请日:2012-11-21
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach
IPC: H01L23/48
CPC classification number: H01L21/8221 , H01L21/6835 , H01L21/76254 , H01L21/823828 , H01L21/84 , H01L23/3677 , H01L23/481 , H01L23/5252 , H01L24/05 , H01L24/13 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/83 , H01L25/0655 , H01L25/0657 , H01L25/50 , H01L27/0207 , H01L27/0688 , H01L27/092 , H01L27/10 , H01L27/105 , H01L27/10802 , H01L27/10873 , H01L27/10876 , H01L27/10894 , H01L27/10897 , H01L27/11 , H01L27/1108 , H01L27/1116 , H01L27/112 , H01L27/11206 , H01L27/11526 , H01L27/11529 , H01L27/11551 , H01L27/11573 , H01L27/11578 , H01L27/11807 , H01L27/11898 , H01L27/1203 , H01L27/1214 , H01L27/1266 , H01L29/4236 , H01L29/66272 , H01L29/66621 , H01L29/66825 , H01L29/66833 , H01L29/66901 , H01L29/78 , H01L29/7841 , H01L29/7881 , H01L29/792 , H01L2221/68368 , H01L2223/5442 , H01L2223/54426 , H01L2224/0401 , H01L2224/16145 , H01L2224/16235 , H01L2224/32145 , H01L2224/32225 , H01L2224/45124 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/73204 , H01L2224/73253 , H01L2224/73265 , H01L2224/83894 , H01L2225/06513 , H01L2225/06541 , H01L2924/00011 , H01L2924/00014 , H01L2924/01002 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/01023 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/0105 , H01L2924/01051 , H01L2924/01066 , H01L2924/01068 , H01L2924/01072 , H01L2924/01073 , H01L2924/01074 , H01L2924/01075 , H01L2924/01076 , H01L2924/01077 , H01L2924/01078 , H01L2924/01082 , H01L2924/0132 , H01L2924/01322 , H01L2924/014 , H01L2924/10253 , H01L2924/10329 , H01L2924/12032 , H01L2924/12036 , H01L2924/12042 , H01L2924/1301 , H01L2924/1305 , H01L2924/1306 , H01L2924/13062 , H01L2924/13091 , H01L2924/14 , H01L2924/15311 , H01L2924/15788 , H01L2924/1579 , H01L2924/16152 , H01L2924/181 , H01L2924/19041 , H01L2924/30105 , H01L2924/3011 , H01L2924/3025 , H01L2924/00015 , H01L2924/01031 , H01L2924/3512 , H01L2924/00 , H01L2224/80001 , H01L2224/05599 , H01L2924/00012
Abstract: Two systems including: a first system including a first die connected to a second die; and a second system including a third die connected to a fourth die; wherein the connected includes at least one through silicon via (TSV), and wherein the first die is substantially the same as the third die, and the second die is substantially different than the fourth die.
Abstract translation: 两个系统包括:第一系统,包括连接到第二管芯的第一管芯; 以及第二系统,包括连接到第四管芯的第三管芯; 其中所述连接件包括至少一个贯通硅通孔(TSV),并且其中所述第一管芯基本上与所述第三管芯相同,并且所述第二管芯基本上不同于所述第四管芯。
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公开(公告)号:US12249538B2
公开(公告)日:2025-03-11
申请号:US18228907
申请日:2023-08-01
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Brian Cronquist , Deepak Sekar
IPC: H01L21/74
Abstract: A 3D device includes a first level including a first single crystal layer with control circuitry, where the control circuitry includes first single crystal transistors; a first metal layer atop first single crystal layer; a second metal layer atop the first metal layer; a third metal layer atop the second metal layer; second level (includes a plurality of second transistors, including metal gate) atop the third metal layer; a fourth metal layer above the one second level; a fifth metal layer atop the fourth metal layer, where the second level includes at least one first oxide layer overlaid by a transistor layer and then overlaid by a second oxide layer; a global power distribution grid including the fifth metal layer; a local power distribution grid, the thickness of the fifth metal layer is at least 50% greater than the thickness of the second metal layer, a layer deposited by ALD.
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公开(公告)号:US20240404866A1
公开(公告)日:2024-12-05
申请号:US18798708
申请日:2024-08-08
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Brian Cronquist , Deepak C. Sekar
IPC: H01L21/683 , G11C8/16 , H01L21/74 , H01L21/762 , H01L21/768 , H01L21/822 , H01L21/8238 , H01L21/84 , H01L23/00 , H01L23/367 , H01L23/48 , H01L23/525 , H01L25/00 , H01L25/065 , H01L27/02 , H01L27/06 , H01L27/092 , H01L27/118 , H01L27/12 , H01L29/423 , H01L29/66 , H01L29/78 , H01L29/788 , H01L29/792 , H10B10/00 , H10B12/00 , H10B20/00 , H10B20/25 , H10B41/20 , H10B41/40 , H10B41/41 , H10B43/20 , H10B43/40
Abstract: A 3D semiconductor device including: a first level including a first single crystal layer and first transistors, which each include a single crystal channel; a first metal layer with an overlaying second metal layer; a second level including second transistors, overlaying the first level; a third level including third transistors, overlaying the second level; a fourth level including fourth transistors, overlaying the third level, where the second level includes first memory cells, where each of the first memory cells includes at least one of the second transistors, where the fourth level includes second memory cells, where each of the second memory cells includes at least one of the fourth transistors, where the first level includes memory control circuits, where second memory cells include at least four memory arrays, each of the four memory arrays are independently controlled, and at least one of the second transistors includes a metal gate.
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公开(公告)号:US20240404600A1
公开(公告)日:2024-12-05
申请号:US18800057
申请日:2024-08-10
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Jin-Woo Han , Eli Lusky
IPC: G11C16/10 , H10B20/25 , H10B41/10 , H10B41/27 , H10B41/35 , H10B41/41 , H10B43/10 , H10B43/27 , H10B43/35 , H10B43/40
Abstract: A semiconductor device including: a first level including memory control circuits (include a plurality of refresh circuits for the memory units) which include first transistors; a second level including a first array of memory cells including second transistors self-aligned to at least one of the third transistors; a third level disposed on top of the second level disposed on top of first level, the third level including a second array of memory cells including third transistors; a fourth level disposed on top of the third level, the fourth level including a third array of memory cells including fourth transistors, second level is bonded to the first level, a plurality of slits disposed through the second level, the third level, and the fourth level, the slits enable gate replacement of a plurality of the third transistors, where the second array of memory cells include a plurality of independently controlled memory units.
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公开(公告)号:US20240379624A1
公开(公告)日:2024-11-14
申请号:US18779059
申请日:2024-07-21
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Brian Cronquist
Abstract: A 3D semiconductor device, the device including: a first level, where the first level includes a first layer, the first layer including first transistors, and where the first level includes a second layer, the second layer including first interconnections; a second level overlaying the first level, where the second level includes a plurality of second transistors, where the second level includes a third layer, the third layer including first conductive lines; a third level overlaying the second level, where the third level includes a plurality of third transistors, where the third level includes a fourth layer, the fourth layer including second conductive lines; and a plurality of connection paths, where the plurality of connection paths provides electrical connections at least from a plurality of the first transistors to the plurality of third transistors, and where the first level includes at least one voltage regulator.
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公开(公告)号:US12136562B2
公开(公告)日:2024-11-05
申请号:US18527269
申请日:2023-12-02
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Brian Cronquist , Deepak C. Sekar
IPC: H01L23/48 , G11C8/16 , H01L21/683 , H01L21/74 , H01L21/762 , H01L21/768 , H01L21/822 , H01L21/8238 , H01L21/84 , H01L23/525 , H01L27/02 , H01L27/06 , H01L27/092 , H01L27/10 , H01L27/105 , H01L27/118 , H01L27/12 , H01L29/423 , H01L29/66 , H01L29/78 , H01L29/788 , H01L29/792 , H10B10/00 , H10B12/00 , H10B20/00 , H10B41/20 , H10B41/40 , H10B41/41 , H10B43/20 , H10B43/40 , H01L23/00 , H01L23/367 , H01L25/00 , H01L25/065 , H10B20/20
Abstract: A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including first transistors, where each of the first transistors includes a single crystal channel; first metal layers interconnecting at least the first transistors; a second metal layer overlaying the first metal layers; a first oxide layer disposed over the second metal layer; a second oxide layer disposed over the first oxide layer; and a second level including at least one array of memory cells and second transistors, where each of the memory cells includes at least one of the second transistors, where the second level overlays the first level, where at least one of the second transistors includes at least two independent gates, where the second level is directly bonded to the first level, and where the bonded includes direct oxide-to-oxide bonds.
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公开(公告)号:US12125737B1
公开(公告)日:2024-10-22
申请号:US18736423
申请日:2024-06-06
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Brian Cronquist , Deepak C. Sekar
IPC: H01L21/683 , G11C8/16 , H01L21/74 , H01L21/762 , H01L21/768 , H01L21/822 , H01L21/8238 , H01L21/84 , H01L23/48 , H01L23/525 , H01L27/02 , H01L27/06 , H01L27/092 , H01L27/10 , H01L27/105 , H01L27/118 , H01L27/12 , H01L29/423 , H01L29/66 , H01L29/78 , H01L29/788 , H01L29/792 , H10B10/00 , H10B12/00 , H10B20/00 , H10B41/20 , H10B41/40 , H10B41/41 , H10B43/20 , H10B43/40 , H01L23/00 , H01L23/367 , H01L25/00 , H01L25/065 , H10B20/20
CPC classification number: H01L21/6835 , G11C8/16 , H01L21/743 , H01L21/76254 , H01L21/76898 , H01L21/8221 , H01L21/823828 , H01L21/84 , H01L23/481 , H01L23/5252 , H01L27/0207 , H01L27/0688 , H01L27/092 , H01L27/10 , H01L27/105 , H01L27/11807 , H01L27/11898 , H01L27/1203 , H01L29/4236 , H01L29/66272 , H01L29/66621 , H01L29/66825 , H01L29/66833 , H01L29/66901 , H01L29/78 , H01L29/7841 , H01L29/7843 , H01L29/7881 , H01L29/792 , H10B10/00 , H10B10/125 , H10B12/053 , H10B12/09 , H10B12/20 , H10B12/50 , H10B20/00 , H10B41/20 , H10B41/40 , H10B41/41 , H10B43/20 , H10B43/40 , H01L23/3677 , H01L24/13 , H01L24/16 , H01L24/45 , H01L24/48 , H01L25/0655 , H01L25/0657 , H01L25/50 , H01L27/1214 , H01L27/1266 , H01L2221/68368 , H01L2223/5442 , H01L2223/54426 , H01L2224/131 , H01L2224/16145 , H01L2224/16146 , H01L2224/16227 , H01L2224/16235 , H01L2224/32145 , H01L2224/32225 , H01L2224/45124 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/73204 , H01L2224/73253 , H01L2224/73265 , H01L2224/81005 , H01L2224/83894 , H01L2225/06513 , H01L2225/06541 , H01L2924/00011 , H01L2924/01002 , H01L2924/01004 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/01029 , H01L2924/01046 , H01L2924/01066 , H01L2924/01068 , H01L2924/01077 , H01L2924/01078 , H01L2924/01322 , H01L2924/10253 , H01L2924/10329 , H01L2924/12032 , H01L2924/12033 , H01L2924/12036 , H01L2924/12042 , H01L2924/1301 , H01L2924/1305 , H01L2924/13062 , H01L2924/13091 , H01L2924/14 , H01L2924/1461 , H01L2924/15311 , H01L2924/1579 , H01L2924/16152 , H01L2924/181 , H01L2924/19041 , H01L2924/30105 , H01L2924/3011 , H01L2924/3025 , H10B12/05 , H10B20/20
Abstract: A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including first transistors, where each of the first transistors includes a single crystal channel; a first metal layer; a second metal layer overlaying the first metal layer; a second level including second transistors, first memory cells including at least one second transistor, and overlaying the second metal layer, a third level including third transistors and overlaying the second level, a fourth level including fourth transistors, second memory cells including at least one fourth transistor, and overlaying the third level, where the first level includes memory control circuits which control writing to the second memory cells, and at least one Phase-Lock-Loop (“PLL”) circuit or at least one Digital-Lock-Loop (“DLL”) circuit.
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公开(公告)号:US12120880B1
公开(公告)日:2024-10-15
申请号:US18527356
申请日:2023-12-03
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Jin-Woo Han
IPC: H10B43/27 , H01L23/528 , H01L27/02 , H01L29/167 , H01L29/47 , H01L29/78 , H01L29/792 , H10B41/10 , H10B41/20 , H10B43/10 , H10B43/20 , H10B53/20
CPC classification number: H10B43/27 , H01L23/5283 , H01L27/0207 , H01L29/167 , H01L29/47 , H01L29/7827 , H01L29/792 , H10B43/10 , H10B43/20 , H10B41/10 , H10B41/20 , H10B53/20
Abstract: A 3D semiconductor device including: a first level including a single crystal layer and a memory control circuit including first transistors and at least one power-down control circuit; a first metal layer overlaying the single crystal layer; a second metal layer overlaying the first metal layer; a third metal layer overlaying the second metal layer; second transistors disposed atop the third metal layer with at least one including a metal gate; third transistors disposed atop the second transistors; a fourth metal layer atop the third transistors; a memory array including word-lines and at least four memory mini arrays, each including at least four rows by four columns of memory cells, each of the memory cells includes at least one of the second transistors or at least one of the third transistors; a connection path from the fourth metal to the third metal including a via disposed through the memory array.
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公开(公告)号:US20240334702A1
公开(公告)日:2024-10-03
申请号:US18738967
申请日:2024-06-10
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Jin-Woo Han , Eli Lusky
IPC: H10B43/27 , H01L23/00 , H01L25/065 , H01L25/18 , H10B80/00
CPC classification number: H10B43/27 , H01L24/08 , H01L25/0657 , H01L25/18 , H10B80/00 , H01L2224/08145 , H01L2924/1431 , H01L2924/14511
Abstract: A 3D memory device including: a first structure including a plurality of memory cells, where each memory cell of the plurality of memory cells includes at least one memory transistor, where each of the at least one memory transistor includes a source, a drain, and a channel, where the memory cell includes at least one charge trap structure, and where the at least one memory transistor is self-aligned to an overlaying another the at least one memory transistor, both being processed following a same lithography step; and a control level including a memory controller circuit, where the control level includes a plurality of latch sense amplifiers, where the control level is bonded to the first structure, and where the bonded includes hybrid bonding.
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公开(公告)号:US20240334701A1
公开(公告)日:2024-10-03
申请号:US18738721
申请日:2024-06-10
Applicant: Monolithic 3D Inc.
Inventor: Zvi Or-Bach , Jin-Woo Han
IPC: H10B43/27 , H01L23/528 , H01L27/02 , H01L29/167 , H01L29/47 , H01L29/78 , H01L29/792 , H10B41/10 , H10B41/20 , H10B43/10 , H10B43/20 , H10B53/20
CPC classification number: H10B43/27 , H01L23/5283 , H01L27/0207 , H01L29/167 , H01L29/47 , H01L29/7827 , H01L29/792 , H10B43/10 , H10B43/20 , H10B41/10 , H10B41/20 , H10B53/20
Abstract: A 3D semiconductor device including: a first level including a single crystal layer and a memory control circuit including first transistors and at least one cache memory unit; a first metal layer overlaying the single crystal layer; a second metal layer overlaying the first metal layer; a third metal layer overlaying the second metal layer; second transistors disposed atop the third metal layer with at least one including a metal gate; third transistors disposed atop the second transistors; a fourth metal layer atop the third transistors; a memory array including word-lines and at least four memory mini arrays, each including at least four rows by four columns of memory cells, each of the memory cells includes at least one of the second transistors or at least one of the third transistors; a connection path from the fourth metal to the third metal including a via disposed through the memory array.
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