公开(公告)号：US06914919B2

公开(公告)日：2005-07-05

申请号：US10187336

申请日：2002-06-28

Applicant: Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

Inventor： Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

IPC: H01S3/134 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23 ,  H01S3/10

CPC classification number: H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.

Abstract translation: 本发明提供一种气体放电激光系统，其能够以6,000至1000000次脉冲功率秒的重复频率在生产线容量中可靠地长期运行。 优选的实施例被配置为用于集成电路光刻的光源的KrF，ArF和F 2 N 2激光器。 改进包括一种改进的高压电源，其能够将磁压缩脉冲电源系统的初始电容器充电至每秒精确的目标电压6,000至10,0000次，以及用于监视脉冲能量的反馈控制以及确定脉冲 - 逐脉冲基础。 公开了用于在放电间隔期间从激光电极之间的放电区域去除产生的碎屑的几种技术。 在一个实施例中，放电区域的宽度从约3mm减小至约1mm，使得设计用于4000Hz操作的气体循环系统可用于10,000Hz操作。 在其他实施例中，电极之间的气流充分增加，以允许10,000Hz的操作，放电区域宽度为3mm。 为了提供这些显着增加的气体流速，申请人已经公开了使用现有技术的切向形式的优选实施例，但是具有改进的和更强大的电动机和新颖的轴承设计。 新的轴承设计包括陶瓷轴承和磁性轴承。 在其他实施例中，一些或全部气体循环动力设置有位于激光室外部的鼓风机。 外部鼓风机可以位于激光柜内或分开的位置。

公开(公告)号：US06904073B2

公开(公告)日：2005-06-07

申请号：US10384967

申请日：2003-03-08

Applicant: Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

Inventor： Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

IPC: G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

Abstract: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.

Abstract translation: 本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。 本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。 实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲，平均输出脉冲强度大于1.75×6 /瓦/ cm 2，并且与 与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比，数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。 公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。 本说明书中描述的重要改进已分为以下主题类别：（1）由申请人发现的CaF 2 2表面损伤的解决方案，（2）高功率ArF MOPA激光系统的描述（ 3）光束传输单元的描述，（4）偏振考虑（5）高速水冷自动快门能量检测器模块和（6）其他改进。

公开(公告)号：USD462443S1

公开(公告)日：2002-09-03

申请号：US29140177

申请日：2001-04-11

Applicant: R. Kyle Webb

Designer： R. Kyle Webb

公开(公告)号：USD462442S1

公开(公告)日：2002-09-03

申请号：US29140160

申请日：2001-04-11

Applicant: R. Kyle Webb

Designer： R. Kyle Webb

公开(公告)号：USD459807S1

公开(公告)日：2002-07-02

申请号：US29140179

申请日：2001-04-11

Applicant: R. Kyle Webb

Designer： R. Kyle Webb

公开(公告)号：USD459806S1

公开(公告)日：2002-07-02

申请号：US29140178

申请日：2001-04-11

Applicant: R. Kyle Webb

Designer： R. Kyle Webb

公开(公告)号：US6128323A

公开(公告)日：2000-10-03

申请号：US157067

申请日：1998-09-18

Applicant: David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

Inventor： David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

IPC: G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80 ,  H01S3/00

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225 ,  H03K17/80 ,  H03K3/57 ,  H01S3/08009 ,  H01S3/0812 ,  H01S3/1392 ,  H01S3/2251 ,  H01S3/2256

Abstract: The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

Abstract translation: 本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。 可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。 允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。 该室设计用于在较低的氟浓度下运行。 在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。 这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次 具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。 用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

公开(公告)号：US6034984A

公开(公告)日：2000-03-07

申请号：US310786

申请日：1999-05-12

Applicant: Thomas Hofmann ,  James K. Howey ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb

Inventor： Thomas Hofmann ,  James K. Howey ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb

IPC: G03F7/20 ,  H01S3/036 ,  H01S3/225 ,  H01S3/22

CPC classification number: H01S3/036 ,  G03F7/708 ,  H01S3/225

Abstract: A tangential fan and cutoff assembly for recirculating a lasing gas mixture has blade members, which vary in circumferential position stepwise from end to end, and/or a tapered anode assembly. The number of blade members can be constant or variable between ends. The circumferential position of blade members can shift monotonically or reversibly between ends. Blade members are stiffened by optimally selecting the number and placement of hub members to control the natural vibration frequency of the fan. Methods of forming tangential fans include casting, and machining from a solid block. Monolithic structures can be joined, typically by electron-beam welding. Casting, welding, and machining processes introduce no additional contaminants. Tangential fans produced have mechanical rigidity, accurate tolerances, and low contaminant concentrations. Blade members can be formed into air foil shapes.

Abstract translation: 用于再循环激光气体混合物的切向风扇和切割组件具有叶片构件，其周向位置从端到端逐渐变化，和/或锥形阳极组件。 刀片构件的数量可以在端部之间是恒定的或可变的。 叶片构件的圆周位置可以在端部之间单调或可逆地移动。 叶片构件通过最佳地选择轮毂构件的数量和布置来控制风扇的固有振动频率而变硬。 形成切向风扇的方法包括从固体块铸造和加工。 通常可以通过电子束焊接来连接整体结构。 铸造，焊接和加工过程不会引起额外的污染物。 生产的切向风扇具有机械刚度，精度公差和污染物浓度低。 叶片构件可以形成为空气箔形状。

公开(公告)号：US06704339B2

公开(公告)日：2004-03-09

申请号：US10233253

申请日：2002-08-30

Applicant: Leonard Lublin ,  David J. Warkentin ,  Palash P. Das ,  Brian C. Klene ,  R. Kyle Webb ,  Herve A. Besaucele ,  Ronald L. Spangler ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  Shahryar Rokni

Inventor： Leonard Lublin ,  David J. Warkentin ,  Palash P. Das ,  Brian C. Klene ,  R. Kyle Webb ,  Herve A. Besaucele ,  Ronald L. Spangler ,  Richard L. Sandstrom ,  Alexander I. Ershov ,  Shahryar Rokni

IPC: H01S3101

CPC classification number: H01S3/005 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

Abstract translation: 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。 该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

公开(公告)号：US5870420A

公开(公告)日：1999-02-09

申请号：US912737

申请日：1997-08-18

Applicant: R. Kyle Webb

Inventor： R. Kyle Webb

IPC: F04D17/04 ,  F04D29/28 ,  F04D29/62 ,  H01S3/036 ,  H01S3/097 ,  H01S3/22

CPC classification number: H01S3/036 ,  F04D17/04

Abstract: A trussed cross-flow blower comprising truss elements on the inside of a cylindrically-shaped cross-flow blower element form at least three trusses which provide rigidity to the blower element. Preferably three trusses are provided, and they are located at radial 120.degree. spacings.

Abstract translation: 包括在圆柱形横流鼓风机元件的内侧上的桁架元件的桁架横流鼓风机形成至少三个提供鼓风机元件的刚性的桁架。 优选地，提供三个桁架，并且它们位于径向120°间隔处。